• 제목/요약/키워드: Ar-$H_2$

검색결과 960건 처리시간 0.026초

열 화학적 환원 처리를 이용한 절연체 12CaO·7Al2O3의 전도체로의 전환 (Transition of 12CaO·7Al2O3 electrical insulator to the permanent semiconductor using via thermo-chemical reduction treatment)

  • 정준호;은종원;오동근;김광진;홍태의;정성민;최봉근;심광보
    • 한국결정성장학회지
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    • 제20권4호
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    • pp.178-184
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    • 2010
  • 마이크로 웨이브 연소합성법(microwave-assistant combustion method)를 이용하여 $12CaO{\cdot}7Al_2O_3$(C12A7) 분말을 성공적으로 제작하였고, $H_2$ 가스 분위기에서의 후열처리를 통하여 C12A7:H 제작에 성공하였다. 분말의 합성 여부 와 결정성 확인 및 분말 하소 시 온도에 따른 반응 분석을 위하여 X-ray diffraction(XRD) 및 TG-DSC 분석을 시행하였다. 또한, 후 열처리 후 C12A7 cage 내부의 자유산소 이온이 수소 이온으로 치환되었는지 확인하기 위하여 TG-MS 분석을 시행하였고, $289.5^{\circ}C$에서 H와 $H_2$ 가스가 방출되는 것이 확인되었으므로, H 이온이 cage 내부로 치환된 것을 확인시켜준다. 성공적으로 치환된 C12A7:H 를 홀 측정기(Hall measurement)를 이용하여 전도성을 측정하여 본 결과 $1000^{\circ}C$, Ar/H=8:2의 분위기에서 8h 이상 처리된 C12A7:H의 경우 상온(300 K)에서 $10^2{\Omega}{\cdot}cm$의 비저항 값을 나타내었다.

황기와 행인(杏仁)이 면역세포(免疫細胞)의 Apoptosis 및 Nitric Oxide에 미치는 효과(效果) (The effect of Astragali Radix and Armeniacae Semen on the apoptosis of immunocytes and nitric oxide production from peritoneal macrophages)

  • 정현우;문한주
    • 대한한의학방제학회지
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    • 제6권1호
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    • pp.175-186
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    • 1998
  • The purpose of this research was to investigate effects of Astragali Radix(AR) and Armeniacae Semen(AS) on T-lymphocytes and peritoneal macrophages in mice. The proliferation of thymocytes and splenocytes were teated using macroplate-reader. The apoptosis and sub-population of T-lymphocytes were tested using a flow cytometer. Nitric oxide production was tested using a Griess reagents. The result were obtained as follow; 1. AR increased the proliferation of thymocytes and splenocytes. 2. AS decreased the proliferation of thymocytes and splenocytes. 3. AR and AS decreased No production fron peritoneal macrophages 4. AR and AS were accelerate T-lymphocytes apoptosis. 5. AR and AS increased $T_C$ cells population, but decreased $T_H$ cells population of T-lymphocyte.

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저온 분사 공정으로 제조된 티타늄 코팅층의 치밀화에 미치는 열처리 분위기의 영향 (Effect of Heat Treatment Environment on the Densification of Cold Sprayed Ti Coating Layer)

  • 유지상;김형준;오익현;이기안
    • 한국분말재료학회지
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    • 제19권2호
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    • pp.110-116
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    • 2012
  • This study investigated the effects of annealing environment for the densification and purification properties of pure titanium coating layer manufactured by cold spraying. The annealing was conducted at $600^{\circ}C$/1 h and three kinds of environments of vacuum, Ar gas, and $5%H_2+Ar$ mixture gas were controlled. Cold sprayed Ti coating layer (as sprayed) represented 6.7% of porosity and 228 HV of hardness, showing elongated particle shapes (severe plastic deformation) perpendicular to injection direction. Regardless of gas environments, all thermally heat treated coating layers consisted of pure ${\alpha}$-Ti and minimal oxide. Vacuum environment during heat treatment represented superior densification properties (3.8% porosity, 156.7 HV) to those of Ar gas (5.3%, 144.5 HV) and $5%H_2+Ar$ mixture gas (5.5%, 153.1 HV). From the results of phase analysis (XRD, EPMA, SEM, EDS), it was found that the vacuum environment during heat treatment could be effective for reducing oxide contents (purification) in the Ti coating layer. The characteristic of microstructural evolution with heat treatment was found to be different at three different gas environments. The controlling method for improving densification and purification in the cold sprayed Ti coating material was also discussed.

폴리머 기판상에 합성된 저온 ITO 박막에 미치는 $Ar\;+\;H_2$ 플라즈마의 영향 (The effect of $Ar\;+\;H_2$ Plasma on the Low Temperature ITO Film Synthesized on Polymer)

  • 문창성;정윤모;이호영;김용모;김갑석;;한전건
    • 한국표면공학회지
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    • 제39권5호
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    • pp.206-209
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    • 2006
  • Indium tin oxide (ITO) films were synthesized on polymer (PES, polyethersulfone) at room temperature by pulsed DC magnetron sputtering. By the control of introducing hydrogen to argon atmosphere, the resistivity of ITO films was obtained at $5.27\;{\times}\;10^{-4}\;{\Omega}{\cdot}cm$ without substrate heating in comparison with $2.65\;{\times}\;10{-3}\;{\Omega}{\cdot}cm$ under hydrogen free condition. ITO film synthesized at Ar condition was changed from amorphous to crystalline. These result from the enhancement of electron temperature in $Ar\;+\;H_2$ plasma, which induces the increase of ionization of target materials and argon. The dominant increase of ions such as In II and O II and neutral Sn I was monitored by optical emission spectroscopy (OES). Thermal energy required for the crystalline film formation is compensated by kinetic energy transfer through ion bombardments to substrate.

자기제한적 표면반응에 의한 ZnO 박막성장 및 기판온도에 따른 박막특성 (Self-Limiting Growth of ZnO Thin Films and Substrate-Temperature Effects on Film Properties)

  • 이두형;권새롬;이석관;노승정
    • 한국진공학회지
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    • 제18권4호
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    • pp.296-301
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    • 2009
  • ZnO에 대한 박막증착 연구를 위하여 유도결합 플라즈마 원자층박막증착(inductively coupled plasma assisted atomic layer deposition: ICP-ALD) 장치를 제작하고, 장치에 대한 기본 공정조건을 설정하기 위하여 플라즈마를 유도하지 않은 상태에서 p-type Si(100) 기판 위에 ZnO 박막을 증착하는 다양한 실험을 수행하였다. Zn 전구체(precursor)로는 Diethyl zinc [$Zn(C_2H_5)_2$, DEZn]를, 반응가스(reaction gas)로는 $H_2O$를, 캐리어(carrier) 및 퍼지가스(purge gas)로는 Ar을 사용하였다. 기판온도 $150^{\circ}C$에서 DEZn, $H_2O$, Ar의 공급시간을 변화시켜가면서 자기제한적 표면반응(self-limiting surface reaction)에 의한 박막성장조건을 성공적으로 유도하였다. 기판온도를 변화시켜가면서($90{\sim}210^{\circ}C$) 증착실험을 반복하여, 본 장치에 대한 ALD 공정온도(thermal ALD process window)를 확립하고 성장된 ZnO박막에 대한 증착특성, 결정성, 불순물 및 내부조성비등을 조사하였다. ALD 공정온도는 기판온도 $110{\sim}190^{\circ}C$로써 이 구간에서의 박막 평균증착률은 0.29 nm/cycle로 일정하게 나타났다. 기판온도가 높아질수록 결정성이 향상되어 ZnO(002) 피크가 우세하였다. 모든 ALD 공정온도에서 Zn와 O로만 구성된 고순도의 ZnO 박막을 실현하였는데, 온도가 높아질수록 Zn와 O의 비가 1에 근접하며 안정된 hexagonal wurtzite ZnO 구조의 박막이 성장되었다.

결정질 실리콘 태양전지의 이중 반사방지막 특성에 대한 연구 (Characteristics of Crystalline Silicon Solar Cells with Double Layer Antireflection Coating by PECVD)

  • 김진국;박제준;홍지화;김남수;강기환;유권종;송희은
    • 한국태양에너지학회:학술대회논문집
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    • 한국태양에너지학회 2012년도 춘계학술발표대회 논문집
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    • pp.243-247
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    • 2012
  • The paper focuses on an anti-reflection (AR) coating deposited by PECVD in silicon solar cell fabrication. AR coating is effective to reduce the reflection of the light on the silicon wafer surface and then increase substantially the solar cell conversion efficiency. In this work, we carried out experiments to optimize double AR coating layer with silicon nitride and silicon oxide for the silicon solar cells. The p-type mono crystalline silicon wafers with $156{\times}156mm^2$ area, 0.5-3 ${\Omega}{\cdot}cm$ resistivity, and $200{\mu}m$ thickness were used. All wafers were textured in KOH solution, doped with $POCl_3$ and removed PSG before ARC process. The optimized thickness of each ARC layer was calculated by theoretical equation. For the double layer of AR coating, silicon nitride layer was deposited first using $SiH_4$ and $NH_3$, and then silicon oxide using $SiH_4$ and $N_2O$. As a result, reflectance of $SiO_2/SiN_x$ layer was lower than single $SiN_x$ and then it resulted in increase of short-circuit current and conversion efficiency. It indicates that the double AR coating layer is necessary to obtain the high efficiency solar cell with PECVD already used in commercial line.

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Fermented red ginseng and ginsenoside Rd alleviate ovalbumin-induced allergic rhinitis in mice by suppressing IgE, interleukin-4, and interleukin-5 expression

  • Kim, Hye In;Kim, Jeon-Kyung;Kim, Jae-Young;Han, Myung Joo;Kim, Dong-Hyun
    • Journal of Ginseng Research
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    • 제43권4호
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    • pp.635-644
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    • 2019
  • Background: To increase the pharmacological effects of red ginseng (RG, the steamed root of Panax ginseng Meyer), RG products modified by heat process or fermentation have been developed. However, the antiallergic effects of RG and modified/fermented RG have not been simultaneously examined. Therefore, we examined the allergic rhinitis (AR)-inhibitory effects of water-extracted RG (wRG), 50% ethanol-extracted RG (eRG), and bifidobacteria-fermented eRG (fRG) in vivo. Methods: RBL-2H3 cells were stimulated with phorbol 12-myristate-13-acetate/A23187. Mice with AR were prepared by treatment with ovalbumin. Allergic markers IgE, tumor necrosis factor-${\alpha}$, interleukin (IL)-4, and IL-5 were assayed in the blood, bronchoalveolar lavage fluid, nasal mucosa, and colon using enzyme-linked immunosorbent assay. Mast cells, eosinophils, and Th2 cell populations were assayed using a flow cytometer. Results: RG products potently inhibited IL-4 expression in phorbol 12-myristate-13-acetate/A23187-stimulated RBL-2H3 cells. Of tested RG products, fRG most potently inhibited IL-4 expression. RG products also alleviated ovalbumin-induced AR in mice. Of these, fRG most potently reduced nasal allergy symptoms and blood IgE levels. fRG treatment also reduced IL-4 and IL-5 levels in bronchoalveolar lavage fluid, nasal mucosa, and reduced mast cells, eosinophils, and Th2 cell populations. Furthermore, treatment with fRG reduced IL-4, IL-5, and IL-13 levels in the colon and restored ovalbumin-suppressed Bacteroidetes and Actinobacteria populations and ovalbumin-induced Firmicutes population in gut microbiota. Treatment with ginsenoside Rd significantly alleviated ovalbumin-induced AR in mice. Conclusion: fRG and ginsenoside Rd may alleviate AR by suppressing IgE, IL-4, IL-5, and IL-13 expression and restoring the composition of gut microbiota.

배추흰나비 용기 특이 큐티클 단백질의 시공간적 역할 (Temporal and Spatial Role of Pupal Stage Specific Cuticle Protein in Artogeia rapae)

  • 신명자;박정남;서을원
    • 생명과학회지
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    • 제17권2호통권82호
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    • pp.223-229
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    • 2007
  • 배추흰나비 날개 형성기 동안 용기 특이 큐티클 단백질의 국소부위에 따른 분포와 신생조직합성에 있어 이의 시공간적 역할을 조사하였다. 큐티클에서 27 kd 단백질은 국소 부위에 따른 질적 변화는 거의 없으나 용 초이게 비교적 높은 농도를 보이다가 성충기로 감에 따라 서서히 농도가 낮아지는 양적인 변화를 나타내고 있다. 지방체에서 27 kd 단백질은 용화 후 3일까지는 흉부와 복부에서 전시기에 걸쳐 확인되고 있지만 그 이후 부터는 농도가 감소하는 경향을 나타내고 있다. Western blot 상에서도 27 kd 큐티클 단백질의 흉부와 복부의 국소적인 분포에는 거의 차이가 없으나 용말기와 성충 날개큐티클에서는 동질성을 보여주고 있다. $^{3}H-leucine$은 흉부와 복부 큐티클의 27 kd 단백질에 시공간적인 차이를 두고 통합되고 있으며, 용말기와 우화직전 흉부 큐티클과 복부 큐티클의 27 kd 단백질에서는 확인되지 않았으나 우화직전과 직후의 날개큐티클에 통합되는 패턴을 보여주고 있다. 지방체와 표피에서도 27 kd 단백질에 대한 통합이 두드러지게 나타나고 있다. 27 kd 용기 특이 큐티클 단백질은 국소 부위에 따른 질적, 양적 차이는 나타나지 않았으나 날개 형성기 동안 부분적으로 27 kd 단백질이 포함된 endocuticle이 소화, 재흡수 과정을 통해 성충 날개 큐티클의 형성에 관여할 것으로 생각된다.

IC용 초정밀 박막저항소자의 제조와 특성연구 (Preparation of Precision Thin Film Resistor Sputtered by Magnetron Sputtering)

  • 하흥주;장두진;문상용;박차수;조정수;박정후
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1994년도 하계학술대회 논문집 C
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    • pp.1236-1238
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    • 1994
  • TiAlN thin films were prepared by a multi target r.f magnetron sputtering system under different conditions. We have investigated the resistivity and T.C.R. (Temperature Coefficient of Resistance) characteristics of TiAlN films deposited on $Al_2O_3$ and glass substrates by sputtering in an $Ar:N_2$ gas mixture. We used Al and Ti metal as Target Material and $Ar:N_2$ gas as working gas. We varied the partial pressure ratio of $N_2/Ar$ from 0.2/7 to 1.0/6.2 (SCCM). And the R.F power of Ti and Al Target also were varied as 160/240, 200/200 and 240/160(W). In this experiment, we can get the precision thin film resistor with a very low T.C.R. (Temperature Coefficient of Resistance) below 25 ppm ${\Omega}/^{\circ}C$.

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