• Title/Summary/Keyword: Area source uniformity

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Plasma Uniformity Numerical Modeling of Geometrical Structure for 450 mm Wafer Process System (450 mm 웨이퍼 공정용 System의 기하학적 구조에 따른 플라즈마 균일도 모델링 분석)

  • Yang, Won-Kyun;Joo, Jung-Hoon
    • Journal of the Korean Vacuum Society
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    • v.19 no.3
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    • pp.190-198
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    • 2010
  • Asymmetric model for plasma uniformity by Ar and $CF_4$ was modeled by the antenna structure, the diameter of chamber, and the distance between source and substrate for the development of plasma equipment for 450 mm wafer. The aspect ratio of chamber was divided by diameter, distance from substrate, and pumping port area. And we found the condition with the optimized plasma uniformity by changing the antenna structure. The drift diffusion and quasi-neutrality for simplification were used, and the ion energy function was activated for the surface recombination and etching reaction. The uniformity of plasma density on substrate surface was improved by being far of the distance between substrate wall and chamber wall, and substrate and plasma source. And when the antenna of only 2 turns was used, the plasma uniformity can improve from 20~30% to 4.7%.

On the Possibility of Multiple ICP and Helicon Plasma for Large-area Processes

  • Lee, J.W.;An, Sang-Hyuk;Chang, Hong-Young
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.234.1-234.1
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    • 2014
  • Many studies have been investigated on high density plasma source (Electron Cyclotron Resonance[ECR], Inductively Coupled Plasma[ICP], Helicon plasma) for large area source after It is announced that productivity of plasma process depends on plasma density. Among them, Some researchers have been studied on multiple sources In this study, we attempted to determine the possibility of multiple inductively coupled plasma (ICP), and helicon plasma sources for large-area processes. Experiments were performed with the one and two coils to measure plasma and electrical parameters, and a circuit simulation was performed to measure the current at each coil in the 2-coil experiment. Based on the result, we could determine the possibility of multiple ICP sources due to a direct change of impedance due to current and saturation of impedance due to the skin-depth effect. However, a helicon plasma source is difficult to adapt to the multiple sources due to the consistent change of real impedance due to mode transition and the low uniformity of the B-field confinement. As a result, it is expected that ICP can be adapted to multiple source for large-area processes.

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Preparation of Large Area Plasma Source by Helical Resonator Arrays (Helical Resonator 배열을 통한 대면적 고밀도 Plasma Source)

  • 손민영;김진우;박세근;오범환
    • Proceedings of the IEEK Conference
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    • 2000.06b
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    • pp.282-285
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    • 2000
  • Four helical resonators are distributed in a 2 ${\times}$ 2 array by modifying upper part of the conventional reactive ion etching(RIE) type LCD etcher in order to prepare a large area plasma source. Since the resonance condition of the RF signal to the helical antenna, one RF power supply is used for delivering the power efficiently to all four helical resonators without an impedance matching network Previous work of 2 ${\times}$ 2array inductively coupled plasma(ICP)requires one matching circuit to each ICP antenna for more efficient power deliverly Distributions of ion density and electron temperature are measured in terms of chamber pressure, gas flow rate and RF power . By adjusting the power distribution among the four helical resonator units, argon plasma density of higher than 10$\^$17/㎥ with the uniformity of better than 7% can be obtained in the 620 ${\times}$ 620$\textrm{mm}^2$ chamber.

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A Numerical Analysis on the Development of ICP Source for Large Area LCD (대면적 LCD용 ICP소스에 대한 수치 해석적 분석)

  • 이주율;이영직
    • Proceedings of the IEEK Conference
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    • 1998.10a
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    • pp.573-576
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    • 1998
  • In this paper, we analyzed electric field density and plasma condition to ICP reactor geometry structure, to generate plasma, to maintain plasma uniformity of large area LCD panel in ICP reactor also, we simulated electric field density for all kind existence current (antena and plasma current) in ICP reactor to analyze plasma antena structure

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Study of Optimized Reflector Design for Road Light Using Ray-Tracing Method (광선추적법을 사용한 가로등 반사판의 최적설계에 관한 연구)

  • Choi, Dae-Seub;Han, Jeong-Min;Shim, Yong-Sik;Jeong, Chan-Oong;Oh, Seon
    • The Transactions of the Korean Institute of Electrical Engineers P
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    • v.58 no.3
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    • pp.347-350
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    • 2009
  • In this study, it was studied about the improved road light design for drivers and pedestrians using forward or reverse ray-tracing method. Many of conventional road lights are not suitable for drivers and pedestrians because it has some serious problems such as glare effect or randomicity of illuminated areas. It was oriented from customary design method which was pointed at simple target such as luminance or electrical power. But it was not truth any more that the high luminance or electrical power consumption mean more bright and good road light. We studied ray-tracing method for road light reflector design to get the several goals. It means that good road light has easy for drivers and pedestrians eyes and illuminating objects on the road clearly. So, we set the design targets such as uniformity on the road area per one road light, shading angles and continuous luminance uniformity on the long distance road. We designed ideal road light conditions using ray-tracing method. We set the height of drivers and pedestrians eyes and calculated design guideline to make above design targets. Then we designed road light reflector using reverse ray-tracing method. And we achieved same luminance on the road almost half power consumption because we reduced loss of light. We achieved ideal design guide as 75 degrees of shading angles and 0.5 of luminance uniformity on the road area. It is superior than conventional road light ability such as 0.35 of luminance uniformity of 400 watts power consumption lamp. Finally, we suggested reflector design for 250 watts power consumption CDM Iight source.

Research to Achieve Uniform Plasma in Multi-ground Capacitive Coupled Plasma

  • Park, Gi-Jeong;Lee, Yun-Seong;Yu, Dae-Ho;Lee, Jin-Won;Lee, Jeong-Beom;Jang, Hong-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.247.1-247.1
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    • 2014
  • The capacitive coupled plasma is used widely in the semiconductor industries. Especially, the uniformity of the industrial plasma is heavily related with defect ratio of devices. Therefore, the industries need the capacitive coupled plasma source which can generate the uniform plasma and control the plasma's uniformity. To achieving the uniformity of the large area plasma, we designed multi-powered electrodes. We controlled the uniformity by controlling the power of each electrode. After this work, we started to research another concept of the plasma device. We make the plasma chamber that has multi-ground electrodes imaginary (CST microwave studio) and simulate the electric field. The shape of the multi-ground electrodes is ring type, and it is same as the shape of the multi-power electrodes that we researched before. The diameter of the side electrode's edge is 300mm. We assumed that the plasma uniformity is related with the impedance of ground electrodes. Therefore we simulated the imaginary chamber in three cases. First, we connected L (inductor) and C (capacitor) at the center of multi-ground electrodes. Second, we changed electric conductivity of multi-ground electrode. Third, we changed the insulator's thickness between the center ground electrode and the side ground electrode. The driving frequency is 2, 13.56 and 100 MHz. We switched our multi-powered electrode system to multi-ground electrode system. After switching, we measured the plasma uniformity after installing a variable vacuum capacitor at the ground line. We investigate the effect of ground electrodes' impedance to plasma uniformity.

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Comparison of E-ICP Effect for Large Area Plasma Source (대면적 플라즈마 소스에의 E-ICP 적용과 그 효과 비교)

  • 김진우;손민영;박세근;오범환
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.608-611
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    • 2000
  • Large area plasma source becomes important as the substrate size increases. In this work, four inductively coupled plasma(ICP) unit sources are distributed 2${\times}$2 array. E-ICP concept is applied to the 2${\times}$2 array ICP and its effect is examined. Characteristics of the plasma are measured, and photoresist etching is performed with oxygen plasma. Good etching characteristic in terms of etching rate and uniformity can be obtained with E-ICP.

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Development of Large-area Plasma Sources for Solar Cell and Display Panel Device Manufacturing

  • Seo, Sang-Hun;Lee, Yun-Seong;Jang, Hong-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.148-148
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    • 2011
  • Recently, there have been many research activities to develop the large-area plasma source, which is able to generate the high-density plasma with relatively good uniformity, for the plasma processing in the thin-film solar cell and display panel industries. The large-area CCP sources have been applied to the PECVD process as well as the etching. Especially, the PECVD processes for the depositions of various films such as a-Si:H, ${\mu}c$-Si:H, Si3N4, and SiO2 take a significant portion of processes. In order to achieve higher deposition rate (DR), good uniformity in large-area reactor, and good film quality (low defect density, high film strength, etc.), the application of VHF (>40 MHz) CCP is indispensible. However, the electromagnetic wave effect in the VHF CCP becomes an issue to resolve for the achievement of good uniformity of plasma and film. Here, we propose a new electrode as part of a method to resolve the standing wave effect in the large-area VHF CCP. The electrode is split up a series of strip-type electrodes and the strip-type electrodes and the ground ones are arranged by turns. The standing wave effect in the longitudinal direction of the strip-type electrode is reduced by using the multi-feeding method of VHF power and the uniformity in the transverse direction of the electrodes is achieved by controlling the gas flow and the gap length between the powered electrodes and the substrate. Also, we provide the process results for the growths of the a-Si:H and the ${\mu}c$-Si:H films. The high DR (2.4 nm/s for a-Si:H film and 1.5 nm/s for the ${\mu}c$-Si:H film), the controllable crystallinity (~70%) for the ${\mu}c$-Si:H film, and the relatively good uniformity (1% for a-Si:H film and 7% for the ${\mu}c$-Si:H film) can be obtained at the high frequency of 40 MHz in the large-area discharge (280 mm${\times}$540 mm). Finally, we will discuss the issues in expanding the multi-electrode to the 8G class large-area plasma processing (2.2 m${\times}$2.4 m) and in improving the process efficiency.

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Improved Road light Design using Ray-tracing method (광투사 방법을 이용한 가로등 디자인 개선)

  • Choi, Dae-Seub;Han, Jeong-Min;Park, Sung-Tae
    • Proceedings of the KIEE Conference
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    • 2008.09a
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    • pp.140-143
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    • 2008
  • In this study, it was studied about the improved road light design for drivers and pedestrians using ray- or reverse ray-tracing method. Many of conventional road lights are not suitable for drivers and pedestrians because it has some serious problems such as glare effect or randomicity of illuminated areas. It was oriented from customary design method which was pointed at simple target such as luminance or electrical power. But it was not truth any more that the high luminance or electrical power consumption mean more bright and good mad light. We studied ray-tracing method for road light reflector design to get the several goals. It means that good road light has easy for drivers and Pedestrians eyes and illuminating objects on the road clearly. So, we set the design targets such as uniformity on the road area per one road light, shading angles and continuous luminance uniformity on the long distance road. We designed ideal road light conditions using ray-tracing method. We set the height of drivers and pedestrians eyes and calculated design guideline to make above design targets. Then we designed road light reflector using reverse ray-tracing method. And we achieved same luminance on the road almost half power consumption because we reduced loss of light. We achieved ideal design guide as 75 degrees of shading angles and 0.5 of luminance uniformity on the road area. Finally, we suggested reflector design for 250 watts power consumption CDM light source.

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Improved Road light Design using Ray-tracing method (광투사 방법을 이용한 가로등 디자인 개선)

  • Choi, Dae-Seub;Jung, Chan-Oong;Park, Sung-Tae;Hwang, Min-Young;Kim, Jae-Youn
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.327-328
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    • 2008
  • In this study, it was studied about the improved road light design for drivers and pedestrians using ray- or reverse ray-tracing method. Many of conventional road lights are not suitable for drivers and pedestrians because it has some serious problems such as glare effect or randomicity of illuminated areas. It was oriented from customary design method which was pointed at simple target such as luminance or electrical power. But it was not truth any more that the high luminance or electrical power consumption mean more bright and good road light. We studied ray-tracing method for road light reflector design to get the several goals. It means that good road light has easy for drivers and pedestrians eyes and illuminating objects on the road clearly. So, we set the design targets such as uniformity on the road area per one road light, shading angles and continuous luminance uniformity on the long distance road. We designed ideal road light conditions using ray-tracing method. We set the height of drivers and pedestrians eyes and calculated design guideline to make above design targets. Then we designed road light reflector using reverse ray-tracing method. And we achieved same luminance on the road almost half power consumption because we reduced loss of light. We achieved ideal design guide as 75 degrees of shading angles and 0.5 of luminance uniformity on the road area. Finally, we suggested reflector design for 250 watts power consumption CDM light source.

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