• 대한전기학회:학술대회논문집
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• 대한전기학회 1998년도 하계학술대회 논문집 G
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• pp.2521-2523
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• 1998

Freestanding flexible microstructures fabricated from deposited thin films become mechanically unstable when internal stresses exceed critical values. The residual stress and stress gradient of aluminum thin film were examined to make sure of fabricating the reproduceable aluminium structure. For good shape of micro mirror array and microstructures, the experiment was done varying thickness and deposition rate. As the aluminium film thickness increased from 0.8${\mu}m$ to 1.6${\mu}m$, the stress gradient decreased from 11.62MPa/${\mu}m$ to 2.62MPa/${\mu}m$. The residual stress values are from 42.4MPa to 62.24MPa of tensile stresses.

• 대한전기학회논문지
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• 제31권9호
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• pp.74-81
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• 1982

One of the stable thin film transistor fabricated by cadmium suifide with the anodized aluminium oxide as gate material. The principle of the operation for the device is based on the control mechanism of injected majority carricrs to the wide band gap semiconductor, that is cadmium sulfide, by means of the function of the gate control. The fabricated device constructed by evaporating CdS layer in the form of microcrystalline on the oxided thin film characterized by ea, 80 as voltage amplification factor, 1/100 mho as transconductance, 8 kohm as dynamic output resistance, furthermore gain band width products is about 15 MHz.

• 한국전기전자재료학회논문지
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• 제21권9호
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• pp.863-867
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• 2008

In this paper, to increase the light current efficiency of photodiode, we fabricated aluminum-doped zinc oxide(AZO) thin films by RF magnetron sputtering. AZO thin films were deposited at low temperature of 100 $^{\circ}C$ and different RF powers of 50, 100, 150 and 200 W due to selective process technology. Then the AZO thin films were annealed at 400 $^{\circ}C$ for 1 hr in vacuum ambient to increase crystalline. The lowest resistivity of 1.35 ${\times}$ $10^{-3}$ ${\Omega}cm$ and a high transmittance over 90 % were obtained under the conditions of 3 mTorr, 100 'c and 150 W. The optimized AZO thin films were deposited as anti-reflection coating on PN junction of silicon photodiode. It was confirmed by the result of $V_r-I_{ph}$ curve that the efficiency of photodiode with AZO thin film was enhanced 17 % more than commercial photodiode.

• 비파괴검사학회지
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• 제30권5호
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• pp.471-478
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• 2010

박막은 마이크로 전자 장치, 자기 기록 매체, 미세 기전 시스템 및 표면 코팅과 같은 다양한 응용에 있어서 매우 중요한 역할을 수행하는 재료이다. 이러한 박막의 재료 물성 값은 상응하는 거시 재료의 물성 값과 다를 수 있기 때문에 박막의 기계적 물성 값들을 신뢰성 있게 측정할 수 있는 시험법의 개발이 요구되어져 왔다. 본 연구에서는 종래의 약 처짐 시험법과 단축 인장 시험법의 한계성을 극복하기 위해 나노미터 이하의 면외 변위 측정 분해능을 갖는 백색광 간섭계를 채택한 새롭고 간편한 시험법을 개발하였다. 개발된 시험법의 유효성을 검증해 보기 위하여 스퍼터링을 포함한 마이크로 공정에 의해 자유지지 알루미늄 박막 시험편을 제작한 뒤 이를 이용하여 인장 물성 값을 측정하였다. 폭 0.5 mm, 두께 $1{\mu}m$인 시험편을 실리콘 다이상에 1~5개 제작하여 사용하였다. 모터 구동 팁, 하중계 및 6 자유도 정렬 장치로 구성된 시험기를 자체적으로 제작한 뒤 막 처짐 시험을 수행하였다. 시험기는 가능한 작게 제작하여 상용 백색광 간섭 현미경 아래에 설치 가능하도록 하였다. 백색광 간섭무늬를 이용하여 시험편과 시험기 사이의 정렬 맞춤을 수행하였다. 영 계수는 62 GPa, 항복점은 247 MPa로 측정되었다.

• 반도체디스플레이기술학회지
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• 제3권2호
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• pp.17-21
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• 2004

Aluminum nitride(AlN) thin films were deposited on silicon substrate by reactive RF magnetron sputtering without substrate heating. We investigated the dependence of some properties for AlN thin film on sputtering conditions such as working pressure, $N_2$ concentration and RF power. XRD, Ellipsometer and AES has been measured to find out structural properties and preferred orientation of AlN thin films. Deposition rate of AlN thin film was increased with an increase of RF power and decreased with an increase of $N_2$ concentration. AES in-depth measurements showed that stoichiometry of Aluminium and Nitrogen elements were not affected by $N_2$ concentration. It has shown that low working pressure, low $N_2$ concentration and high RF power should be maintained to deposit AlN thin film with a high degree of (0002) preferred orientation.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.224-225
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• 2009

Aluminium nitride thin film was deposited on Au electrode and Si substrate by radio frequency sputtering system. X-ray diffraction (XRD) was utilized to identify the AlN phase, and Atomic Force Microscope (AFM) was used to obtain the images of surface morphology and roughness value of AlN thin film. The result of XRD and AFM measurement showed that the AlN thin film has strong c-axs orientation and smooth surface. In order to investigate piezoelectric response and polarization properties along to the direction of electric field, PFM (Piezoresponse Force Microscope) system was used, and the images of piezoelectric response due to switching of polarization was observed by PFM.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2001년도 하계학술대회 논문집 C
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• pp.1372-1374
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• 2001

This paper describes fabrication and characteristics of metal thin-film pressure sensor for working at high temperature. The proposed pressure sensor consists of a chrom thin-film, patterned on a Wheatstone bridge configuration, sputter-deposited onto thermally oxidized Si membranes with an aluminium interconnection layer. The fabricated pressure sensor presents a low temperature coefficient of resistance, high-sensitivity, low non-linearity and excellent temperature stability. The sensitivity is 1.097 $\sim$ 1.21 mV/V kgf/$cm^2$ in the temperature range of 25 $\sim$ $200^{\circ}C$ and the maximum non-linearity is 0.43 %FS.

• 한국전기전자재료학회논문지
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• 제14권5호
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• pp.405-409
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• 2001

This paper describes fabrication and characteristics of metal thin-film pressure sensor for working at high temperature. The proposed pressure consists of a chrom thin-film, patterned on a Wheat stone bridge configuration, sputter-deposited onto thermally oxidized Si membranes with an aluminium interconnection layer. The fabricated pressure sensor presents a low temperature coefficient of resistance, high-sensitivity, low non-linearity and excellent temperature stability. The sensitivity is 1.097∼1.21mV/V$.$kgf/$\textrm{cm}^2$ in the temperature range of 25∼200$^{\circ}C$ and the maximum non-linearity is 0.43%FS.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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• pp.77-78
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• 2006

We fabricated photonic crystals on GaAs and GaN substrates. After anodizing the aluminium thin film in electrochemical embient, the porous alumina was implemented to the mask for reactive ion beam etching process of GaAs wafer. And photonic crystals in GaN wafer were also fabricated using electron beam nano-lithography process. The coated PMMA thin film with 200 nm-thickness on GaN surface was patterned with triangular lattice and etched out the GaN surface by the inductively coupled plasma source. The fabricated GaAs and GaN photonic crystals provide the enhanced intensities of light emission for the wavelengths of 858 and 450 nm, respectively. We will present the detailed dimensions of photonic crystals from SEM and AFM measurements.

• 한국자동차공학회논문집
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• 제6권5호
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• pp.10-19
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• 1998

The erosion of electrode in spot welding of aluminium alloy by direct current is dependent on the electric polarity. The positive electrode is much more eroded than the negative one. To explain this phenomenon, Peltier effect has been generally accepted as a unique theory. In this study Peltier effect was evaluated by calculations on the basis of some references and experiments. The difference of heat generated by Peltier effect on both electrode surfaces was, however, only 4% of total heat generated during wel- ding. Because of insufficient explanation, Kohler theory, which is mainly affected by thin oxide film, was introduced. A theoretical calculation showed 17% of the temperature difference between the positive and negative electrode, in case "surface voltage" resulted from oxide film was 30% of total contact voltage. This revealed that the erosion of electrode could be more affected by Kohler theory than effect.an effect.