• Geotechnical Engineering
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• v.9 no.3
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• pp.67-76
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• 1993

Korea being composed of a number of mountains has been damaged and destroyed in lives and properties by the occurrence of many landslides during the wet seasons. Therefore, it is necessary to study the forecast system and risk analysis for the occurrence of landslides : the rise of groundwater levels due to rainfall is the main cause of landslides. In this paper, the autoregressive models are used to predict the grondwater levls using cases of both time invariant and time -varing autoregressive coefficients. In the former case, AR(1), AR(2), and AR(3) models are selected and their single-valued parameters are estimated to fit them to the observed groundwater level series. In the latter case, modified AR(1) and typical AR(2) models are used as process model and a discrete Kalman Filtering technique is utilized to estimate the parameters which are themselves a function of time. The results show that the real time forecast system using the time-varying autoregressive coefficinets as well as time -invariant AR model is good to predict the groundwater level in hillside slopes and we might get better result if we use the time-hourly rainfall intensity as well as the observed groundwater level.

• International Journal of Advanced Culture Technology
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• v.3 no.1
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• pp.169-178
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• 2015

This research aims to study the effects of various welding parameters in gas metal arc welding (GMAW) process on welding penetration, microstructure and hardness of AS3578-A350 high strength steel with the thickness of 10 mm. The welding process parameters were a welding current of 100-200A, an arc voltage of 20-30V, a welding speed of 20-60 cm/min and a gas shielding type of Ar and $Ar+CO_2$. The summarized experimental results are as follows. An increase of the welding current and voltage affected to increase the penetration depth of the joint. However, when the welding speed was decreased, it increased the penetration depth of the joint. Using the Ar gas for shielding the weld area, produced the higher penetration depth and the less narrow weld bead than the joint that was shielded by the mix gas of $Ar+CO_2$. The variation of the welding process parameters affected to produce the various microstructures of weld metal and heat affected zone and also showed the various kind of hardness along the weld joint.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.05b
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• pp.7-11
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• 2002

In this study, Au thin films were etched with a $Cl_2/Ar$ gas combination in an in an inductively coupled plasma. The etch properties were measured for different gas mixing ratios of $Cl_2/(Cl_2+Ar)$ while the other process conditions were fixed at rf power (700 W), dc bias voltage (150 V), and chamber pressure (15 mTorr). The highest etch rate of the Au thin film was 3500 $\AA/min$ and the selectivity of Au to $SiO_2$ was 4.38 at a $Cl_2/(Cl_2+Ar)$ gas mixing ratio of 0.2. The surface reaction of the etched Au thin films was investigated using x-ray photoelectron spectroscopy (XPS) analysis. There is Au-Cl bonding by chemical reaction between Cl and Au. During the etching of Au thin films in $Cl_2/Ar$ plasma, Au-Cl bond is formed, and these products can be removed by the physical bombardment of Ar ions. In addition, Optical emission spectroscopy (OES) were investigated to analyze radical density of Cl and Ar in plasma. The profile of etched Au investigated with scanning electron microscopy (SEM).

• Journal of the Korean Ceramic Society
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• v.34 no.3
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• pp.249-256
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• 1997

The effect of process parameter of plasma assisted chemical vapor deposition (PACVD) on the variation of the ratio between cubic boron nitride (c-BN) and hexagonal boron nitride (h-BN) in the film was in-vestigated. The plasma was generated by electric power with the frequency between 100 and 500 KHz. BCl3 and NH3 were used as a boron and nitrogen source respectively and Ar and hydrogen were added as a car-rier gas. Films were composed of h-BN and c-BN and its ratio varied with the magnitude of process parameters, voltage of the electric power, substrate bias voltage, reaction pressure, gas composition, sub-strate temperature. TEM observation showed that h-BN phase was amorphous while crystalline c-BN par-ticle was imbedded in h-BN matrix in the case of c-BN and h-BN mixed film.

• Journal of Korean Ophthalmic Optics Society
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• v.16 no.2
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• pp.159-165
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• 2011

Purpose: In this paper, the reliability and reproductivity of anti-reflection (AR) coating on ophthalmic lens using optical monitoring system (OMS) were investigated. Methods: The random error simulation and RunSheet performance in Essential Macleod software to confirm possibility of AR coating using OMS were performed. The coating process of 19 batches was carried out in order to perform reproductivity test of AR coating after simulation process. Results: As a result, the coating results of 19 batches had shown the excellent reproductivity of about 0.5% error. Conclusions: We confirmed the excellent reproductivity and reliability of AR coating on ophthalmic lens using optical monitoring system from our results.

• The Korean Journal of Ceramics
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• v.2 no.1
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• pp.43-47
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• 1996

$RuO_2$ thin films deposited directly on Si substrate by RF magnetron sputtering method using $RuO_2$ target have been investigated. Special interest was focused on the effect of process parameter on the surface roughness of $RuO_2$ films. Crystallization behavior and electrical properties of the films deposited at $300^{\circ}C$ were superior to those deposited at room temperature. Metallic Ru phase was formed in pure Ar and this phase had resulted poor adhesion after post annealing process in oxidizing ambient. Microstructural analysis reveals that the size of the $RuO_2$ crystallites gets smaller and the surface becomes smoother as the $O_2$ partial pressure or film thickness decreases. Irrespective of the $O_2/Ar$ ratio, resistivity of $RuO_2$ films ranged in $50~70 {\mu}{\Omega}-cm$. As the film thickness decreases, there is a thickness where the resistivity rises abruptly. Such an onset thickness turned out to be dependent n the $O_2$/Ar ratio.

• Journal of the Korean Society for Precision Engineering
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• v.25 no.8
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• pp.37-44
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• 2008

Nowadays, the increasing global competition forces manufacturer to reduce the cost and time for implementation of manufacturing system. The AR(augmented reality) technology as a new human-machine interface introduces a noteworthy perspective for a new manufacturing system design. Using AR technology, a physically existing production environment can be superimposed with virtual planning objects. Therefore, the planning tasks can be validated without modeling the surrounding environment of the production domain during short process planning time. In this paper, we introduce the construction of AR browser and determine the optimal environment parameters for field application of AR system through lots of tests. And, many methods such as multi-marker coordinate system, division of virtual objects and so on, are proposed in order to solve the problems suggested from initial field test. Based on these tests and results, the test-bed of C/Pad assembly system is configured and robot program for C/Pad assembly is generated based on AR system.

• Transactions of the Korean Society of Automotive Engineers
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• v.5 no.5
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• pp.140-156
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• 1997

The combustion characteristics of DI Diesel engine using turbocharging and EGR are numerically studied. Computations are carried out for the wide range of trubochyarged pressures, EGR ratios, and Ar/He dilution. Numerical results indicate that the Ar/He dilution in the intake gas significantly influence the engine performance, the spray combustion process, and the pollutant formation.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07a
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• pp.58-61
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• 2002

SBT thin films were etched at different content of Cl$_2$in Cl$_2$/Ar plasma. We obtained the maximum etch rate of 883 ${\AA}$/min at Cl$_2$(20%)/Ar(80%). As Cl$_2$ gas increased in Cl$_2$/Ar plasma, the etch rate decreased. The maximum etch rate may be explained by variation of volume density for Cl atoms and by the concurrence of two etching mechanisms such as physical sputtering and chemical reaction with formation of low-volatile products, which can be desorbed only by ion bombardment. The variation of volume density for Cl, F and Ar atoms and ion current density were measured by the optical emission spectroscopy and Langmuir probe. To evaluate the physical damage due to plasma, X-ray diffraction and atomic force microscopy analysis carried out. After etching process, P-E hysteresis loops were measured by ferroelectric workstation.

• Journal of the Korean Operations Research and Management Science Society
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• v.37 no.1
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• pp.29-43
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• 2012

We design a DEA-AR model using multiple regression analysis with new methods which limit weights. When there are multiple input and single output variables, our model can be used, and the weights of input variables use the regression coefficient and coefficient of determination. To verify the effectiveness of the new model, we evaluate the efficiency of the Regional Corporations in Korea. Accordance with statistical analysis, it proved that there is no difference between the efficiency value of the DEA-AR using AHP and our DEA-AR model. Our model can be applied to a lot of research by substituting DEA-AR model relying on AHP in the future.