• Title/Summary/Keyword: Ar Gas

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Discussions on the Cause of Mixed Gas Cylinder Rupture (혼합가스용기폭발 원인에 대한 고찰)

  • Yoon, Jae-Kun
    • Journal of the Korean Institute of Gas
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    • v.15 no.6
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    • pp.51-56
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    • 2011
  • Mixed gas cylinder(80% Ar, 20% $O_2$) exploded three years ago. But the cause of cylinder rupture was not identified and the case was finished. This paper is the discussions on the cause of cylinder explosion with the investigation report by the police and the similar accident cases. The cause of explosion is the chemical reaction in the cylinder. This accident is similar with the explosion of pressurized oxygen cylinder.

Determination of the initial cross-sections for the $C_4F_6$ molecule from the electron drift velocity ($C_4F_6$-Ar혼합기체에서의 Plasma Discharge Simulation을 위한 $C_4F_6$ 초기단면적 결정)

  • Lee, Kyung-Yeob;Jeon, Byung-Hoon
    • Proceedings of the KIEE Conference
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    • 2011.07a
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    • pp.1544-1545
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    • 2011
  • For quantitative understanding of gas discharge phenomena, we should know electron collision cross section. Processing plasma etching of semiconductor, and research are being used in the etching source $C_4F_6$ gas may be used by itself and mixed with other gases are also used. However, the molecular gas $C_4F_6$ study on the characteristics of the electron transport and the cross-sectional area of the decision is still lacking. Therefore, we understand the electron transport characteristics and analysed the electron transport coefficients. And to understand and interpret physical properties of the ionization coefficient ${\alpha}$/N, and the attachment coefficient ${\eta}$/N in $C_4F_6$ gas.

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Effects of Deposition Parameters on Sputter Deposition of Lead Titanate Thin Films (스퍼터링 증착에 의한 $PbTiO_3$ 박막제조시 증착변수의 영향)

  • 김상섭;강영민;백성기
    • Journal of the Korean Ceramic Society
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    • v.30 no.7
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    • pp.578-588
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    • 1993
  • Highly c-axis oriented ferroelectric PbTiO3 thin films were deposited on MgO single crystal substrates by RF magnetron sputtering. We have studied the effects of substrate temperature, RF input power, gas comosition, gas pressure and deposition rate on the chemical and structural characteristics of PbTiO3 thin films. The epitaxy relationship of c-axis oriented films was found to be PbTiO3{100}//MgO(100) and their microstructures were highly mosaic. It was found that the most important parameter to achieve epitaxial PbTiO3 films was the substrate temperature. The activation energy for the epitaxy formation was about 0.92eV. Lower gas pressure and RF input power were favorable for the formation of epitaxial c-axis orientation. It was also found that the optimum oxygen content in Ar gas was 10% to obtain the stoichiometric PbTiO3 composition.

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Effects of the Gas Atmosphere of ZnO Buffer Layers in the ZnO films grown on Si Substrates by RF Magnetron Sputtering (RF 스퍼터링으로 Si 기판위에 제작된 ZnO 박막에서 ZnO 버퍼층의 가스분위기 영향)

  • Park, Tae-Eun;Cho, Hyung-Koun;Kong, Bo-Hyun;Hong, Soon-Ku
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.7
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    • pp.656-661
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    • 2005
  • The effects of gas atmosphere and in-situ thermal annealing in buffet layers on the characteristic of the ZnO grown by RF magnetron sputtering have been investigated. It was shown that the introduction of buffer layers grown at the gas atmospheres of the mixed $Ar/O_2$ and the in-situ thermal treatment of the ZnO buffer layer improved the structural and optical properties. In addition, the ZnO films on the buffer layer thermal-annealed at $N_2$ gas ambience showed the strong emission of the near band gap exciton with narrow linewidth by combining the high-temperature growth of the ZnO film.