• Magazine of RCR
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• v.15 no.4
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• pp.43-47
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• 2020

• Journal of computational fluids engineering
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• v.15 no.3
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• pp.9-15
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• 2010

In this study, we calculated arc discharges and flow characteristics driven by arcs in a thermal puffer chamber, which is one of most outstanding high-voltage interrupters, for understanding the complex physics and the probability of thermal breakdown. The four main parts of arc model for this virtual-reality are radiation, PTFE ablation, Cu evaporation, and turbulence. Among these important parts the turbulence model can be critical to the reliability of computation results during the whole arcing history because the plasma flow is affected by high heat energy and mass momentum. Two turbulence models, the Prandtl's mixing length model and the standard $k-\varepsilon$ model, are applied for these calculations and are compared with pressure-rise inside chamber and arc voltage between the contacts as well as flow characteristics near current zero.

• The Transactions of the Korean Institute of Electrical Engineers B
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• v.51 no.3
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• pp.107-115
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• 2002

This parer presents the analysis of hot gas flow in puffer-type circuit breakers using FVFLIC method. For the analysis of arc-flow interaction, the flow field is analyzed from the equations of conservation for mass, momentum and energy with the assumption of local thermodynamic equilibrium state. The arc is represented as the energy source term composed of ohmic heating and radiation term in the energy conservation equation. Ohmic heating is computed by the electric field analysis only within the conducting plasma region. An approximate radiation transport model is employed for the evaluation of emission and absorption of the radiation. The analysis method was applied to the real circuit breaker model and simulation results such as pressure rise and arc voltage were compared with the experimental ones.

• Nuclear Engineering and Technology
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• v.35 no.3
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• pp.226-233
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• 2003

The discharge characteristics of a prototype ion source was investigated, which was developed and upgraded for the NBI (Neutral Beam Injection) heating system of KSTAR (Korea Superconducting Tokamak Advanced Research). The ion source was designed for the arc discharge of magnetic bucket chamber with multi-pole cusp fields. The ion source was discharged by the emission-limited mode with the control of filament heating voltage. The maximum ion density was 4 times larger than the previous discharge controlled by a space-charge-limited mode with fully heated filament. The plasma (ion) density and arc current were proportional to the filament voltage, but the discharge efficiency was inversely proportional to the operating pressure of hydrogen gas. The maximum ion density and arc current were obtained with constant arc voltage ($80{\sim}100V$), as $8{\times}10^{11}cm^{-3}$ and 1200 A, respectively. The estimated maximum beam current was about 35 A, extracted by the accelerating voltage of 80kV.

• Proceedings of the KIEE Conference
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• 2007.11a
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• pp.188-189
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• 2007

Axial magnetic field was applied into the hollow anode of plasma torch for the purpose of extension of electrode lifetime. The average arc voltage increased because the arc column became longer, the arc voltage ripple frequency became low. The steady state of arc voltage was removed by applied magnetic filed. The lifetime of electrode was over 1000 hours which is 100 times longer than operation without magnetic field.

• Journal of the Semiconductor & Display Technology
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• v.2 no.1
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• pp.1-5
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• 2003

Plasma generator based on non-self-sustained low-pressure arc discharge has been examined as a tool for deposition of highly-adhesive hydrogenated amorphous diamond-like carbon(DLC) films. Since the discharge is stable in wide range of gas pressures and currents, this plasma source makes possible to realize both plasma-immersion ion implantation(PIII) and plasma-immersion ion deposition(PIID) in a unified vacuum cycle. The plasma parameters were measured as functions of discharge current. Discharge and substrate bias voltage parameters have been determined for the PIII and PIID modes. For PIID it has been demonstrated that hard and well-adherent DLC coating are produced at 200-500 eV energies per deposited carbon atom. The growth rates of DLC films in this case are about 200-300 nm/h. It was also shown that short(∼60$\mu\textrm{s}$) high-voltage(> 1kV) substrate bias pulses are the most favorable for achieving high hardness and good adhesion of DLC, as well as for reducing of residual intrinsic stress are.

• Journal of the Korean Society for Heat Treatment
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• v.20 no.2
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• pp.78-83
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• 2007

CrN coatings were deposited by cathodic arc ion plating method on the SKD11 steel substrates. Atmosphere temperature of $350^{\circ}C$, arc current of 90 A, nitrogen partial pressure of 1.0-5.3 Pa, and negative bias voltage of 30-135 V were selected. The characteristics of microstructure were investigated with XRD. Hardness, adhesion and friction coefficient measured by microhardness tester, scratch tester, and ball on disk tribometer. Microstructures depended on nitrogen partial pressure and bias voltage. The preferred orientation of the films was changed from (200) to (111) with decreasing pressure and increasing bias voltage. Adhesion properties related with microstructure, but microstructure changes slightly influenced on hardness and friction properties. The critical load.($Lc_1$) and hardness of CrN films deposited at 5.3 Pa, -30 V condition were 55 N(HF1), $2157{\pm}47\;Hk_{0.025}$. The friction coefficient were about 0.5 under dry condition.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.04b
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• pp.39-42
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• 2000

As gate dimensions continue to shrink below $0.2{\mu}m$, improving CD (Critical Dimension) control has become a major challenge during CMOS process development. Anti-Reflective Coatings are widely used to overcome high substrate reflectivity at Deep UV wavelengths by canceling out these reflections. In this study, we have investigated Batchtype system for PECVO SiOxNy as Anti-Reflective Coatings. The Singletype system was baseline and Batchtype system was new process. The test structure of Singletype is SiON $250{\AA}$ + Cap Oxide $50{\AA}$ and Batchtype is SiON $250{\AA}$ + Cap Oxide $50{\AA}$ or N2O plasma treatment. Inorganic chemical vapor deposition SiOxNy layer has been qualified for bottom ARC on Poly+WSix layer, But, this test was practiced on the actual device structure of TiN/Al-Cu/TiN/Ti stacks. A former day, in Batchtype chamber thin oxide thickness control was difficult. In this test, Batchtype system is consist of six deposition station, and demanded 6th station plasma treatment kits for N2O treatment or Cap Oxide after SiON $250{\AA}$. Good reflectivity can be obtained by Cap Oxide rather than N2O plasma treatment and both system of PECVD SiOxNy ARC have good electrical properties.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.288-288
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• 2013

We report the catalytic activity of Au/$TiO_2$ and Pt/$TiO_2$ nanocatalysts under CO oxidation fabricated by arc plasma deposition (APD), which is a facile dry process with no organic materials involved. Using APD, the catalyst nanoparticles were well dispersed on $TiO_2$ powder with an average particle size (2~4 nm) well below that of nanoparticles prepared by the sol-gel method (10 nm). We found that the average particle size of the dispersed gold nanoparticles can be controlled by changing the plasma discharge voltage of APD. Accordingly, the amount of loaded gold on the $TiO_2$ powder increased with increasing discharge voltage, but the specific surface area of the Au/$TiO_2$ samples decreased. As for catalytic reactivity, Au/$TiO_2$ showed a higher catalytic activity than Pt/$TiO_2$ in CO oxidation. The catalytic activity of the Au/$TiO_2$ samples showed size dependence where higher catalytic activity occurred on smaller gold nanoparticles. The study suggests that APD is a simple way to fabricate catalytically active nanocatalysts.

• Journal of Welding and Joining
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• v.32 no.3
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• pp.27-33
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• 2014

This paper presents a brief summary on a relatively new plasma aided electrolytic surface treatment process for light metals. A brief discussion regarding the advantages, principle, process parameters and applications of this process is discussed. The process owes its origin to Sluginov who discovered an arc discharge phenomenon in electrolysis in 1880. A similar process was studied and developed by Markov and coworkers in 1970s who successfully deposited an oxide film on aluminium. Several investigation thereafter lead to the establishment of suitable process parameters for deposition of a crystalline oxide film of more than $100{\mu}m$ thickness on the surface of light metals such as aluminium, titanium and magnesium. This process nowadays goes by several names such as plasma electrolytic oxidation (PEO), micro-arc oxidation (MOA), anodic spark deposition (ASD) etc. Several startups and surface treatment companies have taken up the process and deployed it successfully in a range of products, from military grade rifles to common off road sprockets. However, there are certain limitations to this technology such as the formation of an outer porous oxide layer, especially in case of magnesium which displays a Piling Bedworth ratio of less than one and thus an inherent non protective oxide. This can be treated further but adds to the cost of the process. Overall, it can be said the PEO process offers a better solution than the conventional coating processes. It offers advantages considering the fact that he electrolyte used in PEO process is environmental friendly and the temperature control is not as strict as in case of other surface treatment processes.