• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.1341-1344
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• 2009

A novel method to control the viewing direction by moving aperture location in 4-f illumination optics to control light direction is proposed. Based on integral imaging principle, the relayed point light sources by 4-f optics are modulated by a spatial light modulator, displaying three-dimensional images. In the proposed method, we locate the aperture, which acts as a band pass filter, around an optic axis to control the light direction. Resultantly, assuming that we know the viewer position by a tracking system, we can display appropriate three-dimensional images over large viewing angle.

• Korean Journal of Optics and Photonics
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• v.10 no.6
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• pp.453-461
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• 1999

In this paper, we have studied on the effects of annular and quadrupole illuminations by changing their conditions for enhancing the pattern resolution and depth of focus (OaF) in the optical lithography system using KrF Eximer laser 0.248$\mu$m and 0.65 NA. As a result, it is revealed that each illumination condition to optimize the resolution and the OaF for the mask containing the assistance pattern is different under the annular illumination. And in case of quadrupole illumination, we could ascertain that the resolution and the OaF would be enhanced through changing the arrangement of each pole from the conventional X type (45 degrees) to some proper type according to the main pattern direction. ction.

• Korean Journal of Optics and Photonics
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• v.4 no.4
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• pp.373-380
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• 1993

A five mirror system with a reduction magnification(M=+1/5) is designed for DUV optical lithography. Initially, numerical solutions of all zero 3rd order aberrations and zero 5th order spherical aberration are obtained for the spherical mirror system. Next, by the optimization method, the aspherization is carried out to the two spherical mirrors to obtain a system that has as less residual aberrations, higher NA and improved MTF as possible. We have finally obtained the system of which NA is 0.45 and the resolution is about 500 cycles/mm at the 50% MTF value criterion and the depth of focus of $1.0{\mu}m$ for the nearly incoherent illumination$({\sigma}=1.0)$ and the wavelength of 0.248 m(KrF excimer laser line).

• Korean Journal of Optics and Photonics
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• v.4 no.1
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• pp.15-21
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• 1993

This paper describes the design and development of a KrF excimer laser stepper and discusses the detailed system parameters and characterization data obtained from the performance test. We have developed a deep UV step-and-repeat system, operating at 248 nm, by retrofitting a commercial modules such as KrF excimer laser, precision wafer stage and fused silica illumination and 5X projection optics of numerical aperture 0.42. What we have developed, to the basic structure, are wafer alignment optics, reticle alignment system, autofocusing/leveling mechanisms and environment chamber. Finally, all these subsystem were integrated under the control of microprocessor-based controllers and computer. The wafer alignment system comprises the OFF-AXIS and the TTL alignment. The OFF-AXIS alignment system was realized with two kinds of optics. One is the magnification system with the image processing technique and the other is He-Ne laser diffraction type system using the alignment grating on the wafer. 'The TTL alignment system employs a dual beam inteferometric method, which takes advantages of higher diffraction efficiency compared with other TTL type alignment systems. As the results, alignment accuracy for OFF-AXIS and TTL alignment system were obtained within 0.1 $\mu\textrm{m}$/ 3 $\sigma$ for the various substrate on the wafers. The wafer focusing and leveling system is modified version of the conventional systems using position sensitive detectors (PSD). This type of detection method showed focusing and leveling accuracies of about $\pm$ 0.1 $\mu\textrm{m}$ and $\pm$ 0.5 arcsec, respectively. From the CD measurement, we obtained 0.4 $\mu\textrm{m}$ resolution features over the full field with routine use, and 0.3 $\mu\textrm{m}$ resolution was attainable under more strict conditions.