• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2001.11b
• /
• pp.346-349
• /
• 2001

We studied the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of diamond like carbon (DLC) thin film. A high pretilt angle of about $4^{\circ}$ was measured by ion beam(IB) exposure on the DLC thin film surface. A good LC alignment was observed by the IB alignment method on the DLC thin film surface at annealing temperature of $200^{\circ}C$, and the alignment defect of the NLC was observed above annealing temperature of $220^{\circ}C$. Consequently, the high NLC pretilt angle and the good thermal stability of LC alignment can be achieved by the IB alignment method on the DLC thin film surface.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2001.11a
• /
• pp.346-349
• /
• 2001

We studied the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of diamond like carbon (DLC) thin film. A high pretilt angle of about 4$^{\circ}$ was measured by ion beam(IB) exposure on the DLC thin film surface. A good LC alignment was observed by the IB alignment method on the DLC thin film surface at annealing temperature of 200$^{\circ}C$, and the alignment defect of the NLC was observed above annealing temperature of 220$^{\circ}C$ . Consequently, the high NLC pretilt angle and the good thermal stability of LC alignment can be achieved by the IB alignment method on the DLC thin film surface.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.15 no.5
• /
• pp.419-422
• /
• 2002

We studied the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of a diamond like carbon (DLC) thin film. A high pretilt angle of about $3.5^{\circ}$ by ion beam(IB) exposure on the DLC thin film surface was measured. A good LC alignment by the IB alignment method on the DLC thin film surface was observed at annealing temperature of $200^{\circ}C$, and the alignment defect of the NLC was observed above annealing temperature of $220^{\circ}C$. Consequently, the high NLC pretilt angle and the good thermal stability of LC alignment by the IB alignment method on the DLC thin film surface can be achieved.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2001.11a
• /
• pp.117-120
• /
• 2001

A new photoalignment material PFCPMI, poly [4-(fluorocinnamate) phenylmaleimide], was synthesized and the nematic liquid crystal (NLC) aligning capabilities on the photopolymer surface. The NLC pretilt angle generated by non-UV filter method on the PFCPMI surface was higher than that of the UV filter method. A good LC alignment by non-UV filter method was observed at 150\`c of annealing temperature. However, the alignment defect of the NLC by UV filter method was measured above 150$^{\circ}C$ of annealing temperature. Consequently, the high pretilt angle and the good LC alignment in NLC using non-UV filter method can be achieved.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.15 no.5
• /
• pp.423-428
• /
• 2002

The photoalignment material PFCPMI, poly[4-(fluorocinnamate)phenylmaleimide], was synthesized and the nematic liquid crystal(NLC) aligning capabilities on the photopolymer surface. The NLC pretilt angle geneated by non-UV filter method on the PFCPMI surface was higher than that of the UV filter method. A good LC alignment by non-UV filter method was observed at $150^{\circ}C$ of annealing temperature. However, the alignment defect of the NLC by UV filter method was measured above $150^{\circ}C$ of annealing temperatue. Consequently, the high pretilt angle and the good LC alignment in NLC using non-UV filter method can be acheived.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2001.11b
• /
• pp.117-120
• /
• 2001

A new photoalignment material PFCPMI, poly[4-(fluorocinnamate)phenylmaleimide], was synthesized and the nematic liquid crystal (NLC) aligning capabilities on the photopolymer surface. The NLC pretilt angle generated by non-UV filter method on the PFCPMI surface was higher than that of the UV filter method. A good LC alignment by non-UV filter method was observed at $150^{\circ}C$ of annealing temperature. However, the alignment defect of the NLC by UV filter method was measured above $150^{\circ}C$ of annealing temperature. Consequently, the high pretilt angle and the good LC alignment in NLC using non-UV filter method can be acheived.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.14 no.4
• /
• pp.336-340
• /
• 2001

We have investigated the generation of pretilt angle and alignment stability for a nematic liquid crystal (NLC) with obliquely polarized UV exposure on the three kinds of photo-polymer. High pretilt angle of the NLC was obtained by polarized UV exposure on a PM4Ch surface for 1 min. But, the low pretilt angle of he NLC on a PVCi surface was observed. The pretilt angle generated is attributed ot the photosensitivity by the long side chaining of photo-polymer. Also, a good thermal stability of the three kinds of photo-polymer were obtained by thermogravimetric analysis (TGA) measurement until 300$^{\circ}C$. Finally, the good LC aligning capabilities using the photodimerization method were observed by annealing-treatment until 150$^{\circ}C$.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.16 no.3
• /
• pp.214-218
• /
• 2003

We studied the nematic liquid crystal (NLC) aligning capabilities by the UV alignment method on a diamond like carbon (DLC) thin film surface A good LC alignment by UV exposure on the DLC thin film surface at 200${\AA}$ of layer thickness was achieved. Also, a good LC alignment by the UV alignment method on the DLC thin film surface was observed at annealing temperature of 180$^{\circ}C$. However, the alignment defect of the NLC was observed above annealing temperature of 200$^{\circ}C$. Consequently, the good thermal stability of LC alignment by the UV alignment method o the DLC thin film surface can be achieved.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.13 no.10
• /
• pp.871-875
• /
• 2000

Effects of liquid crystal (LC) alignment using a in-situ photoalignment method by polarized UV exposure on a polyimide (PI) surface with medium side chain were studied. The generated pretilt angle in nematic(N) LC using a in-situ photoalignment method was smaller than that of a conventional photoalignment method for short UV exposure time. Also, the pretilt angle of NLC using a in-situ photoalignment method increases with increasing UV exposure time on the PI surfaces. Finally, the pretilt angle of NLC can be improved by annealing treatment.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2000.07a
• /
• pp.336-339
• /
• 2000

Effects of liquid crystal (LC) alignment using an in-situ photo-alignment method by linearly polarized UV exposure during imidization of polyirnide (PI) on the two kinds of PI surfaces with side chain were investigated. The generated pretilt angle in nematic (N) LC using an in-situ photo-alignment method was smaller than that of a conventional photo-alignment method for short UV exposure time. Also, the pretilt angle of the NLC using an in-situ photo-alignment method increases with increasing UV exposure time on the two kinds of the PI surfaces. Finally, the pretilt angle of NLC can be improved by annealing treatment.