• Title/Summary/Keyword: Acid etching

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A STUDY ON THE EFFECTIVE PENETRATION OF ETCHING AGENT IN OCCLUSAL PIT & FISSURE (교합면 소와 열구에서 산부식 제재의 효과적인 침투 방법에 대한 연구)

  • Lee, Seong-Ryong;Lee, Sang-Ho;Lee, Chang-Seop;Lee, Nan-Young
    • Journal of the korean academy of Pediatric Dentistry
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    • v.32 no.3
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    • pp.472-480
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    • 2005
  • The purpose of this study was to investigate the effective penetration methods of acid etching agents in the pit and fissures on the occlusal surface. Extracted maxillary first and second premolars were divided into 4 groups : to Group I only acid etching agent was applied, to Group II ultrasonic scaler as well as acid etching agent were applied, to Group III after fissurotomy acid etching agent was applied, and to Group IV after fissurotomy the same process performed with Group II. The comparison between the 4 groups by the use of scanning electron microscope showed the results as follows : 1. Comparing each groups with regard to the penetration rate(%) of acid etching agents, Group III and Group IV showed improved penetration rate(%) compared with Group I. Group II made no significant different results from Group I, but had somewhat better penetration rate(%). 2. Comparing each groups with regard to the penetration rate(%) of acid etching agents according to regions within fissures, Group III and Group IV showed more improved penetration rate than Group I in the mesial pit and distal pit. However, no significant difference between each groups was showed in the middle fissure.

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Dissolution of Mo/Al Bilayers in Phosphoric Acid

  • Kim, In-Sung;Chon, Seung-Whan;Kim, Ky-Sub;Jeon, Il-Cheol
    • Bulletin of the Korean Chemical Society
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    • v.24 no.11
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    • pp.1613-1617
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    • 2003
  • In the phosphoric acid based etchant, the dissolution rates of Mo films were measured by microgravimetry and the corrosion potentials of Mo and Al were estimated by Tafel plot method with various concentrations of nitric acid. Dissolution rate of Mo increased with the nitric acid concentration and reached a limiting value at high concentration of nitric acid in ambient condition. Corrosion potentials of Mo and Al shifted to positive direction and the difference between potentials of both metals was about 1,100 mV and 1,200 mV with 1% and above 4% of $HNO_3$, respectively. For a Mo/Al bilayers, the dissolution rate inversion is the main reason for good taper angle in shower etching process. Taper angles are observed by scanning electron microscope (SEM) after wet etching process for Mo/Al layered films with different concentrations of $HNO_3$. In the etch side profile, it was found that Al corroded faster than Mo below 4% of $HNO_3$ in dip etching process, however, Mo corroded faster above 4%. Trend for variation of taper angle of etched side of Mo/Al layered film can be explained by considering the effect corrosion rates of both metals with various concentrations of $HNO_3$.

Investigation of Wet Chemical Etching for Surface Texturing of Multi-crystalline Silicon Wafers (다결정 실리콘 웨이퍼의 표면 텍스쳐링을 위한 습식 화학 식각에 대한 연구)

  • Kim, Bum-Ho;Lee, Hyun-Woo;Lee, Eun-Joo;Lee, Soo-Hong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.11a
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    • pp.19-20
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    • 2006
  • Two methods that can reduce reflectance in solar cells are surface texturing and anti-reflection coating. Wet chemical etching is a typical method that surface texturing of multi-crystalline silicon. Wet chemical etching methods are the acid texturization of saw damage on the surface of multi-crystalline silicon or double-step chemical etching after KOH saw damage removal too. These methods of surface texturing are realized by chemical etching in acid solutions HF-$HNO_3$-$H_2O$. In this solutions we can reduce reflectance spectra by simple process etching of multi-crystalline silicon surface. We have obtained reflectance of 27.19% m 400~1100nm from acidic chemical etching after KOH saw damage removal. This result is about 7% less than just saw damage removal substrate. The surface morphology observed by microscope and scanning electron microscopy (SEM).

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Recycling of Acidic Etching Waste Solution Containing Heavy Metals by Nanofiltration (II) : Dead-end Nanofiltration of PCB Etching Waste Solution Containing Copper Ion (나노여과에 의한 중금속 함유 산성 폐에칭액의 재생(II) : 구리이온을 함유한 PCB 폐에칭액의 Dead-end 나노여과)

  • Nam, Sang-Won;Jang, Kyung-Sun;Youm, Kyung-Ho
    • Membrane Journal
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    • v.23 no.1
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    • pp.92-99
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    • 2013
  • In this study the nanofiltration (NF) membrane treatment of a sulfuric acid waste solutions containing copper ion ($Cu^{+2}$) discharging from the etching processes of the printed circuit board (PCB) manufacturing industry has been studied for the recycling of acid etching solution. SelRO MPS-34 4040 NF membrane from Koch company was tested to obtain the basic NF data for recycling of etching solution and separation efficiency (total rejection) of copper ion. NF experiments were carried out with a dead-end membrane filtration laboratory system. The pure water flux was increased with the increasing storage time in sulfuric acid solution and lowering pH of acid solution because of the enhancement of NF membrane damage by sulfuric acid. The permeate flux of acid solution was decreased with the increasing copper ion concentration. Total rejection of copper ion was decreased with the increasing storage time in sulfuric acid solution and copper ion concentration, and lowering the pH of acid solution. The total rejection of copper ion was decreased from initial 37% to 15% minimum value.

Effects of Chemical Etching with Sulfuric Acid on Glass Surface

  • Jang, H.K.;Chung, Y.L.;S.W.Whangbo;C.N.Whang;Lee, S.J.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2000.02a
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    • pp.165-165
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    • 2000
  • Glass slides were chemically etched with sulfuric acid using five different methods. we investigated the effects of the chemical etching conditions on such properties as chemical composition, surface roughness, and the thermal stability of the glass. Sodium and carbon atoms in the surface of the glass are effectively eliminated by chemical etching with sulfuric acid. The glass slides were boiled for 30 min in 95% sulfuric acid and were depth profiled at room temperature with X-ray photoelectron spectroscopy (XPS), the Na ls signal was not detected in the detection limit of XPS. Surface morphology of the glass was very different depending on the concentration of sulfuric acid. The surface of the glass etched with 50% sulfuric acid was rougher than that of glass etched with 95% sulfuric acid. The sodium concentration of the glass boiled for 30 min in 95% sulfuric acid was nearly zero at the glass surface, and the sodium composition changed very little with annealing temperatures up to 35$0^{\circ}C$ in a vacuum environment. However the sulfur concentration at the glass surface due to the sulfuric acid increased with increasing temperature.

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A STUDY ON THE BOND STRENGTH OF REPAIR RESIN TO THE SURFACE TREATED COMPOSITE RESINS (표면처리된 복합레진에 대한 수리용 레진의 결합강도에 관한 연구)

  • Kang, Hyun-Sook;Choi, Ho-Young
    • Restorative Dentistry and Endodontics
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    • v.20 no.2
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    • pp.487-507
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    • 1995
  • Composite resin repair requires strong bond strength between the new and old materials. The objective of the current study was to identify the optimal treatments for sufficient bond strengths. Bondings between same kinds of materials and cross bondings using chemical curing composites and light curing composites were tested. Surface treatments included the methods of sand-blasting, acid etching and coating of bonding agent. Seven kinds cases of combinations from three kinds of methods were experimented and compared with a control group of which surfaces were highly polished. Measurements of shear bond strength and observations of surface morphologic changes using a scanning electron microscope were done. Following conclusions were drawn : 1. The highest bond strength among composite resins were exhibited by the treatment of the sand-blasting and the coating of bonding agent. 2. Acid etched surfaces showed the lowest bond strength. Bond strengths obtained from experimental groups including acid etching were lower than those obtained from same kinds of experimental groups without acid etching. 3. Simple method of the coating of bonding agent produced the slightly increased bond strength on chemical curing composite and reduced bond strength on light curing composite. 4. Bonding surfaces of chemical curing composite resin showed slightly higher bond strengths than light curing composite resin, however significant differences were not confirmed statistically. 5. More significant irregular surfaces were created by sand-blasting method than acid etching method. 6. A principal component of fillers of both resins was silicon. Acid etching method produced the seperations and degradations of fillers, these were significant on light curing composite resins which containing barium fillers.

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AN EXPERIMFNENTAL STUDY ON THE SURFACE ROUGHNESS OF ACID ETCHING ENAMEL SURFACE IN HUMAN TEETH (산부식처리(酸腐蝕處理) 치아법랑질(齒牙琺瑯質) 표면(表面)의 조도(粗度)에 관(關)한 실험적(實驗的) 연구(硏究))

  • Lee, Eun-Goo
    • Restorative Dentistry and Endodontics
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    • v.5 no.1
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    • pp.13-18
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    • 1979
  • The purpose of this study was to measure the roughness on the acid -etching surface. The etching agents of three-kinds composite resins were used to etch the tooth surface. Newly extracted I5-anterior teeth were invested with self-curing acrylic resin, and the labial surface was exposed. The exposed labial side was polished with abrasive papers and finally polished on polishing machine with zinc oxide powder. After the teeth were polished, the specimens were washed by water and dried by air. Surface roughness tester, Taylor-Habson's Taly Surf-10, (Fig-1) was used to measure roughness of this unetched tooth surface. And that, the specimens were divided into three groups. The first group was etched with Restodent etchant, the second group was etched with Nuva-system etchant, and Hi-pol etching agent was used in the third group. And the surface roughness tester was used to measure roughness of the etching teeth surface. The results obtained were as follows. 1. The roughness of acid-etched enamel were increased $2{\mu}m$ to $6{\mu}m$. 2. Hi-pol etchant produced the smoothest surface($2.3{\mu}m$). 3. Restodent etchant($3.8{\mu}m$) and Nuva-system etchant($3.7{\mu}m$) produced rougher surface than Hi-pol.

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The effect of additional etching and curing mechanism of composite resin on the dentin bond strength

  • Lee, In-Su;Son, Sung-Ae;Hur, Bock;Kwon, Yong-Hoon;Park, Jeong-Kil
    • The Journal of Advanced Prosthodontics
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    • v.5 no.4
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    • pp.479-484
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    • 2013
  • PURPOSE. The aim of this study was to evaluate the effects of additional acid etching and curing mechanism (light-curing or self-curing) of a composite resin on the dentin bond strength and compatibility of one-step self-etching adhesives. MATERIALS AND METHODS. Sixteen human permanent molars were randomly divided into eight groups according to the adhesives used (All-Bond Universal: ABU, Clearfil S3 Bond: CS3), additional acid etching (additional acid etching performed: EO, no additional acid etching performed: EX), and composite resins (Filtek Z-250: Z250, Clearfil FII New Bond: CFNB). Group 1: ABU-EO-Z250, Group 2: ABU-EO-CFNB, Group 3: ABU-EX-Z250, Group 4: ABU-EX-CFNB, Group 5: CS3-EO-Z250, Group 6: CS3-EO-CFNB, Group 7: CS3-EX-Z250, Group 8: CS3-EX-CFNB. After bonding procedures, composite resins were built up on dentin surfaces. After 24-hour water storage, the teeth were sectioned to make 10 specimens for each group. The microtensile bond strength test was performed using a microtensile testing machine. The failure mode of the fractured specimens was examined by means of an optical microscope at ${\times}20$ magnification. The data was analyzed using a one-way ANOVA and Scheffe's post-hoc test (${\alpha}$=.05). RESULTS. Additional etching groups showed significantly higher values than the no additional etching group when using All-Bond Universal. The light-cured composite resin groups showed significantly higher values than the self-cured composite resin groups in the Clearfil S3 Bond. CONCLUSION. The additional acid etching is beneficial for the dentin bond strength when using low acidic one-step self-etch adhesives, and low acidic one-step self-etch adhesives are compatible with self-cured composite resin. The acidity of the one-step self-etch adhesives is an influencing factor in terms of the dentin bonding strength and incompatibility with a self-cured composite resin.

THE EFFECT OF ETCHING TIME ON THE PATTERN OF ACID ETCHING ON THE ENAMEL OF PRIMARY TEETH (산부식 시간에 따른 유전치 법랑질의 부식 유형에 관한 연구)

  • Choi, Su-Mi;Choi, Young-Chul;Park, Jae-Hong;Choi, Sung-Chul
    • Journal of the korean academy of Pediatric Dentistry
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    • v.35 no.3
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    • pp.437-445
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    • 2008
  • The presence of a "prismless" layer on the enamel surface particularly on deciduous teeth has been reported by a number of workers. This structure, which appears to lack the normal prism delineations, could interfere with tag formation and hence, reduce bonding to such surfaces. The purpose of this study was to investigate the relationship of etching times on the effect of acid etching on primary enamel with respect to the quality of etching patterns. Labial surfaces of 32 extracted or exfoliated caries-free primary anterior teeth were used. 35% phosphoric acid gel was used only cervical regions of labial surfaces for each etching time group, 15, 30, 45 and 60 seconds. The surfaces were then washed with water for 20 seconds and dried with air spray for 20 seconds. 1. The Type 3 is 75% when the 15 seconds acid etching time was used. 2. The Type 1 is 38% and Type 2 is 75% when the 30 and 45 seconds acid etching time was used. 3. The Type 1 is 25% and Type 2 is 75% when the 60 seconds acid etching time was used. 4. An etching time of 60 seconds produced a constant and regular etching pattern. 5. There is a significant difference between the groups with respect to the patterns of etch achieved(p<0.05). 6. We confirmed that the acid induced patterns(type 1, 2) became more pronounced when the application time increased(p<0.05). $45{\sim}60$ seconds was the optimal time for etching on the primary enamel.

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STDUY ON THE SURFACE MORPHOLOGE AND SHEAR BOND STRENGTH OF IN-CERAM CORE TO RESIN CEMENT AFTER VARING MODES OF SURFACE CONDITIONING (In-Ceram 코아의 표면처리 방법에 따른 레진 시멘트와의 결함강도 및 표면상태에 관한 연구)

  • Kim, Yeung-Sug;Woo, Yi-Hyung;Lim, Ho-Nam;Choi, Boo-Byung
    • The Journal of Korean Academy of Prosthodontics
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    • v.33 no.4
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    • pp.693-704
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    • 1995
  • This study was performed to evaluate effective surface conditioning method of In-Ceram core to improve bonding with resin cement. The surface of each sample was avraded with glass bead for 20 seconds and then subjected to one of the following conditions : no modification, sandblasting with $50{\mu}m$ slumimum oxide powders for 20 seconds, etching with 20% hydrofluoric acid for 5, 10, and 15 minutes(half of the etched samples were coated with silane), and sandblasting with $250{\mu}m$ aluminum oxide powders and silica coating whith Silicoater MD system(Kulzer, Germany). The surface morphology changes were examined with scanning electronic microscope(SEM. and the shear bond strength of In-Ceram core samples to resin cement(Panavis 21, Kurayay, Japan) were measured. It was concluded that : 1. By SEM observation, 20% HF acid etching did not create clear microretentive structure and surface roughness diminished with increace in etching time. Sandblasting was more effective than 20% hydrofluoric acid etching in producing microretentive structure. 2. The bond strengths of all In-Ceram core samples surface conditioned were increased that that of control group. 3. Silica coating showed higher bond strength than etching with 20% hydrofluoric acid. 4. The use of silane coating was more effective in improving bond strength than lengthening etching time.

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