• 제목/요약/키워드: Arc Ion plating

검색결과 140건 처리시간 0.028초

강 기판위에 아크이온 플레이팅된 CrN박막의 산화 (The Oxidation of CrN Films Arc-ion Plated on a Steel Substrate)

  • 이동복;이영찬
    • 한국재료학회지
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    • 제11권4호
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    • pp.324-328
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    • 2001
  • 아크이온 플레이팅 장치를 이용하여 STD61강 기판 위에 이온질화 전처리를 행하거나 하지 않은 후, CrN 박막을 증착하고, 대기중 $700~900^{\circ}C$의 온도에서 40시간동안 이들에 대한 산화거동을 연구하였다. 산화거동은 열중량분석기, X선회절기, EDS, SEM을 이용하여 조사하였다. 증착된 CrN박막은 CrN과 $Cr_2$N의 두 상으로 구성되어 있었다. CrN박막은 보호적 $Cr_2$O$_3$층을 형성하여 기판을 산화로부터 보호하였다. 이온질화처리는 CrN박막의 내산화성에 영향을 주지 않았다.

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Cr-Si-Al-N 코팅의 상형성 및 표면 물성에 미치는 Si 함량의 영향 (Effect of Si Content on the Phase Formation Behavior and Surface Properties of the Cr-Si-Al-N Coatings)

  • 최선아;김형순;김성원;;김형태;오윤석
    • 한국표면공학회지
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    • 제49권6호
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    • pp.580-586
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    • 2016
  • Cr-Si-Al-N coating with different Si content were deposited by hybrid physical vapor deposition (PVD) method consisting of unbalanced magnetron (UBM) sputtering and arc ion plating (AIP). The deposition temperature was $300^{\circ}C$, and the gas ratio of $Ar/N_2$ were 9:1. The CrSi alloy and aluminum targets used for arc ion plating and sputtering process, respectively. Si content of the CrSi alloy targets were varied with 1 at%, 5 at%, and 10 at%. The phase analysis, composition and microstructural analysis performed using x-ray diffraction (XRD) and field emission scanning electron microscopy (FESEM) including energy dispersive spectroscopy (EDS), respectively. All of the coatings grown with textured CrN phase (200) plane. The thickness of the Cr-Si-Al-N films were measured about $2{\mu}m$. The friction coefficient and removal rate of films were measured by a ball-on-disk test under 20N load. The friction coefficient of all samples were 0.6 ~ 0.8. Among all of the samples, the removal rate of CrSiAlN (10 at% Si) film shows the lowest values, $4.827{\times}10^{-12}mm^3/Nm$. As increasing of Si contents of the CrSiAlN coatings, the hardness and elastic modulus of CrSiAlN coatings were increased. The morphology and composition of wear track of the films was examined by scanning electron microscopy (SEM) and energy dispersive spectroscopy, respectively. The surface energy of the films were obtained by measuring of contact angle of water drop. Among all of the samples, the CrSiAlN (10 at% Si) films shows the highest value of the surface energy, 41 N/m.

Influence of processing parameters for adhesion strength of TiN films prepared by AIP technique

  • ;주윤곤;조동율;윤재홍;송기오
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2007년도 추계학술대회 논문집
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    • pp.140-141
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    • 2007
  • The arc ion plating (AIP) technique has been used widely for thin coating in the area of surface engineering. The TiN coating is important in the field of dies, cutting tools and other mechanical parts. When forming the TiN films by AIP technique, the processing parameters such as arc power, bias voltage, working pressure, temperature of substrate and pre-treatment affected the adhesion respectively. The results of scratch test revealed that the adhesion strength was influenced by arc power most strongly. And a sequence of the importance of each parameters has been obtained. The crystal structure and cross-section of TiN films are also be investigated.

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TiN 및 TiCN 코팅 특성이 공구수명에 미치는 영향에 대한 연구 (The effect of TiN and coating parameters on the tool life extension)

  • 백영남;정우창
    • 한국표면공학회지
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    • 제31권6호
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    • pp.317-324
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    • 1998
  • TiN and TiCN films were deposited on the high speed steel by Cathode Arc Ion Plating(CAIP) Process to investigate the tool life extension effect. The experiment variables were bias voltage and deposit time for the TiN coating and reactive gas flow rate ($CH_4:N_2$) under fixing deposit pressure, are current, bias voltage for the TiCN coating respectively. The micro structure and mechanical properties were investigated and compared for among the coating conditions using various methods and machining practice.

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Negative bias voltage effect에 따른 Cr-Si-N 박막의 미세구조에 대한 연구 (Influence of negative bias voltage on the microstructure of Cr-Si-N films deposited by a hybrid system of AIP plus MS)

  • 신정호;김광호
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2009년도 춘계학술대회 논문집
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    • pp.130-131
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    • 2009
  • AIP(arc ion plating)방법과 마그네슘 스퍼터링(DC reactive magnetron sputtering) 방법을 결합시킨 하이브리드 코팅 시스템으로 Cr-Si-N 코팅막을 합성하였다. 고분해능 TEM 및 SEM 분석들로부터 negative bias voltage에 따른 미세구조의 영향을 나타내었다. negative bias voltage의 증가에 따라 columnar microstructure가 amorphous microstructure로 변화하였다. bias voltage effect에 의해 Cr-Si-N 코팅막내 입자의 크기가 미세해지고 나노 복합체를 잘 형성하였다.

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질소 함량에 따른 TiAlSiN 코팅층의 나노 기계적 특성 평가 (The Study of Nano-Mechanical Properties of TiAlSiN Coating Layer with Nitrogen Content)

  • 강보경;최용;백열
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2015년도 추계학술대회 논문집
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    • pp.255-255
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    • 2015
  • 나노압침방법을 적용하여 arc ion plating을 통해 제조된 TiAlSiN 코팅층의 질소 함량에 따른 나노 기계적 특성을 평가하였다. 코팅층의 질소 함량은 28~30 [at.%] 이었다. 코팅층에는 AlN, TiSi, $Al_5Ti_3$, $Ti_3AlN$, $Al_5Ti_2$ 상이 형성되었다. 질소 함량이 더 작은 코팅층의 나노경도, 마찰계수, 피로한계의 값이 높아짐을 알 수 있었다.

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알루미늄합금 모재에 TiN박막을 증착한 자전거 서스펜션 포크 프레임의 특성평가 (Properties of Suspension Fork Frame on Aluminum Alloy with TiN film)

  • 오정석;정선일;권아람;정우창
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2013년도 춘계학술대회 논문집
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    • pp.206-206
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    • 2013
  • 산악자전거 서스펜션 포크 프레임의 소재 개발을 위해 Si, Mn, Mg, Cr, Zn 원소의 첨가량을 조정한 500MPa 인장강도를 가지는 압출성형과 용접성이 우수한 알루미늄 합금을 개발하였다. 개발한 고비강도 경량 알루미늄합금 위에 고경도, 고기능성과 같은 우수한 기계적 물성을 가진 TiN 박막을 Arc ion plating 공정으로 코팅하여 알루미늄합금의 내부식성, 내구성을 향상시켰다.

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금속 절삭공구에 대한 PVD 코팅기술의 동향 (Tendency of PVD coating technology on Metal cutting tools)

  • 김종성
    • 한국정밀공학회지
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    • 제18권8호
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    • pp.11-17
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    • 2001
  • Industrial use of physical vapor deposition(PVD) has been widely expanded during last two decades, and in the mean time plasma assistance in PVD has become an essential tool in preparing compound films with dense microstructure. The principles of electron beam-based plating, balanced and unbalanced magnetron sputtering and cathodic arc deposition. consisting three basic configuration of plasma assisted PVD(PAPVD)process, were reviewed. Recent technical development in PVD coating process were discussed. This paper tries to show tendency for developing new coating film on cutting tools.

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