• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.80-81
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• 2012

Recently, one of the critical issues in the etching processes of the nanoscale devices is to achieve ultra-high aspect ratio contact (UHARC) profile without anomalous behaviors such as sidewall bowing, and twisting profile. To achieve this goal, the fluorocarbon plasmas with major advantage of the sidewall passivation have been used commonly with numerous additives to obtain the ideal etch profiles. However, they still suffer from formidable challenges such as tight limits of sidewall bowing and controlling the randomly distorted features in nanoscale etching profile. Furthermore, the absence of the available plasma simulation tools has made it difficult to develop revolutionary technologies to overcome these process limitations, including novel plasma chemistries, and plasma sources. As an effort to address these issues, we performed a fluorocarbon surface kinetic modeling based on the experimental plasma diagnostic data for silicon dioxide etching process under inductively coupled C4F6/Ar/O2 plasmas. For this work, the SiO2 etch rates were investigated with bulk plasma diagnostics tools such as Langmuir probe, cutoff probe and Quadruple Mass Spectrometer (QMS). The surface chemistries of the etched samples were measured by X-ray Photoelectron Spectrometer. To measure plasma parameters, the self-cleaned RF Langmuir probe was used for polymer deposition environment on the probe tip and double-checked by the cutoff probe which was known to be a precise plasma diagnostic tool for the electron density measurement. In addition, neutral and ion fluxes from bulk plasma were monitored with appearance methods using QMS signal. Based on these experimental data, we proposed a phenomenological, and realistic two-layer surface reaction model of SiO2 etch process under the overlying polymer passivation layer, considering material balance of deposition and etching through steady-state fluorocarbon layer. The predicted surface reaction modeling results showed good agreement with the experimental data. With the above studies of plasma surface reaction, we have developed a 3D topography simulator using the multi-layer level set algorithm and new memory saving technique, which is suitable in 3D UHARC etch simulation. Ballistic transports of neutral and ion species inside feature profile was considered by deterministic and Monte Carlo methods, respectively. In case of ultra-high aspect ratio contact hole etching, it is already well-known that the huge computational burden is required for realistic consideration of these ballistic transports. To address this issue, the related computational codes were efficiently parallelized for GPU (Graphic Processing Unit) computing, so that the total computation time could be improved more than few hundred times compared to the serial version. Finally, the 3D topography simulator was integrated with ballistic transport module and etch reaction model. Realistic etch-profile simulations with consideration of the sidewall polymer passivation layer were demonstrated.

• E2M - 전기 전자와 첨단 소재
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• 제12권7호
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• pp.7-11
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• 1999

Fully sealed field emission display in size of 4.5 inch has been fabricated using single-wall carbon nanotubes-organic vehicle com-posite. The fabricated display were fully scalable at low temperature below 415$^{\circ}C$ and CNTs were vertically aligned using paste squeeze and surface rubbing techniques. The turn-on fields of 1V/${\mu}{\textrm}{m}$ and field emis-sion current of 1.5mA at 3V/${\mu}{\textrm}{m}$ (J=90${\mu}{\textrm}{m}$/$\textrm{cm}^2$)were observed. Brightness of 1800cd/$m^2$ at 3.7V/${\mu}{\textrm}{m}$ was observed on the entire area of 4.5-inch panel from the green phosphor-ITO glass. The fluctuation of the current was found to be about 7% over a 4.5-inch cath-ode area. This reliable result enables us to produce large area full-color flat panel dis-play in the near future. Carbon nanotubes (CNTs) have attracted much attention because of their unique elec-trical properties and their potential applica-tions [1, 2]. Large aspect ratio of CNTs together with high chemical stability. ther-mal conductivity, and high mechanical strength are advantageous for applications to the field emitter [3]. Several results have been reported on the field emissions from multi-walled nanotubes (MWNTs) and single-walled nanotubes (SWNTs) grown from arc discharge [4, 5]. De Heer et al. have reported the field emission from nan-otubes aligned by the suspension-filtering method. This approach is too difficult to be fully adopted in integration process. Recently, there have been efforts to make applications to field emission devices using nanotubes. Saito et al. demonstrated a car-bon nanotube-based lamp, which was oper-ated at high voltage (10KV) [8]. Aproto-type diode structure was tested by the size of 100mm $\times$ 10mm in vacuum chamber [9]. the difficulties arise from the arrangement of vertically aligned nanotubes after the growth. Recently vertically aligned carbon nanotubes have been synthesized using plasma-enhanced chemical vapor deposition(CVD) [6, 7]. Yet, control of a large area synthesis is still not easily accessible with such approaches. Here we report integra-tion processes of fully sealed 4.5-inch CNT-field emission displays (FEDs). Low turn-on voltage with high brightness, and stabili-ty clearly demonstrate the potential applica-bility of carbon nanotubes to full color dis-plays in near future. For flat panel display in a large area, car-bon nanotubes-based field emitters were fabricated by using nanotubes-organic vehi-cles. The purified SWNTs, which were syn-thesized by dc arc discharge, were dispersed in iso propyl alcohol, and then mixed with on organic binder. The paste of well-dis-persed carbon nanotubes was squeezed onto the metal-patterned sodalime glass throuhg the metal mesh of 20${\mu}{\textrm}{m}$ in size and subse-quently heat-treated in order to remove the organic binder. The insulating spacers in thickness of 200${\mu}{\textrm}{m}$ are inserted between the lower and upper glasses. The Y\ulcornerO\ulcornerS:Eu, ZnS:Cu, Al, and ZnS:Ag, Cl, phosphors are electrically deposited on the upper glass for red, green, and blue colors, respectively. The typical sizes of each phosphor are 2~3 micron. The assembled structure was sealed in an atmosphere of highly purified Ar gas by means of a glass frit. The display plate was evacuated down to the pressure level of 1$\times$10\ulcorner Torr. Three non-evaporable getters of Ti-Zr-V-Fe were activated during the final heat-exhausting procedure. Finally, the active area of 4.5-inch panel with fully sealed carbon nanotubes was pro-duced. Emission currents were character-ized by the DC-mode and pulse-modulating mode at the voltage up to 800 volts. The brightness of field emission was measured by the Luminance calorimeter (BM-7, Topcon).

• 한국지역지리학회지
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• 제6권3호
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• pp.153-168
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• 2000

해안습지는 육지와 해양이 만나는 점이지대에 형성된 해안퇴적지형으로, 이 중 염하구는 하천과 조류의 영향이 갯강을 통해 직접적으로 미치는 만입형 해안습지이다. 따라서 하천과 조류에 의한 퇴적작용은 염하구의 성장과 발달에 있어서 가장 중요한 프로세스이다. 해안습지는 최근 중요한 환경문제로 대두되고 있는 해수면 상승의 영향을 직접적으로 받는 지형이기 때문에, 해안습지 성장률에 관한 연구는 해안환경의 이해와 관리에 있어 중요한 자료를 제공한다. 본 연구는 순천만 염하구 해안습지를 대상으로 상이한 시간단위 속에서 진행되는 퇴적률과 조류에 의한 부유하중의 이동패턴 분석을 토대로 해안습지 성장률의 공간적 특성을 밝히고자 하였다. 조석의 일주기간의 퇴적률은 경사변환점이 염생습지보다 높은 값을 나타내었으며, 하구에서 바다로 이동하면서 퇴적률이 감소하였다. 따라서 조석의 일주기간의 퇴적률에서는 갯강과 배후 갯벌사이 경사변환점의 제방효과와 부유하중의 농도가 중요하게 작용하였다. 연간 퇴적률은 염생습지가 경사변환점보다 높은 값을 나타내어 조석의 일주기간의 퇴적률과는 다른 공간적 특성을 보였다. 그러나 하구에서 바다로 이동하면서 퇴적률이 감소하는 것은 동일하였다. 따라서 연간 퇴적률에서는 식생에 의한 부유하중 고착능력과 조류의 정체시간, 부유하중의 농도가 중요하게 작용하였다. 조류내 부유하중의 농도는 전체적으로 썰물시 영생습지를 통과한 직후가 밀물시 경사변환점을 통과한 직후보다 높은 감소율을 나타내었다. 그리고 썰물시 경사변환점을 통과한 직후의 부유하중 농도는 오히려 약간 증가하였는데, 이는 썰물에 의해 경사변환점의 퇴적물이 침식되었기 때문이다. 연구지역의 퇴적률은 시간단위와 지점에 따라 다양한 특성을 보이면서 매우 빠르게 진행되고 있다. 경사변환점은 제방효과에 의한 퇴적과 조류 및 외부요인에 의한 침식이 동시에 일어난 반면, 염생습지는 조류의 정체시간과 식생에 의한 부유하중 포획에 따라 침식보다는 퇴적이 활발하게 일어났다. 따라서 연구지역의 성장률은 갯강을 중심으로 횡적으로는 염생습지가 경사변환점보다 높고, 종적으로하는 하구지점에 가까울수록 높게 나타났다. 특히, 지난 1년간의 성장률은 다른 지역에 비해서 매우 빠른 $0.9{\sim}3.5cm/yr$로 모든 지점에서 퇴적이 침식보다 우세하게 나타났는데, 이는 연구지역이 새로운 퇴적환경으로 전이되고 있는 것과 밀접한 관계가 있는 것이다.

• 기록학연구
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• 제12호
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• pp.137-178
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• 2005

The anticommunist guerrillas' activities that aretheconcern of this article took place largely in North Korea or behind the enemy-held lines. Verifying their history is accordingly difficult and requires careful attention, but despite their active operations the military as well as the scholarly community have been lax in studying them. The Korean War came to be perceived as a traditional, limited war with regular battles, so that the studies addressed mostly the regular operations, and guerrilla warfare is remembered as an almost 'exclusive property' of the communist invaders; a small wonder that the anticommunist guerrillas have not been studied much and the collection of materials neglected. Therefore, in contrast with the witness accounts concerning regular battles, witness resources were of a small volume about these "patriots without the service numbers." For the above reasons the guerrilla participants and their later-organized fellowships took to the task of leaving records and compiling the histories of their units. They became active preservers of history in order to inform later generations of their works and also to secure deserved benefits from the government, in a world where none recognized their achievements. For instance, 4th Donkey Unit published witness accounts in addition to a unit history, and left video-recordings of guerrilla witnesses before any institute systematized the oral history of the guerrillas. In the case of Kyulsa ("Resolved to Die") Guerrilla Unit, the unit history was 10 times revised and expanded upon for publication, contributing substantially to the recovery of anticommunist guerrilla history which had almost totally lacked documented resources. Now because the guerrilla-related witness accounts were produced through fellowship societies and not individually, it often took the form of 'collective memory.' As a result, though thousands of former guerrillas remain surviving, the scarcity of numerous versions of, or perspectives upon, an event renders difficult an objective approach to the historical truth. Even requests to verify the service of a guerrilla member or to apply for decoration or government benefits for those killed in action, the process is taken care of not at the hands of the first party but the veteran society, so that a variety of opinions are not available for consideration. Moreover, some accounts were taken by American military personnel, and since some historians, unaware of official documents or evaluation of achievements, tended to center the records around their own units and especially to exaggerate the units' performances, they often featured factual errors. Thefollowing is the means to utilize positively the aforementioned type of witness accounts in military history research. It involves the active use of military historical detachments (MHD). As in the examples of those dispatched by the American forces during the Korean War, experts should be dispatched during, and not just after, wartimes. By considering and investigating the differences among various perspectives on the same historical event, even without extra documented resources it is possibleto arrive at theerrors or questionable points of the oral accounts, supplementing the additional accounts. Therefore any time lapses between witness accounts must be kept in consideration. Moreover when the oral accounts come from a group such as participants in the same guerrilla unit or operation, a standardized list of items ought to be put to use. Education in oral history is necessary not just for the training of experts. In America wherethefield sees much activity, it is used not only in college or graduate programs but also in elementary and lifetime educational processes. In comparison in our nation, and especially in historical disciplines, methodological insistence upon documented evidences prevails in the main, and in the fields of nationalist movement or modern history, oral accounts do not receive adequate attention. Like ancient documents and monuments, oral history also needs to be made a regular part of diverse resource materials at our academic institutes for history. Courses in memory and history, such as those in American colleges, are available possibilities.

• 자원환경지질
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• 제50권4호
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• pp.287-302
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• 2017

대기층의 고품위 석회석 생성기작은 고품위로 퇴적되었다는 견해와 퇴적 이후 열수의 작용에 의해 상부 영역에 국한되어 백색화와 함께 고품위화 하였다는 두 가지 견해로 나뉘어 있으며, 광물-암석화학적 연구를 통해 이들 견해를 검토하였다. 대기층의 암색은 크게 백색, 담갈색, 담회색, 회색, 암회색의 다섯 단계로 구분할 수 있다. 이 중 백색~담회색 암석은 53.15 ~ 55.64 wt. % CaO의 고품위 석회석이며, 담갈색은 20.71 ~ 21.67 wt. % MgO로 거의 순수한 백운석이다. 대기층은 상부와 하부의 석회암대와 그 사이에 중부 백운암대로 구성되어 있으며, 상부가 하부에 비해 전반적으로 높은 CaO 함량을 보인다. 다만, 대기층 상부와 하부에서 전반적으로 백색화 현상이 관찰되며, 하부에서 백색에 비해 담회색 암석의 CaO 함량이 높은 경향이 나타나고 있어, 백색화와 CaO 함량은 상관관계가 없는 것으로 확인된다. 또한, 고품위 석회석과 중-저품위 석회석의 구분은 CaO 성분과 함께 $Al_2O_3$, $K_2O$ 등 이질성분의 함유정도에 따라 구분되는데, 백색도가 높은 영역에서 이질성분의 함량이 증가하는 양상을 보이기도 한다. 특히, $Al_2O_3$는 열수에 의해 쉽게 제거될 수 없는 성분이므로, 열수 작용에 의해 백색화와 함께 이질 성분이 제거되었다는 이론은 증거가 미약한 것으로 판단된다. 산소-탄소 안정동위원소 분포는 대기층 상부와 하부의 석회암대 모두에서 탄소 안정동위원소의 변화 폭은 2 ‰ 이내인 반면, 산소 안정동위원소는 16 ‰ 이상의 큰 폭의 변화가 인지되어, 대기층 전반적으로 열수의 영향을 받은 것으로 확인된다. 열수작용의 시기는 $85.1{\pm}1.7Ma$로 주변 동원광산의 광화시기와 일치한다. 회색-담회색-백색으로 백색화가 진행될수록 산소 안정동위원소 비는 낮아지는 경향이 확인되며, 이는 이 지역 탄산염암의 백색화는 열수에 의한 현상임을 지시한다. 따라서, 대기층은 전반적으로 열수의 영향을 받았으며, 열수에 의해 백색화가 진행되었으나, 고품위 석회석화는 백색화와 관련이 없으며, 열수에 의한 현상이 아닌 것으로 판단된다. 대기층 상부에서의 고품위화는 이질물 특히, $Al_2O_3$ 성분이 효과적으로 제거될 수 있는 퇴적환경을 고려하여야 하며, 중부 백운암대를 중심으로 상-하부 주변에서 CaO 함량이 증가하는 양상으로부터 순차층서적으로 퇴적 당시 이질물의 퇴적작용이 배제된 탄산염 천해환경이 조성된 결과로 보는 것이 타당할 것이다.