• 제목/요약/키워드: Alignment stage

검색결과 165건 처리시간 0.022초

진공용 3자유도 얼라인먼트 스테이지 개발 (Development of Three D.O.F Alignment Stage for Vacuum Environment)

  • 한상진;박종호;박희재
    • 한국정밀공학회지
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    • 제18권11호
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    • pp.138-147
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    • 2001
  • Alignment systems are frequently used under various semiconductor manufacturing environment. Particularly in PDP(Plasma Display Panel) manufacturing process, the alignment system is applied to the combining and sealing processes of the upper and lower glass panels of PDP, where these processes are performed in the vacuum chamber of high vacuum and high temperature. In this paper, the XYΘ-alignment stage is developed to align PDP panels. Because of high vacuum and high temperature environment, the alignment chamber has been designed to isolate the inner part of the alignment chamber from the outer environment of high vacuum and high temperature, in which every part of the alignment stage is inserted. As it is difficult to attach feedback sensors to the alignment stage in the alignment chamber, the alignment stage is implemented with the open loop algorithm, where the parallel link structure has been designed using step-motors and ball-screws for structural simplicity. The kinematic analysis is performed to drive the parallel link structure, based on the experiments of actuation-compensation of the alignment stage. For the error compensation, the hyperpatch model has been used to model the errors. From the experiments, the positional accuracy of the alignment stage can be improved significantly.

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박형 병렬구조 XYθ 정렬 스테이지 개발 (Development of Thin and Parallel XYθ Alignment Stage)

  • 강동배;안중환;손성민
    • 한국산학기술학회논문지
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    • 제12권1호
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    • pp.74-79
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    • 2011
  • 정렬 시스템(Alignment System)은 다축의 스테이지를 이용하여 신속하게 물체를 정렬오차 범위 내로 위치결정시키는 역할을 한다. 본 연구에서는 병렬구조로 설계하여 두께가 얇고 높은 정밀도와 더불어 강성이 높은 XY${\theta}$ 정렬 스테이지를 개발하였다. 개발된 박형 병렬구조 XY${\theta}$정렬 스테이지는 직각도, 반복정밀도, 진직도 등의 3가지 측정항목에 대해 초정밀급을 달성하였으며 반복정밀도는 $1{\mu}m$미만이다. 비전시스템 및 정렬알고리즘을 활용한 정렬성능 평가에서는 정렬오차 ${\pm}6.25{\mu}m$를 달성하였다.

극초정밀 위치제어장치를 이용한 광소자 정렬 자동화에 관한 연구 (A Study on Optical Element Alignment Automation using Ultra Precision Positioning Stage)

  • 정상화;김현욱;최석봉;김광호;박준호
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 추계학술대회 논문집
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    • pp.314-317
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    • 2005
  • As demands of VBNS and VDSL increase, the development of kernel parts of optical communication such as PLC(Planar Light Circuit), Coupler, and WDM elements increases. The alignment and the attachment technology are very important in the fabrication of optical elements. The ultra precision stage wasn't yet applied in the optical alignment and the optical element alignment was taken too many times. In this paper, the optical element alignment of ultra precision positioning stage was studied. The alignment algorithm is comprised of field search and peak search algorithms. The procedure of the alignment algorithms applied to the ultra precision positioning stage are developed by LabView programming.

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정렬오차 추정 필터에 기반한 비전 정렬 시스템의 고속 정밀제어 (Fast and Fine Control of a Visual Alignment Systems Based on the Misalignment Estimation Filter)

  • 정해민;황재웅;권상주
    • 제어로봇시스템학회논문지
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    • 제16권12호
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    • pp.1233-1240
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    • 2010
  • In the flat panel display and semiconductor industries, the visual alignment system is considered as a core technology which determines the productivity of a manufacturing line. It consists of the vision system to extract the centroids of alignment marks and the stage control system to compensate the alignment error. In this paper, we develop a Kalman filter algorithm to estimate the alignment mark postures and propose a coarse-fine alignment control method which utilizes both original fine images and reduced coarse ones in the visual feedback. The error compensation trajectory for the distributed joint servos of the alignment stage is generated in terms of the inverse kinematic solution for the misalignment in task space. In constructing the estimation algorithm, the equation of motion for the alignment marks is given by using the forward kinematics of alignment stage. Secondly, the measurements for the alignment mark centroids are obtained from the reduced images by applying the geometric template matching. As a result, the proposed Kalman filter based coarse-fine alignment control method enables a considerable reduction of alignment time.

접촉식 리소그라피의 정렬공정을 위한 압전구동 초정밀 스테이지 (A Piezo-driven Ultra-precision Stage for Alignment Process of a Contact-type Lithography)

  • 최기봉;이재종;김기홍;임형준
    • 한국생산제조학회지
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    • 제20권6호
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    • pp.756-760
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    • 2011
  • This paper proposed an alignment stage driven by piezo actuators for alignment process of a contact-type lithography. Among contact-type lithography processes, an UV-curable nanoimprint process is an unique process to be able to align patterns on upper and lower layers. An alignment stage of the UV-curable nanoimprint process requires nano-level resolution as well as high stiffness to overcome friction force due to contact moving. In this paper, the alignment stage consists of a compliant mechanism using flexure hinges, piezo actuators for high force generation, and capacitive sensors for high-resolution measurement. The compliant mechanism is implemented by four prismatic-prismatic compliant chains for two degree-of-freedom translations. The compliant mechanism is composed of flexure hinges with high stiffness, and it is directly actuated by the piezo actuators which increases the stiffness of the mechanism, also. The performance of the ultra-precision stage is demonstrated by experiments.

극초정밀 다축 스테이지를 이용한 광소자 정렬 특성 향상에 관한 연구 (A Study on the Optical Device Alignment Characteristics Improvement using Multi-Axis Ultra Precision Stage)

  • 정상화;차경래;김광호
    • 한국정밀공학회지
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    • 제22권12호
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    • pp.175-183
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    • 2005
  • In recent years, as the demands of VBNS and VDSL increase, the development of kernel parts of optical communication such as PLC(Planar Light Circuit), Coupler, and WDM elements increases. The alignment and the attachment technology are very important in the fabrication of optical elements. In this Paper, the optical alignment characteristic of multi-axis ultra precision stage is studied. The alignment algorithms are studied for applying to the ultra precision multi-axis stage. The alignment algorithm is comprised of field search and peak search algorithms. The contour of optical power signals can be obtained by field search and the precise coordinate can be found out by peak search. Three kinds of alignments, such as 1 ch. input vs. 1 ch. output optical stack, 1 ch. input vs. 8 ch. output PLC stacks, and ferrule vs. ferrule, are performed for investigating the alignment characteristics.

극초정밀 다축 스테이지를 이용한 광소자 정렬 자동화에 관한 연구 (A Study on the Optical Element Alignment Automation using Multi-Axis Ultra Precision Stage)

  • 정상화;김광호
    • 한국공작기계학회논문집
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    • 제15권6호
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    • pp.64-70
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    • 2006
  • The optical element was usually used in optical devices and optical transfer devices, but it has been recently used in communication, computer and medical equipment. With the development of very high speed optical-communication, the development of the kernel parts of optical communication has also increased. Presently, the alignment of the optical element is time consuming, and an effective alignment algorithm has not yet to be developed. In this paper, the alignment automation of the optical element is studied. The ultra precision stage is applied to an optical element alignment to improve the accuracy of the alignment. The automation program of the optical element alignment is developed by LabVIEW programming to save the alignment time. The alignment algorithms of the optical element consist of field search and peak search algorithms.

LCD 대평판 고정밀 얼라인먼트를 위한 비전 시스템 연구 (A Study on Vision System for High Precision Alignment of Large LCD Flat Panel Display)

  • 조성만;송춘삼;김준현;김종형
    • 제어로봇시스템학회논문지
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    • 제15권9호
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    • pp.909-915
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    • 2009
  • This work is to develop a vision system for high precision alignment between upper and lower plates required at the imprinting process of the large LCD flat panel. We compose a gantry-stage that has highly repeated accuracy for high precision alignment and achieves analysis about thermal transformations of stage itself. Position error in the stage is corrected by feedback control from the analysis. This system can confirm alignment mark of upper and lower plates by using two cameras at a time for the alignment of two plates. Pattern matching that uses geometric feature is proposed to consider the recognition problem for alignment mark of two plates. It is algorithm to correct central point and angle for the alignment from the recognized mark of upper and lower plates based on the special characteristics. At the alignment process, revision for error position is performed through Look and Move techniques.

극초정밀 다축 위치제어장치의 광소자 정렬 특성에 관한 연구 (A Study on the Optical Element Alignment of Ultra Precision Multi-Axis Stage)

  • 정상화;차경래;김현욱;최석봉;김광호;박준호
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 춘계학술대회 논문집
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    • pp.1190-1193
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    • 2005
  • In recent years, as the demands of VBNS and VDSL increase, the development of kernel parts of optical communication such as PLC(Planar Light Circuit), Coupler, and WDM elements increases. The alignment and the attachment technology are very important in the fabrication of optical elements. In this paper, the optical alignment characteristics of multi-axis ultra precision stage were studied. The alignment algorithms were studied for applying to the ultra precision multi-axis stage. The alignment algorithm is comprised of field search and peak search algorithms. The contour of optical power signals can be obtained by field search and the precise coordinate can be found out by peak search. Two kinds of alignments, such as 1 ch. input vs. 1 ch. output optical stack, and 1 ch. input vs. 8 ch. output PLC stacks were performed for investigating the alignment characteristics.

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