• Title/Summary/Keyword: Atmospheric pressure plasma

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A Study on Feasibility of the Phosphoric Acid Doping for Solar Cell Using Newly Atmospheric Pressure Plasma Source (새로운 대기압 플라즈마 소스를 이용한 결정질 실리콘 태양전지 인산 도핑 가능성에 관한 연구)

  • Cho, I-Hyun;Yun, Myoung-Soo;Jo, Tae-Hoon;Kwon, Gi-Chung
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.27 no.6
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    • pp.95-99
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    • 2013
  • Furnace is currently the most important doping process using POCl3 in solar cell. However furnace need an expensive equipment cost and it has to purge a poisonous gas. Moreover, furnace typically difficult appling for selective emitters. In this study, we developed a new atmospheric pressure plasma source, in this procedure, we research the atmospheric pressure plasma doping that dopant is phosphoric acid($H_3PO_4$). Metal tube injected Ar gas was inputted 5 kV of a low frequency(scores of kHz) induced inverter, so plasma discharged at metal tube. We used the P type silicon wafer of solar cell. We regulated phosphoric acid($H_3PO_4$) concentration on 10% and plasma treatment time is 90 s, 150 s, we experiment that plasma current is 70 mA. We check the doping depth that 287 nm at 90 s and 621 nm at 150 s. We analysis and measurement the doping profile by using SIMS(Secondary Ion Mass Spectroscopy). We calculate and grasp the sheet resistance using conventional sheet resistance formula, so there are 240 Ohm/sq at 90 s and 212 Ohm/sq at 150 s. We analysis oxygen and nitrogen profile of concentration compared with furnace to check the doped defect of atmosphere.

Surface treatment of silver-paste electrode by atmospheric-pressure plasma-jet (대기압 플라즈마 제트를 이용한 실버페이스트 전극의 표면처리)

  • Sheik Abdur Rahman;Shenawar Ali Khan;Yunsook Yang;Woo Young Kim
    • Journal of the Korean Applied Science and Technology
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    • v.40 no.1
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    • pp.71-80
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    • 2023
  • Silver paste is a valuable electrode material for electronic device applications because it is easy to handle with relatively low heat treatment. This study treated the electrode surface using an atmospheric-pressure plasma jet on the silver-paste electrode. This plasma jet was generated in an argon atmosphere using a high voltage of 5.5 to 6.5 kV with an operating frequency of 11.5 kHz. Plasma-jet may be more beneficial to the printing process by performing it at atmospheric pressure. The electrode surface becomes hydrophilic quickly and contact angle variation is observed on the electrode surface as a function of plasma treatment time, applied voltage, and gas flow rate. Also, there was no deviation in the contact angle after the plasma treatment in the large-area sample, that means a uniform result could be obtained regardless of the substrate size. The outcomes of this study are expected to be very useful in forming a stacked structure in the manufacture of large-area electronic devices and future applications.

Discharge Characteristics of Plasma Jet Doping Device with the Atmospheric and Ambient Gas Pressure (플라즈마 제트 도핑 장치의 대기 및 기체의 압력 변화에 대한 방전 특성)

  • Kim, J.G.;Lee, W.Y.;Kim, Y.J.;Han, G.H.;Kim, D.J.;Kim, H.C.;Koo, J.H.;Kwon, G.C.;Cho, G.S.
    • Journal of the Korean Vacuum Society
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    • v.21 no.6
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    • pp.301-311
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    • 2012
  • Discharge property of plasma jet devices is investigated for the application to the doping processes of crystalline solar cells and others. Current-voltage characteristics are shown as the typical normal-glow discharge in the various gas pressure of plasma jets, such as in the atmospheric plasma jets of Ar-discharge, in the ambient pressure of atmospheric discharge, and in the ambient Ar-pressure of Ar-discharge. The discharge voltage of atmospheric plasma jet is required as low as about 2.5 kV while the operation voltage of low pressure below 200 Torr is low as about 1 kV in the discharge of atmospheric and Ar plasma jets. With a single channel plasma jet, the irradiated plasma current on the doped silicon wafer is obtained high as the range of 10~50 mA. The temperature increasement of wafer is normally about $200^{\circ}C$. In the result of silicon wafers doped by phosphoric acid with irradiating the plasma jets, the doping profiles of phosphorus atoms shows the possibility of plasma jet doping on solar cells.

The curing of meat batter by the plasma treated juice of red perilla

  • Lee, Juri;Jo, Kyung;Jung, Samooel
    • Korean Journal of Agricultural Science
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    • v.45 no.3
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    • pp.475-484
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    • 2018
  • Nitrite is an essential additive for the manufacture of cured meat products. This study was conducted to investigate the curing effect of the plasma treated juice of red Perilla in meat batter. The nitrite content in the juice of red Perilla was increased by the indirect treatment of atmospheric pressure plasma, and the lyophilized powder of red Perilla juice contained 9,133 ppm of nitrite. A meat batter without a nitrite source was prepared as a negative control (NC), and the meat batters cured with sodium nitrite (PC), celery powder (CP), and the lyophilized powder of red Perilla juice treated with atmospheric pressure plasma (PTP) at 70 ppm level of nitrite were prepared. The PTP showed the highest pH and the lowest cooking loss among the treatments. There were no significant differences in the nitrosyl-hemochrome content in the cooked meat batters of the PC, CP and PTC. However, the PTP had a lower CIE $a^*$-value compared to the PC and CP. The malondialdehyde content in the cooked meat batters was significantly lower in the CP and PTP than in the NC while there was no significant difference between the NC and PC. Based on the results of this study, the plasma treated juice of red Perilla can be used as a new natural nitrite source for cured meat products.

Generation and Application of Atmospheric Pressure Glow Plasma in Micro Channel Reactor (마이크로 채널 반응기 내 상압 글로우 플라즈마 생성 및 응용)

  • Lee, Dae-Hoon;Park, Hyoun-Hyang;Lee, Jae-Ok;Lee, Seung-S.;Song, Young-Hoon
    • Proceedings of the KSME Conference
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    • 2008.11a
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    • pp.1869-1873
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    • 2008
  • In this work, to make it possible to generate glow discharge in atmospheric pressure condition with relatively high and wide electric field, micro channel reactor is proposed. Si DRIE and Cr deposition by Ebeam evaporation is used to make channel and bottom electrode layer. Upper electrode is made from ITO glass to visualize discharge within micro channel. Fabricated reactor is verified by generating uniform glow plasma with N2 / He gases each as working fluid. The range of gas electric field to generate glow plasma is from about 200 V/cm and upper limit is not observed in tested condition of up to 150 kV/cm. This data shows that micro channel plasma reactor is more versatile. Indirect estimation of electron temperature in this reactor can be inferred that the electron temperature within glow discharge in micro reactor lies $0{\sim}2eV$. This research demonstrates that the reactor is appropriate in application that needs to maintain low temperature condition during chemical process.

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Fungal Sterilization Using Microwave-Induced Argon Plasma at Atmospheric Pressure

  • Park, Jong-Chul;Park, Bong-Joo;Han, Dong-Wook;Lee, Dong-Hee;Lee, In-Seop;Hyun, Soon-O.;Chun, Moon-Sung;Chung, Kie-Hyung;Maki Ahiara;Kosuke Takatori
    • Journal of Microbiology and Biotechnology
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    • v.14 no.1
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    • pp.188-192
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    • 2004
  • The main aim of this study was to investigate the sterilization effects of microwave-induced argon plasma at atmospheric pressure on paper materials contaminated with fungi. Plasma-treated filter papers showed no evidence to an unaided eye of burning or paper discoloration due to the plasma treatment. All fungi were perfectly sterilized in less than 1 sec, regardless of strains. These results indicate that this sterilization method for paper materials is easy to use, requires significantly less time than other traditional methods and different plasma sterilization methods, and is also nontoxic.

Discharge Properties of Torch-Type Atmospheric Pressure Plasma and Its Local Disinfection of Microorganism (토치형 상압 플라즈마의 방전특성과 미생물의 국부 살균효과)

  • Son, Hyang-Ho;Lee, Won-Gyu
    • Korean Chemical Engineering Research
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    • v.49 no.6
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    • pp.835-839
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    • 2011
  • The characteristics of torch-type atmospheric pressure plasma and its sterilization effects have been analyzed. The length of plasma flame was varied with the level of applied voltage and the mixture gases composed of argon and oxygen. The effect of plasma flame on the temperature increase of surface treated was limited to $43^{\circ}C$ as a maximum temperature under exposing time of 10 min. The sterilization for E. coli was strongly affected by the applied voltage, the oxygen ratio in the mixture gas and the treatment time. At a high concentration of ozone, the increase of treatment time under the direct contact with plasma flame yields to maximize the effect of the sterilization on E. coli.

Surface Cleaning of Polyethylene Terephthalate Film with Non-equilibrium Atmospheric Discharge Plasma

  • Sung, Youl-Moon
    • Transactions on Electrical and Electronic Materials
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    • v.9 no.2
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    • pp.79-83
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    • 2008
  • The dampness by treating the surface with polyethylene terephthalate (PET) film was measured to grasp the plasma parameters and was observed the surface condition with an atomic force microscope (AFM) to find the causes of the dampness. Also, the vibrational and rotational temperatures in the plasma were calculated after identifying the radicals within the plasma by analyzing the emission spectral with an emission spectrum. The hydrophilic properties were enhanced, by treating the surface of the PET film with non-equilibrium atmospheric discharge plasma. When the rotational temperature was 0.22 to 0.31 eV within the plasma, surface modification control could be easily carried out to surface treatment of PET film on non-equilibrium atmospheric pressure plasma.

The Effect of Atmospheric Plasma Parameters on Cleansing the Electronic-Industrial Parts (상압 플라즈마 매개변수들이 산업용 전자부품의 세척공정(cleansing)에 미치는 효과)

  • Ri, Eui-Jae
    • Journal of the Korean institute of surface engineering
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    • v.42 no.5
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    • pp.208-215
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    • 2009
  • We employed atmospheric plasma to reactively remove the lubricant sprayed onto such industrial electronic parts as LCD chassis during sheet-metal forming processes and investigated basically the effect of plasma parameters on cleansing the surfaces of zinc-electroplated steel plates (EGI). Specimen prepared with some controlled amount of lubricant sprayed on their surfaces beforehand were subjected to two different kinds of atmospheric plasma, one being generated by using air and the other generated by using nitrogen (99.9% purity). Locating the plasma beams at the height range between 3.5 and 13.5 mm from the surface of each specimen and radiating for 5 to 30 seconds resulted out that the cases with a position of 3.5 mm and a duration of 5 seconds or longer showed the surfaces completely cleansed without a trace of lubricant. Furthermore we found out that the plasma generated by using simple air depicted higher cleansing ability than the other one generated by using expensive nitrogen, interestingly useful very much for industrial purposes. On another aspect, we confirmed that the drilled or cut surfaces of Zn-plated steel substrate would not be oxidized even under the influence of plasma during its cleansing process. Therefore, we could probably conclude from this fore-survey that a dry process adopting atmospheric plasma for cleansing industrial parts might be determined to become successful in terms of commercialization, cautiously.

Enhancement of Microbial Immobilization on the Surface of a Reticulated PU-g-PAAc Foam prepared through Graft Copolymerization induced by Atmosoheric Pressure Plasma Treatment (대기압 플라즈마 유도 그라프트 공중합으로 합성된 망상형 PU-g-PAAc 폼의 미생물 고정화능 향상)

  • Myung Sung Woon;Jang Yung Mi;Nam Ki Chun;Choi Ho Suk;Cho Dae Chul
    • KSBB Journal
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    • v.19 no.5
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    • pp.399-405
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    • 2004
  • A reticulated PU-g-PAAc foam was modified through the surface treatment of PU foam by one atmospheric pressure plasma. The synthesized PU-g-PAAc foam was prepared for the purpose of immobilizing microbial organisms. We also attempted different plasma treatment methods including simple plasma treatment, plasma induced grafting and plasma induced grafting followed by plasma re-treatment. The effect of grafting on equilibrium water content (EWC) of PU forms was examined by swelling measurements. Adhesion test was performed to investigate the effect of different plasma treatment methods on the improvement of microbial immobilization. Two foams modified by plasma induced grafting and plasma re-treatment after grafting showed 2.7 and 3.0 fold higher microbial immobilization than unmodified one, respectively. Meanwhile, simple plasma treatment showed a little enhancement. FT-IR analysis of each sample verified the contribution of surface functional groups on the enhancement of microbial immobilization. SEM observation confirmed microbial adherence.