• Proceedings of the KSME Conference
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• 2008.11a
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• pp.1825-1828
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• 2008

A simple method for the fabrication of porous nano-master for antireflective surface is presented. In conventional fabrication methods for antireflective surface, coating method with low refractive index has usually been used. However, it is required to have high cost and long times for mass production. In this paper, we suggested the fabrication method of antireflective surface by the hot embossing process using the porous nano patterned master on silicon wafer fabricated by low-temperature anodic aluminum oxidation. Through multi-AAO and etching processes, nano patterned master with high aspect ratio was fabricated at the large area. Pore diameter and inter-pore distance are about 150nm and from 150 to 200nm. In order to replicate anti-reflective structure, hot embossing process was performed by varying the processing parameters such as temperature, pressure and embossing time etc. Finally, antireflective surface can be successfully obtained after etching process to remove selectively silicon layer of AAO master.

• Korean Journal of Optics and Photonics
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• v.29 no.6
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• pp.262-267
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• 2018

In this paper, we designed a new antireflective film to improve the optical efficiency of organic light-emitting diode displays (OLEDs). The reflection characteristics in the normal and side viewing directions of OLEDs with the antireflective film were calculated, depending on the degree of polarization and transmittance of the currently used polarizer when used in the antireflective film of an OLED. The results showed that when the polarization degree of the commercial polarizer (99.990~99.995%) is lowered to 99.900%, the average reflectance of the antireflective film is increased by about 0.1% (2.5% in terms of rate of increase) which is difficult to notice with the human eye, while the transmittance is increased by 1.63~3.34% (4.2~8.2% in terms of rate of increase). This study provides an optimal design for high-light-efficiency OLEDs with good antireflection properties.

• Journal of the Chungcheong Mathematical Society
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• v.31 no.1
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• pp.137-149
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• 2018

In this paper, under the assumption of the symmetry point spread function, antireflective boundary conditions(AR-BCs) are considered in connection with the fast truncated Lagrange(FTL) method. The FTL method is proposed as an image restoration method for large-scale ill-conditioned BTTB(block Toeplitz with Toeplitz block) and BTHHTB(block Toeplitz-plus-Hankel matrix with Toeplitz-plus-Hankel blocks) linear systems([13, 17]). The implementation and efficiency of the FTL method in the AR-BCs are further illustrated. Especially, by employing the AR-BCs, both the continuity of the image and the continuity of its normal derivative are preserved at the boundary. A reconstructed image with less artifacts at the boundary is obtained as a result.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.187-187
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• 2011

Nowadays, the issue of solar cell durability in local weather and environment is a crucial issue. Above all, surface corrosion on solar cell multilayers is a major factor that determines the durability of commercial solar cells; corrosive chemical interactions between air, humidity and chemical species and solar cell multilayers can unfavorably affect the durability. Here, we study microscopic and spectroscopic surface techniques to investigate the corrosive interaction on the antireflective layers of solar cell multilayers under various conditions such as acid, base, constant temperature and humidity. Surface morphology and adhesion force were characterized with atomic force microscopy before and after chemical treatment. Chemical composition, and transmittance factors were studied with X-ray photoelectron spectroscopy, and ultraviolet-visible spectroscopy, respectively. Based on these studies, we suggest the dominant factors in the corrosive chemical processes, and their influences on the structural, compositional, and optical properties of the antireflective layers.

• Proceedings of the Materials Research Society of Korea Conference
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• 2012.05a
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• pp.110.2-110.2
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• 2012

We reported on antireflective ZnSnO (ZTO)/Ag bilayer and ZTO/Ag/ZTO trilayer source/drain (S/D) electrodes for all-transparent ZTO channel based thin film transistors (TFTs). The ZTO/Ag bilayer is more transparent (83.71%) and effective source/drain (S/D) electrodes for the ZTO channel/Al2O3 gate dielectric/ITO gate electrode/glass structure than ZTO/Ag/ZTO trilayer because the bottom ZTO layer in the trilayer increasea contact resistance between S/D electrodes and ZTO channel layer and reduce the antireflection effect. The ZTO based all-transparent TFTs with ZTO/Ag bilayer S/D electrode showed a saturation mobility of 4.54cm2/Vs and switching property (1.31V/decade) comparable to TTFT with Ag S/D electrodes.

• Journal of the Korean Ceramic Society
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• v.32 no.5
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• pp.617-625
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• 1995

In order to reduce reflectance of soda-lime glass having average reflectance of 7.35% and refractive index of 1.53, single (SiO2), double (SiO2/20SiO2-80ZrO2), and triple (SiO2/ZrO2/75SiO2-25ZrO2) layers were designed and fabricated on the glass substrate by Sol-Gel method. Stble sols of SiO2-ZrO2 binary system for antireflective (AR) coatings were synthesized with tetraethyl orthosilicate (TEOS) and zirconium n-butoxide as precursors and ethylacetoacetate (EAcAc) as a chelating agent in an atmosphere environment. Films were deposited on soda-lime glass at the withdrawal rates of 3~11 cm/min using the prepared polymeric sols by dip-coating and they were heat-treated at 45$0^{\circ}C$ for 10 min to obtain homogeneous, amorphous and crack-free films. In case of SiO2-ZrO2 binary system, refractive index of film increased with an increase of ZrO2 mol%. Designed optical constant of films could be obtained through varying the withdrawal rate. In the visible region (380~780nm), reflectance was measured with UV/VIS/NIR Spectrophotometer. Average reflectances of the prepared single-layer [SiO2 (n=1.46, t=103nm)], double-layer [SiO2 (n=1.46, t=1-4nm)/20SiO2-80ZrO2 (n=1.81, t=82nm)], and triple-layer [SiO2 (n=1.46, t=104nm)/ZrO2 (n=1.90, t=80nm)/75SiO2-25ZrO2 (n=1.61, t=94 nm)] were 4.74%, 0.75% and 0.38%, respectively.

• Proceedings of the Optical Society of Korea Conference
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• 1996.09a
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• pp.55-55
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• 1996

• Proceedings of the Materials Research Society of Korea Conference
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• 1996.05a
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• pp.40-40
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• 1996

• International Journal of Precision Engineering and Manufacturing
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• v.9 no.1
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• pp.25-29
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• 2008

We introduce a new fabrication process for antireflective structured surfaces. A 4-inch silicon wafer was dipped in a suspension of 300-nm-diameter silica particles dispersed in a toluene solution. When the wafer was drawn out of the suspension, a hexagonally packed monolayer structure of particles self-assembled on almost the complete wafer surface. Due to the simple process, this could be applied to micro- and nano-patterning. The self-assembled silica particles worked as a mask for the subsequent reactive ion etching. An array of nanometer-sized pits could be fabricated since the regions that correspond to the small gaps between particles were selectively etched off. As etching progressed, the pits became deeper and combined with neighboring pits due to side-etching to produce an array of cone-like structures. We investigated the effect of etching conditions on antireflection properties, and the optimum shape was a nano-cone with height and spacing of 500 nm and 300 nm, respectively. This nano-structured surface was prepared on a $30\;{\times}\;10-mm$ area. The reflectivity of the surface was reduced 97% for wavelengths in the range 400-700 nm.

• Proceedings of the Materials Research Society of Korea Conference
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• 2010.05a
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• pp.24.1-24.1
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• 2010

In practical operation, the exposed surfaces may get dirty thus degrade the performance of devices. So the combination of self cleaning and antireflection is very desirable for use in outdoor photovoltaic and displaying devices, self cleaning windows and car windshields. For the purpose of self cleaning, the surface needs to be either superhydrophobic or superhydrophilic. However, in practice AR in the visible region and self cleaning are a pair of competitive properties. To satisfy the requirements for superhydrophobic or superhydrophilic surfaces, high surface roughness is required. But it usually cause severely light scattering. Photo-responsive coatings (TiO2, ZnO etc.) can lead to superhydrophilic. However, the refractive indices are high. Thus for porous structure, controlling pore size in the underwavelength scale to reduce the light scattering is very crucial for highly transparent and self cleaning antireflection coating. Herein, we demonstrate a simple method to make high performance broadband antireflection layer on the glass surface, by "carving" the surface by hot alkali solution. Etched glass has superhydrophilic surface. By chemical modification, it turns to superhydrophobic. Enhanced transparency (up to 97%) in a broad wavelength range was obtained by short time etching. Also antifogging effect has been demonstrated, which may offer advantage for devices working at high humidity environment or underwater. Compositional dependence of the properties was observed by comparing three different commercially available glasses.