• Title/Summary/Keyword: Ar rate

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Fast Neutron Beam Dosimetry (속중성자선의 선량분포에 관한 연구)

  • 지영훈;이동한;류성렬;권수일;신동오;박성용
    • Progress in Medical Physics
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    • v.8 no.2
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    • pp.45-57
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    • 1997
  • It is mandatory to measure accurately the dose distribution and the total absorbed dose of fast neutron for putting it to the clinical use. At present the methods of measurement of fast neutron are proposed largely by American Associations of Physicists in Medicine, European Clinical Neutron Dosimetry Group, and International Commission on Radiation Units and Measurements. The complexity of measurement, however, induces the methodological differences between them. In our study, therefore, we tried to establish a unique technique of measurement by means of measuring the emitted doses and the dose distribution of fast neutron beam from neutron therapy machine, and to invent a standard method of measurement adequate to our situation. For measuring the absorbed doses and the dose distribution of fast neutron beam, we used IC-17 and IC-18 ion chambers manufactured by A-150 plastic(tissue-equivalent material), IC-17M ion chamber manufactured by magnesium, TE gas and Ar gas, and RDM 2A electrometer. The magnitude of gamma-contamination intermingled with fast neutron beam was about 13% at 5cm depth of standard irradiated field, and increased as the depth was increased. At the central axis the maximum dose depth and 50% dose depth were 1.32cm and 14.8cm, respectively. The surface dose rate was 41.6-54.1% throughout the entire irradiated fields and increased as the irradiated fields were increased. Beam profile was that the horn effect of about 7.5% appeared at 2.5cm depth and the flattest at 10cm depth.

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Study of Magnetic Field Shielded Sputtering Process as a Room Temperature High Quality ITO Thin Film Deposition Process

  • Lee, Jun-Young;Jang, Yun-Sung;Lee, You-Jong;Hong, Mun-Pyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.288-289
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    • 2011
  • Indium Tin Oxide (ITO) is a typical highly Transparent Conductive Oxide (TCO) currently used as a transparent electrode material. Most widely used deposition method is the sputtering process for ITO film deposition because it has a high deposition rate, allows accurate control of the film thickness and easy deposition process and high electrical/optical properties. However, to apply high quality ITO thin film in a flexible microelectronic device using a plastic substrate, conventional DC magnetron sputtering (DMS) processed ITO thin film is not suitable because it needs a high temperature thermal annealing process to obtain high optical transmittance and low resistivity, while the generally plastic substrates has low glass transition temperatures. In the room temperature sputtering process, the electrical property degradation of ITO thin film is caused by negative oxygen ions effect. This high energy negative oxygen ions(about over 100eV) can be critical physical bombardment damages against the formation of the ITO thin film, and this damage does not recover in the room temperature process that does not offer thermal annealing. Hence new ITO deposition process that can provide the high electrical/optical properties of the ITO film at room temperature is needed. To solve these limitations we develop the Magnetic Field Shielded Sputtering (MFSS) system. The MFSS is based on DMS and it has the plasma limiter, which compose the permanent magnet array (Fig.1). During the ITO thin film deposition in the MFSS process, the electrons in the plasma are trapped by the magnetic field at the plasma limiters. The plasma limiter, which has a negative potential in the MFSS process, prevents to the damage by negative oxygen ions bombardment, and increases the heat(-) up effect by the Ar ions in the bulk plasma. Fig. 2. shows the electrical properties of the MFSS ITO thin film and DMS ITO thin film at room temperature. With the increase of the sputtering pressure, the resistivity of DMS ITO increases. On the other hand, the resistivity of the MFSS ITO slightly increases and becomes lower than that of the DMS ITO at all sputtering pressures. The lowest resistivity of the DMS ITO is $1.0{\times}10-3{\Omega}{\cdot}cm$ and that of the MFSS ITO is $4.5{\times}10-4{\Omega}{\cdot}cm$. This resistivity difference is caused by the carrier mobility. The carrier mobility of the MFSS ITO is 40 $cm^2/V{\cdot}s$, which is significantly higher than that of the DMS ITO (10 $cm^2/V{\cdot}s$). The low resistivity and high carrier mobility of the MFSS ITO are due to the magnetic field shielded effect. In addition, although not shown in this paper, the roughness of the MFSS ITO thin film is lower than that of the DMS ITO thin film, and TEM, XRD and XPS analysis of the MFSS ITO show the nano-crystalline structure. As a result, the MFSS process can effectively prevent to the high energy negative oxygen ions bombardment and supply activation energies by accelerating Ar ions in the plasma; therefore, high quality ITO can be deposited at room temperature.

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Characteristic of Ru Thin Film Deposited by ALD

  • Park, Jingyu;Jeon, Heeyoung;Kim, Hyunjung;Kim, Jinho;Jeon, Hyeongtag
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.78-78
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    • 2013
  • Recently, many platinoid metals like platinum and ruthenium have been used as an electrode of microelectronic devices because of their low resistivity and high work-function. However the material cost of Ru is very expensive and it usually takes long initial nucleation time on SiO2 during chemical deposition. Therefore many researchers have focused on how to enhance the initial growth rate on SiO2 surface. There are two methods to deposit Ru film with atomic layer deposition (ALD); the one is thermal ALD using dilute oxygen gas as a reactant, and the other is plasma enhanced ALD (PEALD) using NH3 plasma as a reactant. Generally, the film roughness of Ru film deposited by PEALD is smoother than that deposited by thermal ALD. However, the plasma is not favorable in the application of high aspect ratio structure. In this study, we used a bis(ethylcyclopentadienyl)ruthenium [Ru(EtCp)2] as a metal organic precursor for both thermal and plasma enhanced ALDs. In order to reduce initial nucleation time, we use several methods such as Ar plasma pre-treatment for PEALD and usage of sacrificial RuO2 under layer for thermal ALD. In case of PEALD, some of surface hydroxyls were removed from SiO2 substrate during the Ar plasma treatment. And relatively high surface nitrogen concentration after first NH3 plasma exposure step in ALD process was observed with in-situ Auger electron spectroscopy (AES). This means that surface amine filled the hydroxyl removed sites by the NH3 plasma. Surface amine played a role as a reduction site but not a nucleation site. Therefore, the precursor reduction was enhanced but the adhesion property was degraded. In case of thermal ALD, a Ru film was deposited from Ru precursors on the surface of RuO2 and the RuO2 film was reduced from RuO2/SiO2 interface to Ru during the deposition. The reduction process was controlled by oxygen partial pressure in ambient. Under high oxygen partial pressure, RuO2 was deposited on RuO2/SiO2, and under medium oxygen partial pressure, RuO2 was partially reduced and oxygen concentration in RuO2 film was decreased. Under low oxygen partial pressure, finally RuO2 was disappeared and about 3% of oxygen was remained. Usually rough surface was observed with longer initial nucleation time. However, the Ru deposited with reduction of RuO2 exhibits smooth surface and was deposited quickly because the sacrificial RuO2 has no initial nucleation time on SiO2 and played a role as a buffer layer between Ru and SiO2.

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A Study on the Taxation Equity between Non-Residential Real Estate and Apartment Houses (비주거용 부동산과 아파트의 과세형평성에 관한 연구)

  • Im, Dong Heok;Choi, Min Seub
    • Korea Real Estate Review
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    • v.27 no.3
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    • pp.87-102
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    • 2017
  • The purpose of this study was to compare the taxation equity of non-residential collective real estate based on its standard market prices set by National Tax Service and those for taxation set by the Ministry of Government Administration and Home Affairs with that of the apartment houses in Seoul, South Korea. The study findings were as follows. First, the analysis results of the standard market price rates of non-residential collective real estate pointed to a huge gap in the assessment rate (AR) of the taxation standards among the Gu offices. Second, there was a big coefficient of dispersion (COD) in the standard market prices of non-residential collective real estate, which confirmed the presence of horizontal inequity. Finally, there was regressive vertical inequity, which leads to the undervaluation of high-value assets, in the standard market prices of non-residential collective real estate. The evaluation of the standard market prices of non-residential collective real state should thus reflect the market prices and the addition and assessment of the land and buildings to achieve taxation equity. Based on these findings, it is hoped that this study will make a significant contribution to the improvement of the official announcement system for non-residential real estate based on real transactions during the shift to such system.

Effect of Temperature on Growth of Tin Oxide Nanostructures (산화주석 나노구조물의 성장에서 기판 온도의 효과)

  • Kim, Mee-Ree;Kim, Ki-Chul
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.20 no.4
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    • pp.497-502
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    • 2019
  • Metal oxide nanostructures are promising materials for advanced applications, such as high sensitive gas sensors, and high capacitance lithium-ion batteries. In this study, tin oxide (SnO) nanostructures were grown on a Si wafer substrate using a two-zone horizontal furnace system for a various substrate temperatures. The raw material of tin dioxide ($SnO_2$) powder was vaporized at $1070^{\circ}C$ in an alumina crucible. High purity Ar gas, as a carrier gas, was flown with a flow rate of 1000 standard cubic centimeters per minute. The SnO nanostructures were grown on a Si substrate at $350{\sim}450^{\circ}C$ under 545 Pa for 30 minutes. The surface morphology of the as-grown SnO nanostructures on Si substrate was characterized by field-emission scanning electron microscopy (FE-SEM) and atomic force microscopy (AFM). Raman spectroscopy was used to confirm the phase of the as-grown SnO nanostructures. As the results, the as-grown tin oxide nanostructures exhibited a pure tin monoxide phase. As the substrate temperature was increased from $350^{\circ}C$ to $424^{\circ}C$, the thickness and grain size of the SnO nanostructures were increased. The SnO nanostructures grown at $450^{\circ}C$ exhibited complex polycrystalline structures, whereas the SnO nanostructures grown at $350^{\circ}C$ to $424^{\circ}C$ exhibited simple grain structures parallel to the substrate.

A Study on the Activation Measures of Library's Online Services to Overcome COVID-19 (코로나 19 극복을 위한 도서관 온라인서비스 활성화 방안에 관한 연구)

  • Noh, Younghee;Kang, Pil Soo;Kim, Yoon-Jeong
    • Journal of Korean Library and Information Science Society
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    • v.51 no.4
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    • pp.185-210
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    • 2020
  • The library faced an unexpected crisis of COVID-19, and as a countermeasure strategy, non-face-to-face online service has been reinforced. Therefore, this study attempted to present a plan to overcome the challenges arising from rapidly changing external environment and current crisis. To this end, data search, electronic library, library service, cultural event and open space management status of 288 public libraries serviced as an integrated site were investigated. Based on this, the meaning of online services in the post-COVID-19 era and the implication of it were examined. As a result, first, the increase in the use rate of online data search services with the spread of non-face-to-face culture, second, the expansion of the services of the electronic library, third, the diversification of non-face-to-face, online services, fourth, expansion of online cultural event services, fifth, the diversification of open space services were proposed, sixth, Introduced an artificial intelligence system for unattended loan return based on access and the Seventh, expansion of experiential cultural support services and educational contents through VR, AR and MR. It is deemed necessary for the research on the future direction of the library's non-face-to-face services to be conducted by investigating the current status of online services in various types of libraries and the types and case studies of library services in the era of COVID-19.

Numerical Analysis Study on the Turbulent Flow Characteristics around the Rotor Sail for Vessels (선박용 로터세일 주위의 난류 유동특성에 관한 수치해석적 연구)

  • Kim, Jung-eun;Cho, Dae-Hwan;Lee, Chang-Yong
    • Journal of the Korean Society of Marine Environment & Safety
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    • v.28 no.4
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    • pp.648-656
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    • 2022
  • As environmental regulations such as the International Maritime Organization (IMO)'s strategy to reduce greenhouse gases(GHG) are strengthened, technology development such as eco-friendly ships and alternative fuels is expanding. As part of this, ship propulsion technology using energy reduction and wind propulsion technology is emerging, especially in shipping companies and shipbuilders. By securing wind propulsion technology and introducing empirical research into shipbuilding and shipping, a high value-added market using eco-friendly technology can be created. Moreover, by reducing the fuel consumption rate of operating ships, GHG can be reduced by 6-8%. Rotor Sail (RS) technology is to generate a hydrodynamic lift in the vertical direction of the cylinder when the circular cylinder rotates at a constant speed and passes through the fluid. This is called the Magnus effect, and this study attempted to propose a plan to increase propulsion efficiency through a numerical analysis study on turbulence flow characteristics around RS, a wind power assistance propulsion system installed on a ship. Therefore, CL and CD values according to SR and AR changes were derived as parameters that affect the aerodynamic force of the RS, and the flow characteristics around the rotor sail were compared according to EP application.

Evaluation of water quality in the Sangsa Lake under climate change by combined application of HSPF and AEM3D (HSPF 와 AEM3D를 이용한 기후변화에 따른 상사호 유역의 수질오염 부하 및 댐 내 수질 변화 특성 분석)

  • Goh, Nayeon;Kim, Jaeyoung;Seo, Dongil
    • Journal of Korea Water Resources Association
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    • v.55 no.11
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    • pp.877-886
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    • 2022
  • This study was carried out to analyze how the flow and water quality of the Sangsa Lake (juam control basin) change according to future climate change and what countermeasures are needed. Aquatic Ecosystem Model) was used in conjunction. As climate change scenarios, RCP (Representative Concentration Pathways) 4.5 and RCP 8.5 scenarios of AR5 (5th Assessment Report) according to the Intergovernmental Panel on Climate Change (IPCC) were used. For the climate change scenario, detailed data on the Sangsa Lake basin were used by the Korea Meteorological Administration, and after being evaluated as a correction and verification process for the 10-year period from 2012 to 2021, the present, 2025-2036, 2045- The summer period from June to August and the winter period from December to February were analyzed separately for each year by dividing it into 2056 and 2075-2086. RCP 8.5 was higher than RCP 4.5 as an arithmetic mean for the flow rate of the watershed of the superior lake for the entire simulation period, and TN and TP also showed a tendency to be higher at RCP 4.5. However, in RCP 8.5, the outflow of pollutants decreased during the dry season and the outflow of pollutants increased during the summer, indicating that the annual pollutant outflow was concentrated during the flood season, and it is analyzed that countermeasures are needed.

Study on the characteristics of transition metals for TSSG process of SiC single crystal (SiC 단결정의 TSSG 공정을 위한 전이금속 특성 연구)

  • Lee, Seung-June;Yoo, Yong-Jae;Jeong, Seong-Min;Bae, Si-Young;Lee, Won-Jae;Shin, Yun-Ji
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.32 no.2
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    • pp.55-60
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    • 2022
  • In this study, a heat treatment experiment was conducted to select a new melt composition that can easily control the unintentionally doped nitrogen (N-UID) without degrading the SiC single crystal quality during TSSG process. The experiment was carried out for about 2 hours at a temperature of 1900℃ under Ar atmosphere. The used melt composition is based on either Si-Ti 10 at% or Si-Cr 30 at%, and also Co or Sc transition metals, which are effective for carbon solubility, were added at 3 at%, respectively. After the experiment, the crucible was cross-sectionally cut, and evaluated the Si-C reaction layer on the crucible-melt interface. As a result, with Sc addition, Si-C reaction layers uniformly occurred with a Si-infiltrated layer (~550 ㎛) and a SiC interlayer (~23 ㎛). This result represented that the addition of Sc is an effective transition metal with high carbon solubility and can feed carbon sources into the melt homogeneously. In addition, Sc is well known to have low reactivity energy with nitrogen compared to other transition metals. Therefore, we expect that both growth rate and Nitrogen UID can be controlled by Si-Sc based melt in the TSSG process.

Effect of Incubation Temperature and pH on Chlamydospores Germination of Cylindrocarpon destructans Causing Root Rot of Panax ginseng (인삼 뿌리썩음병균 Cylindrocarpon destructans의 후막포자 발아에 미치는 배양온도 및 pH의 효과)

  • 조대휘;유연현
    • Journal of Ginseng Research
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    • v.25 no.3
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    • pp.136-140
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    • 2001
  • Effects of incubation temperature and pH on chlamydospore germination of Cylindrocarpon destrcutans (isolate CY-9802) causing root rot of Panax ginseng were studied. Germination rate of the chlamydospores on Czapek solution agar(CSA) was higher than on potato dextrose agar(PDA) at the incubation temperatures tested. The chlamydospores were able to be germinated at range of 5$\^{C}$ to 30$\^{C}$ after 48 hours incubation on CSA. Germination rate was 53.2∼6.27% at range of 15$\^{C}$ to 25$\^{C}$, and the optimum temperature was 20$\^{C}$, whereas they were very low at 30$\^{C}$ on PDA. Germination rate was 43.6% to 47.9% at range of 10$\^{C}$ to 20$\^{C}$, and the optimum temperature was 20$\^{C}$ as well. They were able to be germinated at pH of 5.2 to 8.1 on CSA and 5.2 to 7.2 on PDA. Optimum pHs for the germination on CSA and PDA were from 6.4 to 8.2 and from 5.2 to 6.0, respectively. Mycelial color of the fungus on CSA was pale brown at pH from 5.2 to 6.0 and white from pH 6.4 to 8.1, while it was typical dark brown ar range of pH 5.2 to 7.1 and brown at pH 7.2 on PDA after 21 days incubation.

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