• 한국재료학회지
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• 제17권11호
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• pp.618-621
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• 2007

Chromium nitride (CrN) films were deposited on silicon substrate by RF magnetron sputtering assisted by inductive coupled nitrogen plasma without intentional substrate heating. Films were deposited with different levels of bombarding energy by nitrogen ions $(N^+)$ to investigate the influence of substrate bias voltage $(V_b)$ on the growth of CrN thin films. XRD spectra showed that the crystallographic structure of CrN films was strongly affected by substrate bias voltage. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) results showed that surface roughness and grain size of the CrN films varied significantly with bias voltage. For - 80 $V_b$ depositions, the CrN films showed bigger grain sizes than those of other bias voltage conditions. The lowest surface roughness of 0.15 nm was obtained from the CrN films deposited at .130 $V_b$.

• 한국전기전자재료학회논문지
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• 제16권6호
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• pp.460-464
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• 2003

The barium strontium titannate ((Ba,Sr)TiO$_3$:BST) thin films were etched in an inductively coupled plasma (ICP) as a function of CF$_4$/Ar gas mixing ratio. Under CF$_4$(20%)/Ar(80%), the maximum etch rate of the BST films was 400 $\AA$/min. Etching products were redeposited on the surface of BST and then the nature of crystallinity were varied. Therefore, we investigated the etched surface of BST by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). The plasma damages were evaluated in terms of leakage current density by Agilent 4145C and dielectric constant by HP 4192 impedance analyzer. After the BST thin films exposed in the plasma, the leakage current density and roughness increases. After annealing at 600 $^{\circ}C$ for 10 min in $O_2$ ambient, the leakage current density, roughness and nonvolatile etch byproducts reduced. From this results, the plasma induced damages were recovered by annealing process owing to the relaxation of lattice mismatches by Ar ions and the desorption of metal fluorides in high temperature.

• Tribology and Lubricants
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• 제18권1호
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• pp.1-8
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• 2002

Nano adhesion and friction between a $Si_{3}N_{4}$ AFM(atomic force microscope) tip and thin silver films were experimentally studied. Tests were performed to measure the nano adhesion and friction in both AFM and LFM(lateral force microscope) modes in various range of normal loads. Thin silver films deposited by IBAD (ion beam assisted deposition) on Si-wafer (100) and other Si-wafers of different surface roughness were used. Results showed that nano adhesion and friction decreased with the surface roughness. When the Si surfaces were coated by pure silver, the adhesion and friction decreased. But the adhesion and friction were not affected by the thickness of IBAD silver coating. As the normal force increased, the adhesion forces of bare Si-wafer and IBAD silver coating film remained constant, but the friction forces increased linearly. Test results suggested that the friction was mainly governed by the adhesion as long as the load was low.

• 전기화학회지
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• 제6권3호
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• pp.217-223
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• 2003

The present work is concerned with characterization of surface roughness and inhomogeneity of four kinds of hot-rolled carbon steels in terms of the fractal dimension and the depression parameter by using image analysis method and electrochemical impedance spectroscopy, respectively. From the analysis of the 3D AFM image, it is realized that all the hot-rolled steel surfaces show the self-affine fractal property. The values of the fractal dimension of the hot-rolled steels were determined by the analyses of the AFM images on the basis of both the perimeter-area method and the triangulation method. In addition, the Nyquist plots were found to be depressed from a perfect semicircle form. From the experimental findings, the changes in the values of the fractal dimension and the depression parameter with chemical composition have been discussed in terms of the change in the value of hardness of base steel.

• Bulletin of the Korean Chemical Society
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• 제19권5호
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• pp.549-553
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• 1998

The structure and layer distribution of cadmium arachidate Langmuir-Blodgett film were analyzed by the small angle X-ray reflectivity measurements using synchrotron radiation. Y-to X type transition was ocurred during the 39th passage of deposition of cadmium arachidate. Based on the measurement of the consumed area of the monolayer, it was determined that about 27.5 layer was deposited. Using the synchrotron X-ray, the reflectivity profile of cadmium arachidate LB film over the wide range of grazing angle was obtained. The X-ray reflectivity profile was analyzed using the recursion formula. By fitting the location and dispersion of the subsidiary maxima between the Bragg peaks of the measured reflectivity profile with that of the calculated reflectivity profile, the average thickness and the distribution of layer thickness were evaluated. The genetic algorithm was adopted to the fitting of reflectivity profile to evaluate the optimum value of the number distribution of layer. Based on the morphology measurement with an atomic force microscopy (AFM), the domain structure and mean roughness of LB films were obtained. The mean roughness value calculated based on the number of layer distribution obtained from the measurement by AFM is consistent with that obtained from X-ray reflectivity analysis.

• 센서학회지
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• 제31권4호
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• pp.214-217
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• 2022

The effect of inductively coupled plasma (ICP) treatment with O₂ gas on the surface properties of poly(ether sulfone) (PES) was investigated. X-ray photoelectron spectroscopy (XPS) was used to analyze the chemical characteristics of the O₂ plasma-treated PES films. The surface roughness of the pristine and O₂ plasma-treated PES films for different RF powers of the ICP was determined using an atomic force microscope (AFM). The contact angles of the PES films were also measured, using which the surface free energies were calculated. The O1s XPS spectra of the PES films revealed that the number of polar functional groups increased following the O₂ plasma treatment. The AFM analysis showed the average surface roughness increased from 1.01 to 4.48 nm as the RF power of the ICP was increased. The contact angle measurements revealed that the PES films became more hydrophilic as the RF power of the ICP was increased. The total surface energy increased with the RF power of the ICP, resulting from the increased polar energy component.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.410-410
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• 2012

The continuous monolayer graphene was synthesized on electro-polished copper foil. Electro-polishing sticks off the coating layer of copper foil, which prevents the continuous graphene growth. The quality of continuous graphene is dependent on roughness of copper foil. Copper foil roughness could be controlled by changing polishing condition. The effects of working voltage (4-6 V) and time (30-70 sec) for electro-polishing were systematically examined. The change of surface roughness was checked with AFM.

• 한국세라믹학회지
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• 제47권4호
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• pp.290-295
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• 2010

This study has been focused on properties of mirror surface grinding technology by ELID(Electrolytic In-process Dressing) for structural ceramics using in high precision structural parts as like semi-conductor manufacturing processes. The experimental studies have been carried out to get mirror surface for grinding of structural ceramics, SiC, $Al_2O_3$ and AlN. Grinding process of the ceramics is carried out with varying mesh type, depth of cut and feed rate using diamond wheel. The machining result of the surface roughness and condition of ground surface, have been analyzed by use of surface roughness tester, SEM, AFM and three dimensional surface profiler measurement system.

• 한국레이저가공학회지
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• 제12권2호
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• pp.7-10
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• 2009

In this paper, we study experimentally the local polishing of $SiO_2$ surface using the $CO_2$ laser. For laser local polishing, we polished to remove the grooves or to be reformed the surface of grooves after forming the grooves on the material surface. We measured the reflectance, transmittance, and beam profile in order to measure the roughness of polished surface. The Atom Force Microscope (AFM) is used to measure roughness of local polishing surface. We can predict that the laser polishing contribute to the removal of generated debris and surface roughness on the micro processing.

• E2M - 전기 전자와 첨단 소재
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• 제9권10호
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• pp.1060-1065
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• 1996

We have studied the magnetoresistance phenomena on spin valve thin films of antiferromagnetic NiO/CoO. Interlayer coupling oscillates between the antiferrocoupling and ferrocoupling with the variation of Cu thickness. The exchange coupling strength between NiO (antiferromagnetic) and NiFe(ferromagnetic) as a function of NiO texture and interface roughness is investigated by CoO insertion. CoO has significantly higher anisotropy in the (111) plane and interface roughness. It seems that the MR-ratio is increased by CoO inserted films. From the AFM and XRD data, the increase of MR-ratio and exchange field is influenced by the roughness of CoO.