• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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• pp.502-505
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• 2004

We studied the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of a SiC (Silicon Carbide) thin film. SiC thin film exhibits good chemical and thermal stability. The good thermal and chemical stability make SiC an attractive candidate for electronic applications. A homeotropic alignment of nematic liquid crystal by ion beam (IB) exposure on the SiC thin film surface was achieved. The about $87^{\circ}$ of stable pretilt angle was achieved at the range from $30^{\circ}$ to $45^{\circ}$ of incident angle. The good LC alignment is maintained by the ion beam alignment method on the SiC thin film surface until annealing temperature of $300^{\circ}C$. Consequently, homeotropic alignment effect of liquid crystal and the good thermal stability by the ion beam alignment method on the SiC thin film layer can be achieved.

• 한국전기전자재료학회논문지
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• 제13권1호
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• pp.75-79
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• 2000

In this study, we investigated the pretilt angle generation and liquid crystal (LC) alignment by ultravi-olet (UV) light irradiation during imidization of polymide. The generated pretilt angle of nematic (N) LC by using the in-situ photo-alignment method was smaller than that of the conventional UV photo-alignment method. Also, generated pretilt angle of NLC tends to increase by annealing. In case of using the polymer(AL-3046), we found that the in-situ Uv photo-alignment method has higher thermal stability of LC alignment, but it has a disadvantage to control pretilt angle.

• Transactions on Electrical and Electronic Materials
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• 제8권6호
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• pp.274-277
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• 2007

In this study, liquid crystal(LC) aligning capabilities for homeotropic alignment on the $SiO_x$ thin film by electron beam evaporation method were investigated. Also, the control of pretilt angles and thermal stabilities of the nematic liquid crystal(NLC) treated on $SiO_x$ thin film were investigated. A high pretilt angle of about $86.5^{\circ}$ was obtained, and also the suitable pretilt angle of the NLC on the $SiO_x$ thin film at $10{\sim}50nm$ thickness with e-beam evaporation can be achieved. The uniform LC alignment and good thermal stabilities on the $SiO_x$ thin film surfaces with electron beam evaporation can be achieved. It is considered that the LC alignment on the $SiO_x$ thin film by electron beam evaporation is attributed to elastic interaction between LC molecules and micro-grooves at the $SiO_x$ thin film surface created by evaporation.

• Transactions on Electrical and Electronic Materials
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• 제8권1호
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• pp.46-50
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• 2007

We have studied the nematic liquid crystal (NLC) alignment effects on a nitrogen-doped diamond-like carbon (NDLC) thin film layer with ion beam irradiation. The pretilt angle for NLC on the NDLC surface with ion beam exposure was observed below 1 degree. Also, we had the good LC alignment characteristics on the NDLC thin films with ion beam exposure of 1800 eV. In thermal stability experiments, the alignment defect of the NLC on the NDLC surface with ion beam irradiation above annealing temperature of $250^{\circ}C$ can be observed. Therefore, the good thermal stability and LC alignment for NLC by ion beam aligned NDLC thin films can be achieved.

• Transactions on Electrical and Electronic Materials
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• 제9권6호
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• pp.243-246
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• 2008

We have studied the liquid crystal (LC) alignment, the pretilt angle generation, and the annealing behavior for a nematic liquid crystal (NLC) on the homogeneous polyimide (PI) surfaces by using the rubbing method and the ion beam (IB) method. An excellent LC alignment of the NLC on the PI surface with rubbing and IB irradiation were observed. The pretilt angle of NLC on the homogeneous PI surface for the rubbing method is decreased from $4.5^{\circ}$ to $3.5^{\circ}$ as rubbing time is increased, that of the for the IB irradiation method is decreased from $0.5^{\circ}$ to $0.1^{\circ}$ as the time of IB irradiation is increased. After the annealing, the pretilt angles of the rubbed PI surfaces increased up to $4^{\circ}$, these of the IB irradiated PI surfaces little increased. It is considered the side chain of the rubbed PI show the its abilities of the original capacities, while the side chain of the IB irradiated PI cannot show the its abilities of the original capacities due to the IB has already destroyed the side chain of the PI.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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• pp.280-281
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• 2006

We studied the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of a Titanium dioxide ($TiO_2$) thin film by rf magnetron sputtering system for 15min under various rf power. A very low pretilt angle by ion beam exposure on the $TiO_2$ thin film was measured. A good LC alignment by the ion beam alignment method on the $TiO_2$ thin film surface was observed at annealing temperature of $200^{\circ}C$, and the alignment defect of the NLC was observed above annealing temperature of $250^{\circ}C$. Consequently, the low NLC pretilt angle and the good thermal stability of LC alignment by the ion beam alignment method on the $TiO_2$ thin film by sputter method as various rf power condition can be achieved.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.I
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• pp.468-470
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• 2005

We studied the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of the SiC (Silicon Carbide) thin film. The SiC thin film exhibits good chemical and thermal stability. The good thermal and chemical stability makes SiC an attractive candidate for electronic applications. A vertical alignment of nematic liquid crystal by ion beam exposure on the SiC thin film surface was achieved. The about $87^{\circ}$ of stable pretilt angle was achieved at the range from $30^{\circ}$ to $45^{\circ}$ of incident angle. The good LC alignment is main-tained by the ion beam alignment method on the SiC thin film surface at high annealing temperatures up to 300.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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• pp.489-490
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• 2005

We studied the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of the SiC (Silicon Carbide) thin film. The SiC thin film exhibits good chemical and thermal stability. The good thermal and chemical stability makes SiC an attractive candidate for electronic applications. A vertical alignment of nematic liquid crystal by ion beam exposure on the SiC thin film surface was achieved. The about $87^{\circ}$ of stable pretilt angle was achieved at the range from $30^{\circ}$ to $45^{\circ}$ of incident angle. The good LC alignment is main-tained by the ion beam alignment method on the SiC thin film surface at high annealing temperatures up to 300.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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• pp.500-503
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• 2003

We studied the nematic liquid crystal (NLC) aligning capabilities by the UV alignment method on a a-C:H thin film surface. A good LC alignment by UV exposure on the a-C.H thin film surface at 200 ${\AA}$ of layer thickness was achieved. Also, a good LC alignment by the UV alignment method on the a-C:H thin film surface was observed at annealing temperature of 180 $^{\circ}C$. However, the alignment defect of the NLC was observed above annealing temperature of 200 $^{\circ}C$. Consequently, the good thermal stability of LC alignment by the UV alignment method on the a-C:H thin film surface can be achieved.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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• pp.378-378
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• 2007

In this study, liquid crystal (LC) aligning capabilities for homeotropic alignment on the $ZrO_x$ thin film by electron beam evaporation method were investigated. Also, the control of pretilt angles and thermal stabilities of the NLC treated on $ZrO_x$ thin film were investigated. The uniform LC alignment on the $ZrO_x$ thin film surfaces and good thermal stabilities with electron beam evaporation can be achieved. It is considerated that the LC alignment on the $ZrO_x$ thin film by electron beam evaporation is attributed to elastic interaction between LC molecules and micro-grooves at the $ZrO_x$ thin film surface created by evaporation. In addition, it can be achieved the good electro-optical (EO) properties of the VA-LCD on $ZrO_x$ thin film layer with. oblique electron beam evaporation.