• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.394-394
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• 2012

We fabricated organic-inorganic superlattice films using molecular layer deposition (MLD) and atomic layer deposition (ALD). The MLD is a gas phase process in the vacuum like to atomic layer deposition (ALD) and also relies on a self-terminating surface reaction of organic precursor which results in the formation of a monolayer in each sequence. In the MLD process, 'Alucone' is very famous organic thin film fabricated using MLD. Alucone layers were grown by repeated sequential surface reactions of trimethylaluminum and ethylene glycol at substrate temperature of $80^{\circ}C$. In addition, we developed UV-assisted $Al_2O_3$ with gas diffusion barrier property better than typical $Al_2O_3$. The UV light was very effective to obtain defect-free, high quality $Al_2O_3$ thin film which is determined by water vapor transmission rate (WVTR). Ellipsometry analysis showed a self-limiting surface reaction process and linear growth of each organic, inorganic film. Composition of the organic films was confirmed by infrared (IR) spectroscopy. Ultra-violet (UV) spectroscopy was employed to measure transparency of the organic-inorganic superlattice films. WVTR is calculated by Ca test. Organic-inorganic superlattice films using UV-assisted $Al_2O_3$ and alucone have possible use in gas diffusion barrier for OLED.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.401-401
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• 2012

유기발광소자는 유연 소자로의 적용, 자체 발광 등의 장점으로 차세대 디스플레이로서 각광받고 있다. 하지만 유기발광소자는 유기물을 발광층으로 하고 있기 때문에 수분에 취약하다는 단점이 있다. 그래서 봉지 기술(encapsulation)을 필요로 한다. 널리 알려진 방법으로는 유리로 소자를 감싸고 내부에 흡습제를 충진하여 수분 투습을 줄일 수 있다. 하지만 위 기술을 사용할 경우 유기발광소자의 장점인 유연 소자의 적용이 어렵다. 따라서 박막 봉지 기술을 이용하면 보다 얇은 두께의 소자 제작이 가능하고 유연 소자의 적용 역시 가능해진다. 박막 코팅을 이용한 봉지 기술 중 화학적 증착법(Chemical Vapor Deposition, CVD)이나 물리적 증착법(Physical Vapor Deposition, PVD)을 이용하는 방법이 널리 알려져 있지만 원자층 증착법(Atomic Layer Deposition, ALD)을 이용하면 보다 낮은 두께의 치밀한 박막을 제작 할 수 있다. 본 연구는 원자층 증착법을 응용한 분자층 증착법(Molecular Layer Deposition, MLD)을 이용하여 Trimethylaluminum과 Ethylene glycol을 순차적으로 주입함으로써 Alucone 유기 박막을 제작하고 유기발광소자의 봉지 기술로의 적용을 위해 투과 방지막 특성에 관하여 분석했다. 박막 봉지 기술로서 적용하기 위해 제작된 투과 방지막은 원자층 증착법으로 Al2O3무기 박막을 제작하고 분자층 증착법으로 Alucone 박막을 순차적으로 증착하였다. 이를 Ca를 이용하여 전도도를 측정하고, 투습도를 계산하여 투과 방지막 특성을 분석하였다. Alucone 박막은 우수한 투과 방지막 특성을 가지지는 못하지만 적층 구조로 제작함으로써 두 쌍의 Alucone/Al2O3일때, $6.07{\times}10^{-2}g/m^2day$의 투습도를 보여주고 있다. Alucone 박막의 존재는 수분이나 산소의 투과 경로 길이를 늘려줌으로써 Alucone/Al2O3 박막의 투과방지 특성이 향상되는 것으로 사료된다.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.75.1-75.1
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• 2013

Atomic layer deposition (ALD) and molecular layer deposition (MLD) are based on sequential, self-limiting surface reactions that produce atomic layer controlled and conformal thin film growth. ALD can deposit inorganic films and MLD can deposit films containing organics. ALD and MLD can be used together to fabricate a wide range of hybrid organic-inorganic alloy films. The relative fraction of inorganic and organic constituents can be defined by controlling the ratio of the ALD and MLD reaction cycles used to grow the film. These hybrid films can be tuned to obtain desirable mechanical, electrical and optical properties. This talk will focus on the growth and properties of metal alkoxide films grown using metal precursors and various organic alcohols that are known as "metalcones". The talk will highlight the tunable mechanical properties of alucone alloys grown using Al2O3 ALD and alucone MLD and the tunable electrical conductivity of zincone alloys grown using ZnO ALD and zincone MLD with DEZ and hydroquinone as the reactants.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.374-374
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• 2012

Nowadays, Active Matrix Organic Light-Emitting Diodes (AM-OLEDs) are the superior display device due to their vivid full color, perfect video capability, light weight, low driving power, and potential flexibility. One of the advantages of AM-OLED over Liquid Crystal Display (LCD) lies in its flexibility. The potential flexibility of AM-OLED is not fully explored due to its sensitivity to moisture and oxygen which are readily present in atmosphere, and there are no flexible encapsulation layers available to protect these. Therefore, we come up with a new concept of Inorganic-Organic hybrid thin film as the encapsulation layer. Our Inorganic layer is Al2O3 and Organic layer is F-Alucone. We deposited these layers in vacuum state using Atomic Layer Deposition (ALD) and Molecular Layer Deposition (MLD) techniques. We found the results are comparable to commercial requirement of 10-6 g/m2 day for Water Vapor Transmission Rate (WVTR). Using ALD and MLD, we can control the exact thin film thickness and fabricate more dense films than chemical or physical vapor deposition methods. Moreover, this hybrid encapsulation layer potentially has both the flexibility of organic layers and superior protection properties of inorganic layer.