• 전기의세계
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• 제16권4호
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• pp.6-10
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• 1967

The deionization behavior in plasma during arc discharge of mercury arc rectifier depends on ambipolar diffusion. It is shown here in the quantitative analysis that a diameter of arc path which affects the mercury arc rectifier characteristics is related with the density of charged particles in plasma, the particle number of extruguish ion, the deionizing time and the recovering time of grid controlled ability. The conclusion would he useful for designing a diameter of arc path of mercury arc rectifier by quantitative method. And it could be applied to the designing of electrical apparatus using arc discharge phenomena.

• 전기학회논문지P
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• 제61권3호
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• pp.116-121
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• 2012

Recently, in the field of renewable energy such as solar cells including the semiconductor and display industries, thin film deposition process is being diversified. Furthermore, to deal with trend of making high-quality and fast, the high-capacity and output plasma power supply which can control high density plasma is required. The biggest problem is arc discharge caused by using high voltage power supply. Thus, the key function of plasma power supply is to prevent arc discharge and there is a need to maintain the possible minimum arc energy. In DC sputtering power supply, on a periodic basis (-)voltage powering up is able to significantly reduce arcing, as well as arc discharge prevention, and maintaining uniform charge density. This conventional method for powering up (-)voltage requires heavy mutual inductance of the transformer to avoid distortion problem of the output voltage. This study is about energy recovery circuit for arc discharge prevention in sputtering plasma power supply. By using energy recovery circuit, it is possible to reduce the mutual inductance and size of the transformer dramatically, prevent distortion of the output voltage and has a stable output waveform. This work was proved through simulation and experimental study.

• 한국재료학회지
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• 제18권5호
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• pp.253-258
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• 2008

A simple method to deposit carbon nanotube films uniformly on large area substrates using an arc discharge method is reported in this paper. The arc discharge method was modified to deposit carbon nanotube films in situ on the substrates. The substrates were scanned several times over the arcing point for a uniform film thickness. Deposition was carried out under variable dc bias conditions at 600 torr of $H_2$ gas. The thickness uniformity of the single-wall carbon nanotube films as characterized by a four-point probe was within 30% deviation. The morphology and crystal quality of the single-wall carbon nanotube film were also characterized by field emission scanning electron microscopy and Raman spectroscopy.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2006년도 심포지엄 논문집 정보 및 제어부문
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• pp.231-233
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• 2006

Arc Fault Current is an electric discharge which is occurred in two opposite electrode. In this paper, arc current control algorithm is designed for the interruption of arc fault current which is occurred in the low voltage network. This arc is one of the main causes of electric fire. General arc current sensor has troubles for detecting arc currents, thus we would like to propose the arc current detection method without current sensor. In this paper, arc discharge currents within power lines are being detected through the arc current control algorithm.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 춘계학술대회 논문집 디스플레이 광소자분야
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• pp.185-188
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• 2004

A diode structure of field emission lamps based upon carbon-nanotube is studied. The single-walled carbon nanotubes(SWNTs) were produced by arc discharge method. We made the 1-inch diode type flat lamp using CNTs. We applied anode voltage gradually to refine the field emission behavior of emitter in dynamic vacuum system to study the emission current. the brightness and efficiency, etc. The field emission properties was estimated by varying gaps between the cathode and anode, contents of the glass frit. The good luminous efficiency is showed in the gap $900{\mu}m$, $1200{\mu}m$ and contents of the proper glass frit. For the upper conditions, the luminous efficiencies were respectively 23.30, 11.12 1m/W.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.96-97
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• 2012

In nitride and oxide film deposition, sputtered metals react with nitrogen or oxygen gas in a vacuum chamber to form metal nitride or oxide films on a substrate. The physical properties of sputtered films (metals, oxides, and nitrides) are strongly influenced by magnetron plasma density during the deposition process. Typical target power densities on the magnetron during the deposition process are ~ (5-30) W/cm2, which gives a relatively low plasma density. The main challenge in reactive sputtering is the ability to generate a stable, arc free discharge at high plasma densities. Arcs occur due to formation of an insulating layer on the target surface caused by the re-deposition effect. One current method of generating an arc free discharge is to use the commercially available Pinnacle Plus+ Pulsed DC plasma generator manufactured by Advanced Energy Inc. This plasma generator uses a positive voltage pulse between negative pulses to attract electrons and discharge the target surface, thus preventing arc formation. However, this method can only generate low density plasma and therefore cannot allow full control of film properties. Also, after long runs ~ (1-3) hours, depends on duty cycle the stability of the reactive process is reduced due to increased probability of arc formation. Between 1995 and 1999, a new way of magnetron sputtering called HIPIMS (highly ionized pulse impulse magnetron sputtering) was developed. The main idea of this approach is to apply short ${\sim}(50-100){\mu}s$ high power pulses with a target power densities during the pulse between ~ (1-3) kW/cm2. These high power pulses generate high-density magnetron plasma that can significantly improve and control film properties. From the beginning, HIPIMS method has been applied to reactive sputtering processes for deposition of conductive and nonconductive films. However, commercially available HIPIMS plasma generators have not been able to create a stable, arc-free discharge in most reactive magnetron sputtering processes. HIPIMS plasma generators have been successfully used in reactive sputtering of nitrides for hard coating applications and for Al2O3 films. But until now there has been no HIPIMS data presented on reactive sputtering in cluster tools for semiconductors and MEMs applications. In this presentation, a new method of generating an arc free discharge for reactive HIPIMS using the new Cyprium plasma generator from Zpulser LLC will be introduced. Data (or evidence) will be presented showing that arc formation in reactive HIPIMS can be controlled without applying a positive voltage pulse between high power pulses. Arc-free reactive HIPIMS processes for sputtering AlN, TiO2, TiN and Si3N4 on the Applied Materials ENDURA 200 mm cluster tool will be presented. A direct comparison of the properties of films sputtered with the Advanced Energy Pinnacle Plus + plasma generator and the Zpulser Cyprium plasma generator will be presented.

• 한국정보통신학회:학술대회논문집
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• 한국정보통신학회 2013년도 춘계학술대회
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• pp.726-728
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• 2013

전력배전반 내 아크방전을 감지할 수 있도록 광전자 방식 아크방전 감지센서를 구현하였다. 아크방전은 시작되면 전력시스템에 치명적이므로 전력차단이 발생하기 전에 사전에 이를 감지하는 것이 필요하다. 전력배전반 내 전력 기기에 직접적인 전기적 접촉을 피하기 위하여 광전자적 감지 방식이 사용되었다. $7.5mm^2$의 수광면적을 갖는 수광소자와 $2.16cm^2$ 발광면적에서 1.9J의 에너지를 발광하는 즉 $0.4cal/cm^2$ 에너지 밀도를 갖는 플래쉬 광원을 사용하여 180도 감지각과 감시 목적으로는 충분한 6m 이상의 감지거리가 달성되었다. 아크방전 센서의 반응속도는 1 msec 미만으로 측정되었으며 감도는 최대 0.94 pC 의 전하를 감지할 수 있을 정도로 민감함을 보여주었다.

• 열처리공학회지
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• 제23권2호
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• pp.75-82
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• 2010

A new advanced combined PVD/CVD technique of DLC film deposition has been developed. Deposition of a DLC film was carried out using a pulsed carbon arc discharge in vapor hydrocarbon atmosphere. The arc plasma enhancing CVD process promotes dramatic increase in the deposition rate and decrease of compressive stress as well as improvement of film thickness uniformity compared to that obtained with a single PVD pulsed arc process. The optical spectroscopy investigation reveals great increase in radiating components of $C_2$ Swan system molecular bands due to acetylene molecules decomposition. AFM, Raman spectroscopy, XPS and nano-indentation were used to characterize DLC films. The method ensures obtaining a new superhard DLC nano-material for deposition of protective coatings onto various industrial products including those used in medicine.

• 한국정보전자통신기술학회논문지
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• 제12권1호
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• pp.78-82
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• 2019

본 논문에서는 수배전반 내 코로나 및 직렬아크 발생 시 나타나는 초음파 신호의 측정 및 분석에 대해 기술하였다. 휴대용 초음파 감지기는 전기 시스템에서 발생하는 코로나와 같은 방전 현상 감지에 유용하다. 그러나 일반적인 휴대용 초음파 감지기는 방전 여부에 대한 판단 결과가 사용자의 주관적 반응에 영향을 미치며, 음향 특성을 듣고 결과를 예측함으로써 문제 유형을 판별하는 것이 어렵다는 단점을 가지고 있다. 따라서 초음파 특성을 구별하는 새로운 분석 방법이 필요하다. 본 논문에서는 초음파 감지기로 측정 한 초음파 음향을 시각화하기 위한 초음파 분석 사례를 연구하였다. 실험 결과 초음파탐지계통은 외부소음의 영향을 받지 않고 배전반에서 코로나 및 직렬 아크 방전을 검출할 수 있었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.378-379
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• 2009

High intensity metal halide discharge lamp performance, specifically the generated luminous flux and light color content, depends critically on the arc tube design. Factors influencing the design and consequent lamp efficacy include : lamp size, geometry, arc tube composition, fill chemistry, electrode design and excitation modes. Shaping of Polycrystalline Alumina(PCA) can be realized by conventional ceramic processes. Several processes are applied nowadays. Well-known in the ceramic high pressure field for decades are the pressing and the extrusion method. Newly developed slurry and precious forming technologies give the one-body seamless tubes, which improve thickness uniformity and lighting performance. Now, we reported some optical properties with different arc tube structures of ceramic metal halide lamps.