• 한국결정성장학회지
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• 제14권1호
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• pp.21-26
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• 2004

HPHT(고온고압) 처리된 type IIa 다이아몬드의 분광분석 결과를 나타내었다. 그리고 HPHT 처리된 다이아몬드 spectrum의 특성을 이와 유사한 color와 type을 가진 처리되지 않은 다이아몬드와 비교하였다. 325nm 에서 여기된 He/Cd laser로는 HPHT 처리된 다이아몬드와 처리되지 않은 다이아몬드에 현저한 변화가 있음을 알 수 있었는데 이는 HPHT 처리된 다이아몬드의 spectrum에서 H3, H4에 관련된 peak가 제거되고 N3 system에 관련된 peak의 emission이 증가함을 보여 주었다. 또한 514nm에서 여기된 Ar-ion laser로 측정된 spectrum은 575nm와 637.1 nm에서 Nitrogen과 vacancy가 관련되어있는 N-V center가 발견 되었는데 이러한 center가 존재하고 있을 경우 637.1 nm의 FWHM의 값은 HPHT 처리된 다이아몬드와 처리되지 않은 다이아몬드를 구분할 수 있음을 보여주었다. 본 실험에서 측정된 HPHT 처리된 다이아몬드의 637.1nm $(N-V)^-$의 FWHM 값은 $19.8{\textrm}{cm}^{-1}$에서$32.1{\textrm}{cm}^{-1}$였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.327-327
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• 2009

ZnO with a large band gap (~3.37 eV) and exciton binding energy (~60 meV), is suitable for optoelectronic applications such as ultraviolet (UV) light emitting diodes (LEDs) and detectors. However, the ZnO-based p-n homojunction is not readily available because it is difficult to fabricate reproducible p-type ZnO with high hall concentration and mobility. In order to solve this problem, there have been numerous attempts to develop p-n heterojunction LEDs with ZnO as the n-type layer. The n-ZnO/p-GaN heterostructure is a good candidate for ZnO-based heterojunction LEDs because of their similar physical properties and the reproducible availability of p-type GaN. Especially, the reduced lattice mismatch (~1.8 %) and similar crystal structure result in the advantage of acquiring high performance LED devices. In particular, a number of ZnO films show UV band-edge emission with visible deep-level emission, which is originated from point defects such as oxygen vacancy, oxygen interstitial, zinc interstitial[1]. Thus, defect-related peak positions can be controlled by variation of growth or annealing conditions. In this work, the undoped ZnO film was grown on the p-GaN:Mg film using RF magnetron sputtering method. The undoped ZnO/p-GaN:Mg heterojunctions were annealed in a horizontal tube furnace. The annealing process was performed at $800^{\circ}C$ during 30 to 90 min in air ambient to observe the variation of the defect states in the ZnO film. Photoluminescence measurements were performed in order to confirm the deep-level position of the ZnO film. As a result, the deep-level emission showed orange-red color in the as-deposited film, while the defect-related peak positions of annealed films were shifted to greenish side as increasing annealing time. Furthermore, the electrical resistivity of the ZnO film was decreased after annealing process. The I-V characteristic of the LEDs showed nonlinear and rectifying behavior. The room-temperature electroluminescence (EL) was observed under forward bias. The EL showed a weak white and strong yellowish emission colors (~575 nm) in the undoped ZnO/p-GaN:Mg heterojunctions before and after annealing process, respectively.