• Journal of Electrical Engineering and Technology
• /
• v.12 no.6
• /
• pp.2256-2261
• /
• 2017

Carbon nanotube (CNT) and alumina ($Al_2O_3$) are synthesized into hybrid composites, and an advanced electrical discharge machining (EDM) system is developed for the machining of hard and conductive materials. CNT nanoparticles are mixed with $Al_2O_3$ powder and the $Al_2O_3$/CNT slurry is sintered by spark plasma. The hardness and the electrical conductivity of the $Al_2O_3$/CNT hybrid composite were investigated. The electrical discharge is controlled by a capacitive ballast circuit. The capacitive ballast circuit is applied to the tungsten carbide and the $Al_2O_3$/CNT hybrid composite. The voltage-current waveforms and scanning electron microscope (SEM) images were measured to analyze the characteristics of the boring process. The developed EDM process can manufacture the ceramic based hybrid composites, thereby expecting the variety of applications.

• The Transactions of The Korean Institute of Electrical Engineers
• /
• v.56 no.1
• /
• pp.132-138
• /
• 2007

Carbon nanotubes (CNTs) arc grown on Ni catalysts employing an inductively-coupled plasma chemical vapor deposition (ICP-CVD) method. The structural and field-emissive properties of the CNTs grown are characterized in terms of the substrate-bias applied. Characterization using the various techniques, such as field-omission scanning electron microscopy (FESEM), high-resolution transmission electron microscopy (HRTEM), Auger spectroscopy (AES), and Raman spectroscopy, shows that the structural properties of the CNTs, including their physical dimensions and crystal qualities, as well as the nature of vertical growth, are strongly dependent upon the application of substrate bias during CNT growth. It is for the first time observed that the provailing growth mechanism of CNTs, which is either due to tip-driven growth or based-on-catalyst growth, may be influenced by substrate biasing. It is also seen that negatively substrate-biasing would promote the vertical-alignment of the CNTs grown, compared to positively substrate-biasing. However, the CNTs grown under the positively-biased condition display a higher electron-emission capability than those grown under the negatively-biased condition or without any bias applied.

• Proceedings of the International Microelectronics And Packaging Society Conference
• /
• 2000.04a
• /
• pp.109-109
• /
• 2000

Recently, carbon nanotube has been investigating for field emission display ( (FED) applications due to its high electron emission at relatively low electric field. However, the growing of carbon nanotube generally requires relatively high temperature processing such as arc-discharge (5,000 ~ $20,000^{\circ}C$) and laser evaporation (4,000 ~ $5,000^{\circ}C$) methods. In this presentation, low temperature growing of carbon nanotube by plasma enhanced chemical vapor deposition (PECVD) using nickel catalyst which is compatible to conventional FED processing temperature will be described. Carbon n notubes with average length of 100 run and diameter of 2 ~ $3\mu$ill were successfully grown on silicon substrate with native oxide layer at $550^{\circ}C$using nickel catalyst. The morphology and microstructure of carbon nanotube was highly depended on the processing temperature and nickel layer thickness. No significant carbon nanotube growing was observed with samples deposited on silicon substrates without native oxide layer. This is believed due to the formation of nickel-silicide and this deteriorated the catalytic role of nickel. The formation of nickel-silicide was confirmed by x-ray analysis. The role of native oxide layer and processing parameter dependence on microstructure of low temperature grown carbon nanotube, characterized by SEM, TEM XRD and R없nan spectroscopy, will be presented.

• Proceedings of the KIPE Conference
• /
• 2006.06a
• /
• pp.56-58
• /
• 2006

본 논문은 PVD(Physical Vapor Deposition)의 마그네트론 스퍼터(Magnetron sputter) 박막코팅(Thin film coating) 공정에서 플라즈마(Plasma)를 발생시키고 제어하는 DC 전원공급 장치에 관한 것이다. 이 논문에서는 임피던스의 변화가 심하고 아크(Arc)가 빈번히 발생하는 플라즈마 부하의 특성에 대해, 과도상태(Transient state)의 출력제어 성능을 향상시키고 아크 발생 시 부하로 전가되는 아크에너지를 저감시키기 위한 직류 전원 공급 장치에 대해 소개한다. 전원장치는 수하특성을 가지며 플라즈마 부하에 적합한 출력 제어성을 확보하고 아크 에너지를 최소화하기 위해 고주파 L-C 직렬공진회로 기법을 적용한다. 개발된 DC 20kW급 전원 장치는 인버터와 고주파 절연변압기, 정류기로 구성된다. 인버터는 $100{\sim}200kHz$의 제어주파수로 PFM 및 PWM 제어를 하며, 단위용량 5kW급 컨버터 4개를 직, 병렬 연결하여 출력리플을 최소화 하였다. 개발된 장치의 우수한 제어성능은 실제 플라즈마 공정에서 시험 평가한 결과를 통해 검증할 수 있었다.

• Proceedings of the KIEE Conference
• /
• 2002.07c
• /
• pp.1628-1630
• /
• 2002

In this paper, we measured 3-dimensional temporal behavior of the light emitted from discharge cell of plasma display panel(PDP) as a function of the pressure using the scanned point detecting system. The detected light signal through the PM tube is sent on the oscilloscope and oscilloscope which is connected to PC with GPIB. The whole system is controlled by a PC. From the temporal behavior results, we could analyze the discharge behavior of panel with Ne-Xe(4%) mixing gas and 300torr, 400torr, 500torr pressure. The top view of panel shows that the discharge moves from inner edge of cathode electrode to outer cathode electrode forming arc type. At the 300torr, initial emission time is very fast. The side view of panel shows that the light is detected up to $150{\mu}m$ height of barrier rib. In the panel of 300torr, emission distribution is wider than the others.

• Proceedings of the Korean Institute of Surface Engineering Conference
• /
• 2018.06a
• /
• pp.70.1-70.1
• /
• 2018

자동차를 포함한 수송기기, 전기 및 전자산업에 있어 경량화, 소형화, 고성능화와 함께 에너지 및 원가절감을 위한 노력이 활발하게 이루어지고 있다. 알루미늄은 신소재 및 고효율 제조공정 개발을 위한 합금설계기술, 용해/주조 기술, 가공기술, 열처리 기술, 시험평가 기술, 시뮬레이션 기술에 대한 전방위적인 연구가 진행되고 있다. 최근 프리미엄 자동차 시장에 고강도 알루미늄을 이용한 휠 시장이 폭발적으로 증가하고 있다. 2010년 전세계 자동차 휠 시장 규모는 56조원으로 알루미늄 휠 시장 규모는 약 19조원으로 점차 증가하고 있으며, CO2 배출 및 연비 증가에 대한 시대적 요구에 의해 수송기기의 경량화 및 주행 성능 향상으로 알루미늄 휠 시장 규모는 해마다 증가하고 있다. 7xxx 계열의 알루미늄 합금을 이용해 PEO (Plasma Electrolytic Oxidation) 혹은 MAO (Micro Arc Oxidation)를 이용해 표면처리를 수행하였다. 표면처리는 Silicate, Vanadate 및 Phosphate 등의 전해액을 선택적으로 사용하였으며, AC 200 ~ 500 V의 전압 조건 범위에서 CV 모드로 전류를 인가하였다. 형성된 표면 산화층은 산화막 두께 분석, 내마모 특성 평가, 염수분무 평가, 전기화학 평가(Potentiodynamic Polarization) 등을 통해 표면 산화층 분석을 진행하였다.

• Transactions of the Korean hydrogen and new energy society
• /
• v.16 no.4
• /
• pp.356-363
• /
• 2005

The purpose of this paper is to investigate the optimal condition of the Syngas production by reforming of fuel using plasmatron. Plasma was generated by air and arc discharge. The effects of applied steam, $CO_2$ or Ni-catalyst on fuel conversion, as well as hydrogen yield and $H_2$/CO ratio were studied. When the variations of $O_2$/fuel ratio, $H_2O$/fuel flow ratio and $CO_2$/fuel flow ratio were $0.94{\sim}1.48$, $4.3{\sim}10$ and $0.8{\sim}3.05$, respectively. Under the condition mentioned above, result of $H_2O$/fuel flow ratio was maximum $H_2$ concentration, or $28.2{\sim}31.6%$, and result of $H_2O$/fuel flow ratio with catalyst was minimum CO concentration or $6.6{\sim}7.1%$. and $H_2$/CO ratio were $3.89{\sim}4.86$.

• Journal of the Semiconductor & Display Technology
• /
• v.7 no.2
• /
• pp.63-67
• /
• 2008

The MgO protective layer plays an important role in plasma display panels (PDPs). Our previous work demonstrated that the properties of MgO thin film could be improved, which were deposited by ion beam assisted deposition (IBAD). However arc discharge always occurs during the IBAD process. To avoid this problem, oxygen neutral beam assisted deposition (NBAD) is used to deposit MgO thin films in this paper. The energy of the oxygen neutral beam was used as the parameter to control the deposition. The experimental results showed that the oxygen neutral beam energy was effective in determining in F/$F^+$ centers, crystal orientation, surface morphology of the MgO thin film, and the discharge characteristics of AC PDP. The lowest firing voltage $(V_f)$ and the highest secondary electron emission coefficient $(\gamma)$ were obtained when the neutral beam energy was 300 eV.

• Journal of the korean academy of Pediatric Dentistry
• /
• v.34 no.4
• /
• pp.623-631
• /
• 2007

Effect of Soft-start curing on the contraction stress of composite resin restoration polymerized with LED and plasma curing unit The purpose of this study was to evaluate the influence of soft-start light curing on contraction stress and hardness of composite resin. Composite resin (Filtek $Z-250^{TM}$, 3M ESPE, USA) was cured using the one-step continuous curing method with three difference light sources ; conventional halogen light ($XL3000^{TM}$, 3M ESPE, USA) cure for 40 seconds at $400 mw/cm^2$, LED light (Elipar Freelight $2^{TM}$, 3M-ESPE, USA) cure for 20 seconds at $800\;mW/cm^2$ a and plasma arc light ($Flipo^{TM}$, LOKKI, France) cure for 12 seconds at $1300 mW/cm^2$. For the soft-start curing method ; LED light (Elipar Freelight $2^{TM}$, 3M-ESPE, USA) cure exponential increase with 5 seconds followed by 17 seconds at $800\;mW/cm^2$ and plasma arc light ($Flipo^{TM}$, LOKKI, France) cure 2 seconds light exposure at $650\;mW/cm^2$ followed by 11 seconds at $1300\;mW/cm^2$. The strain guage method was used for determination of polymerization contraction. Measurements were recorded at each 2 second for the total of 800 seconds including the periods of light application. Obtained data were analyzed statically using Repeated measures ANOVA, One way ANOVA, and Tukey test. The results of present study can be summarized as follows: 1. Composite resin restoration showed transient expansion just after irradiation of curing light. Contraction stress was increased rapidly at the early phase of polymerization and reduced slowly as time elapsed (P<0.05). 2. Contraction stress was not revealed significant difference between Halogen curing light groups and LED and Plasma Light curing with soft-start group (P>0.05). 3. LED and Plasma Light curing with soft-start showed lower contraction stress than the one-step continuous light curing (P<0.05).

• Korean Journal of Optics and Photonics
• /
• v.13 no.6
• /
• pp.559-563
• /
• 2002

We measure the 3-dimensional temporal behavior of the light emitted from the discharge cell of a plasma display panel (PDP) by using a scanned point detecting system. The light signal detected by a PM tube is sent to the oscilloscope, and the oscilloscope is connected to a PC with GPIB. From the resultant temporal behaviors, we could analyze the discharge characteristics of the panel with a Ne-Xe (4%) mixing gas at a 400 torr pressure. The top view of the panel shows that discharge moves from the inner edge of the cathode electrode to the outer cathode electrode, forming an arc shape. The side view of the panel shows that the light is detected up to 150 $\mu\textrm{m}$ up the barrier rib. After a trigger pulse is applied, peak intensity is detected at 730 ns and peak intensity position is located at the center of the ITO electrodes.