• Title/Summary/Keyword: Argon plasma

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Behaviors of excited states argon atom density in ICP discharge

  • Park, Min;Yu, Sin-Jae;Kim, Jeong-Hyeong;Seong, Dae-Jin;Sin, Yong-Hyeon;Jang, Hong-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.203-203
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    • 2011
  • Metastable statates, resonant states in 4s level and excited states in 4p level were investigated with a simple global model and examined by the LIF experiments. Metastable states exhibit an anomalous behavior with the plasma density, on the other hands, other states show monotonous increasing behaviors. It turns out that the metastable state can have such an anomalous behavior due to its special characteristic, electric dipole radiation forbidden. It is expected to resolve the ambiguity of previously reported metastable density behaviors and provide further understanding.

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Electrosurgery Sparks induced Stimulating Current at Active Electrode

  • Kim, Ji-Hun;Na, Byeong-Geun;Bae, In-Sik;Seol, Yu-Bin;Jang, Hong-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.318-318
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    • 2011
  • Electrosurgery has been widely used in surgical procedures for many years. The surgical procedure using radiofrequency power generated occasionally sparks causing electrical stimulations. According to a paper of commercialized APC (Argon Plasma Coagulation) in the gastrointestinal endoscopy, Patients treated by APC had experienced pain and neuromuscular stimulation. This study aimed to investigate the electrosurgery sparks. In this experiment, current threshold of electrosurgery using rf was investigated. Sparks analogous to surgical situation was generated and measured the I-V figure. Asymmetric current, observed by other researchers, was also measured. This could be explained by difference between positive phase and negative phase. Furthermore, a method was developed to remove asymmetric current and to make safer device for surgical field.

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Study on Characteristics of Plasma in Hollow Cathode Discharge (Hollow Cathode Discharge에서 플라즈마 특성에 관한 연구)

  • Yoon, Man-Young;Shin, Jong-Soon
    • Journal of the Korean Graphic Arts Communication Society
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    • v.23 no.2
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    • pp.93-101
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    • 2005
  • The measured plasma temperature of Ar hollow cathode discharge for several metal cathodes are about $620\;{\sim}\;780K$ at discharge current of $7\;{\sim}\;10mA$. The optogalvanic signals were measured using hollow cathode discharge tube with argon as buffer gas at change of discharge currents. A change of ionization rate due to electron collision causes an increase or decrease of the electric conductivity. This change in electric conductivity generates the optogalvanic signal. We conclude that optogalvanic signal has close relation with the lowest metastable atoms density at low current.

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Analysis on the lgnition Charac teristics of Pseudospark Discharge Using Hybrid Fluid-Particle(Monte Carlo) Method (혼성 유체-입자(몬테칼로)법을 이용한 유사스파크 방전의 기동 특성 해석)

  • 심재학;주홍진;강형부
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.11 no.7
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    • pp.571-580
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    • 1998
  • The numerical model that can describe the ignition of pseudospark discharge using hybrid fluid-particle(Monte Carlo )method has been developed. This model consists of the fluid expression for transport of electrons and ions and Poisson's equation in the electric field. The fluid equation determines the spatiotemporal dependence of charged particle densities and the ionization source term is computed using the Monte carlo method. This model has been used to study the evolution of a discharge in Argon at 0.5 torr, with an applied voltage if 1kV. The evolution process of the discharge has been divided into four phases along the potential distribution : (1) Townsend discharge, (2) plasma formation, (3) onset of hollow cathode effect, (4) plasma expansion. From the numerical results, the physical mechanisms that lead to the rapid rise in current associated with the onset of pseudospark could be identified.

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XPS STUDY ON SN-DOPED DLC FILMS PREPARED BY RF PLASMA-ENHANCED CVD

  • Inoue, Y.;Komoguchi, T.;Nakata, H.;Takai, O.
    • Journal of the Korean institute of surface engineering
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    • v.29 no.5
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    • pp.519-524
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    • 1996
  • We synthesized semiconducting Sn-doped diamondlike carbon films by rf plasma-enhanced chemical vapor deposition using an organotin compound as a dopung gas source. XPS quan-titative analysis for the deposited films after 60 s argon ion etching revealed that Sn concen-tration increased with the partial pressure of the organotin compound in the reactant gas. In C 1s spectra, there was a component due to C-Su bond which had a negative chemical shift. C 1s spectra also indicated that the deposited films were relatively $sp^2$ rich. The chemical shift of the Sn-C bond in Sn $3d_{5/2}$ spectra was about +1.7 eV. The electrical resistivity and the optical transmittance were also investigated.

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EFFECTS OF SUBSTRATE TEMPERATURE ON PROPERTIES OF FLUORINE CONTAINED SILICON OXIDE FILMS PREPARED BY MICROWAVE PLASMA- ENHANCED CVD

  • Sugimoto, Nobuhisa;Hozumi, Atsushi;Takai, Osamu
    • Journal of the Korean institute of surface engineering
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    • v.29 no.5
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    • pp.577-584
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    • 1996
  • Silicon oxide films with high hardness and water repellency were prepared by microwave plasma-enhanced CVD using four kind of organosilicon compound-fluoro-alkyl silane mixtures as source gases. An argon gas was used as a carrier gas for fluoro-alkyl silane. The substrate temperatures during deposition were controlled by resistant heating at a constant value between 50 and $300^{\circ}C$. The hardness of the films increased, but the deposition rate and the contact angle for a water drop decreased with increasing substrate temperature. The number of methoxy groups also affected the water repellency and hardness. The deposited films became more inorganic with increasing substrate temperature because of the thermal dissociation of reactants.

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A Study on Emission Characteristics of Ar, Ne Gas Using a Single Langmuir Probe Method in Radio-Frequency Inductively Coupled Plasma (13.56MHz ICP에서 단일 탐침법에 의한 Ar, Ne 가스의 발광특성 연구)

  • Jo, Ju-Ung;Choi, Yong-Sung;Kim, Yong-Kab;Park, Dae-Hee
    • Proceedings of the KIEE Conference
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    • 2004.11a
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    • pp.167-170
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    • 2004
  • In recent, there have been several developments in lamp technology that promise savings in electrical power consumption and improved quality of the lighting space. The electrodeless fluorescent lamp is intended as a high efficacy replacement for the incandescent reflector lamp in many applications. In this paper, electron temperature and electron density were measured in a radio-frequency inductively coupled plasma using a Langmuir probe method for emission characteristics. Measurement was conducted in an Argon, Ne discharge for pressure from 1 [mTorr] and input RF power 10 [W] to 150 [W]. As for the electron density, a electron temperature was more distinguished for a emission characteristic. The results of ideal may contribute to systematic understanding of a electrodeless fluorescent lamps of emission characteristics.

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The Study on the application of plasma co-polymerized (MMA-Styrene) thin film as E-beam resist (플라즈마중합법에 의한 (MMA+Styrene) 박막의 E-beam용 레지스트 특성에 대한 연구)

  • Jung, Y.;Park, J.K.;Park, S.K.;Park, J.Y.;Park, S.H.;Lee, D.C.
    • Proceedings of the KIEE Conference
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    • 1993.07b
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    • pp.1183-1185
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    • 1993
  • The plasma polymerized thin film of MMA+Sty was prepared using a capacitively coupled gas-flow-type reactor. This thin films were also delincated by the electron-beam apparatus with an acceleration voltage 30KV, and the pattern in the resist was developed with the gas-flow-type reactor using an argon as an etchant. The effect of discharge power on groth rate and etching rate of the thin film were studied. The molacular structure of the resist was investigated by ESCA and FT-IR.

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An Investigation of a Temporal and a Spatial characteristics for Atomic Emission of Laser-Induced Plasma (Laser-Induced Plasma의 원자 분광에 대한 시간적 및 공간적인 특징 조사)

  • 전형하;오기장;박형국;김달우;오철한
    • Proceedings of the Optical Society of Korea Conference
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    • 2000.08a
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    • pp.212-213
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    • 2000
  • 레이저로 발생시킨 플라즈마의 시간적, 공간적인 분광학적인 특성을 조사하였다. 진공분위기(약1x$10^1$에서 1x$10^{-5}$ Torr) 및 Argon분위기(약 1x$10^{0}$에서 1x$10^{-3}$ Torr)에서 INVAR 시편에 대해 detector의 gate 지연시간을 조정하여 시간적인 플라즈마의 분광선 세기를 측정하였다. 또한 레이저광의 조사방향과 수직되게 놓여 있는 시편에 대해 그림 1과 같이 시편 표면 위로부터 약 0, 2, 4, 6 mm 떨어진 위치에서 플라즈마의 분광선 세기를 관찰하였다. (중략)

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Influence of milling atmosphere on thermoelectric properties of p-type Bi-Sb-Te based alloys by mechanical alloying

  • Yoon, Suk-min;Nagarjuna, Cheenepalli;Shin, Dong-won;Lee, Chul-hee;Madavali, Babu;Hong, Soon-jik;Lee, Kap-ho
    • Journal of Powder Materials
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    • v.24 no.5
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    • pp.357-363
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    • 2017
  • In this study, Bi-Sb-Te thermoelectric materials are produced by mechanical alloying (MA) and spark plasma sintering (SPS). To examine the influence of the milling atmosphere on the microstructure and thermo-electric (TE) properties, a p-type Bi-Sb-Te composite powder is mechanically alloyed in the presence of argon and air atmospheres. The oxygen content increases to 55% when the powder is milled in the air atmosphere, compared with argon. All grains are similar in size and uniformly, distributed in both atmospheric sintered samples. The Seebeck coefficient is higher, while the electrical conductivity is lower in the MA (Air) sample due to a low carrier concentration compared to the MA (Ar) sintered sample. The maximum figure of merit (ZT) is 0.91 and 0.82 at 350 K for the MA (Ar) and MA (Air) sintered samples, respectively. The slight enhancement in the ZT value is due to the decrease in the oxygen content during the MA (Ar) process. Moreover, the combination of mechanical alloying and SPS process shows a higher hardness and density values for the sintered samples.