Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
권호 표지

Comparison of E-ICP Effect for Large Area Plasma Source

대면적 플라즈마 소스에의 E-ICP 적용과 그 효과 비교

  • 김진우 (인하대학교 전자재료공학과) ;
  • 손민영 (인하대학교 전자재료공학과) ;
  • 박세근 (인하대학교 전자재료공학과) ;
  • 오범환 (인하대학교 전자재료공학과)
  • Published : 2000.07.01
Download PDF
⟨ Previous Next ⟩

Abstract

Large area plasma source becomes important as the substrate size increases. In this work, four inductively coupled plasma(ICP) unit sources are distributed 2${\times}$2 array. E-ICP concept is applied to the 2${\times}$2 array ICP and its effect is examined. Characteristics of the plasma are measured, and photoresist etching is performed with oxygen plasma. Good etching characteristic in terms of etching rate and uniformity can be obtained with E-ICP.

Keywords