• 제목/요약/키워드: 3-Aminopropyltriethoxysilane

검색결과 53건 처리시간 0.022초

Interlamellar Silylation of Montmorillonite with 3-Aminopropyltriethoxysilane

  • Park, Kyeong-Won;Kwon, Oh-Yun
    • Bulletin of the Korean Chemical Society
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    • 제25권7호
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    • pp.965-968
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    • 2004
  • H-montmorillonite was modified by interlayer surface silylation using 3-aminopropyltriethoxysilane and dodecylamine in ethanol without a pre-swelling step. Dodecylamine acts as a gallery expander and silylation catalyst. The evaporation of ethanol from the dispersion yields well-ordered silylated montmorillonites with large basal spacing between 1.50 and 4.20 nm. Solid-state $^29Si$ CP MAS NMR of the silylated samples showed $Q^2\;and\;Q^3$ signals as well as $T^2\;and\;T^3$ signals. The increase in the relative intensity of $Q^3\;for\;Q^2$ and the appearance of $T^2\;and\;T^3$ signals was attributed to the grafting of 3-aminopropyltriethoxysilane to the interlayer surface silanol groups.

고품질 3-Aminopropyltriethoxysilane 자기조립단분자막을 이용한 고전도도 Poly(3,4-ethylenedioxythiophene) 전극박막의 개발 (Development of Highly Conductive Poly(3,4-ethylenedioxythiophene) Thin Film using High Quality 3-Aminopropyltriethoxysilane Self-Assembled Monolayer)

  • 최상일;김원대;김성수
    • 통합자연과학논문집
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    • 제4권4호
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    • pp.294-297
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    • 2011
  • Quality of PEDOT electrode thin film vapor phase-polymerized on 3-aminopropyltriethoxysilane (APS) self-assembled monolayer (SAM) is very crucial for making an ohmic contact between electrode and semiconductor layer of an organic transistor. In order to improve the quality of PEDOT film, the quality of APS-SAM laying underneath the film must be in the best condition. In this study, in order to improve the quality of APS-SAM, the monolayer was self-assembled on $SiO_2$ surface by a dip-coating method under strictly controlled relative humidity (< 18%RH). The quality of APS-SAM and PEDOT thin film were investigated with a contact angle analyzer, AFM, FE-SEM, and four-point probe. The investigation showed that a PEDOT film grown on the humidity-controlled SAM is very smooth and compact (sheet resistivity = 20.2 Ohm/sq) while a film grown under the uncontrolled condition is nearly amorphous and contains quite many pores (sheet resistivity = 200 Ohm/sq). Therefore, this study clearly proves that a highly improved quality of APSSAM can offer a highly conductive PEDOT electrode thin film on it.

Study on Poly(3,4-ethylenedioxythiophene) Thin Film Vapour Phase-Polymerized with Iron(III)Tosylate on High Quality 3-Aminopropyltriethoxysilane Self-Assembled Monolayer

  • Choi, Sangil;Kim, Wondae;Cho, Sung Jun;Kim, Sungsoo
    • 통합자연과학논문집
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    • 제5권4호
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    • pp.237-240
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    • 2012
  • In this study, PEDOT thin films polymerized with Iron(III)tosylate ($Fe(PTS)_3$) and grown on atomically smooth and highly dense 3-aminopropyltriethoxysilane self-assembled monolayer (APS-SAM) surfaces by VPP method have been investigated. PEDOT thin films were synthesized on APS self-assembled $SiO_2$ wafer surface at two different concentrations (20 wt% and 40 wt%) and growth time (3 and 30 minutes), and then their sheet resistance were measured and compared. PEDOT thin films grown with 20 wt% $Fe(PTS)_3$ oxidant are highly conductive when compared with the film grown with 40 wt% $Fe(PTS)_3$, as ascertained by the measured sheet resistance values down to 0.06 ${\Omega}/cm$. It clearly suggests that 20 wt% is more effective oxidant concentration for VPP than 40 wt% even though the film grown with 40 wt% oxidant has better quality than the film with 20 wt% $Fe(PTS)_3$ does.

Study on Poly(3,4-ethylenedioxythiophene) Thin Film Vapour Phase-Polymerized with Iron(III)Tosylate on AcOH-Catalyzed 3-Aminopropyltriethoxysilane Self-Assembled Monolayer

  • Choi, Sangil;Kim, Wondae;Kim, Sungsoo
    • 통합자연과학논문집
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    • 제5권4호
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    • pp.233-236
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    • 2012
  • In this study, PEDOT thin films polymerized with Iron(III)tosylate ($Fe(PTS)_3$) and grown on acetic acid-catalyzed 3-aminopropyltriethoxysilane self-assembled monolayer (APS-SAM) surfaces by VPP method have been investigated. PEDOT thin films were synthesized on APS self-assembled $SiO_2$ wafer surface at two different concentrations (20 wt% and 40 wt%) and growth time (3 and 30 minutes), and then they were compared. PEDOT vapour phase-polymerized with 40 wt% $Fe(PTS)_3$ oxidant completely formed a thin film on acetic acid-catalyzed APS-SAM surface while with 20 wt% $Fe(PTS)_3$ did not at all. It means that the oxidant can be uniformly coated on acetic acid-catalyzed APS-SAM surface at the 40 wt% concentration, which gives rise to the uniform growth of PEDOT thin film on it.

Clay의 Aminopropyltriethoxysilane 그라프트에 영향을 미치는 인자 (Factors Affecting the Grafting of Aminopropyltriethoxysilane in Swelling Clay Materials)

  • ;이경엽;류승훈
    • Elastomers and Composites
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    • 제41권4호
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    • pp.238-244
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    • 2006
  • Monmorillonite 클레이를 물을 분산제로 이용하여 3-aminopropyltriethoxy 실란 기능화를 실시하였다. 실란의 그라프트 여부는 FT-IR을 이용하여 정성분석하였다. 실란의 농도가 증가함에 따라 흡착/삽입 비가 감소함을 알 수 있었다. X-ray를 이용하여 평균 d-간격을 측정한 결과 초기에는 실란농도가 증가하다 다소 감소하였다. 기능화 공정온도의 영향을 살펴본 결과 온도가 증가함에 따라 화학적인 그라프트가 증가함을 알 수 있었다.

유기화제로 3-aminopropyltriethoxysilane 을 이용하여 라텍스법으로 제조된 SBR/organoclay 컴파운드의 혼련 온도에 따른 팽윤도 및 기계적 물성 (Swelling Ratio and Mechanical Properties of SBR/organoclay Nanocomposites according to the Mixing Temperature; using 3-Aminopropyltriethoxysilane as a Modifier and the Latex Method for Manufacturing)

  • 김욱수;박득주;강윤희;하기룡;김원호
    • Elastomers and Composites
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    • 제45권2호
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    • pp.112-121
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    • 2010
  • 본 연구에서는 filler-rubber interaction을 향상시키기 위하여 clay의 유기화제로 3-aminopropyltriethoxysilane(APTES)을 사용하여 styrene butadiene rubber(SBR)/organoclay nanocomposite를 라텍스법으로 제조하였다. 컴파운딩시 혼련 온도에 따라 bis(triethoxysilylpropyl)tetrasulfide(TESPT)를 첨가하여 APTES에 의해 생성된 hydroxyl group과 TESPT의 ethoxy group 사이에 실란화 반응 정도에 따른 filler-rubber interaction 향상 정도를 연구하기 위하여 X-선 회절법을 이용한 silicates의 층간구조분석, 모폴로지(morphology), 적외선분광법, 팽윤도 및 기계적물성을 평가하였다. XRD분석과 TEM이미지로 관찰한 결과 silicates 층간에 APTES가 삽입된 구조를 형성하였고 고무기질 내에 organoclay의 분산이 잘 이루어졌다는 것을 알 수 있었다. 또한, 적외선 분광법을 이용하여 APTES-MMT를 분석한 결과 APTES에 의해 silicates 표면에 다량의 hydroxyl 그룹이 형성되어 TESPT의 ethoxy group과 실란화 반응이 가능하였다. SBR/APTES-MMT 컴파운드에 TESPT를 첨가시 SBR/APTESMMT 컴파운드보다 300% 모듈러스가 약 1.3 배 정도 증가하였다. 이는 APTES의 hydroxyl group과 TESPT의 ethoxy group 사이에 실란화 반응이 이루어져 filler-rubber interaction이 향상된 결과였으며, 컴파운딩시 혼련온도 증가에 따른 모듈러스 향상 효과는 미미하였다. 결과적으로 SBR/APTES-MMT 컴파운드의 경우 고무 기질 내에 silicates의 분산 정도와 가교도 증가에 따라 모듈러스가 증가하였으며, SBR/APTES-MMT 컴파운드에 TESPT를 첨가시 filler-rubber interaction이 향상되어 모듈러스가 더욱 증가하였다.

Effect of HF and Plasma Treated Glass Surface on Vapor Phase-Polymerized Poly(3,4-ethylenedioxythiophene) Thin Film : Part I

  • Lee, Joonwoo;Kim, Sungsoo
    • 통합자연과학논문집
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    • 제6권4호
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    • pp.211-214
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    • 2013
  • In this study, in order to investigate how consecutive treatments of glass surface with HF acid and water vapor/Ar plasma affect the quality of 3-aminopropyltriethoxysilane self-assembled monolayer (APS-SAM), poly(3,4-ethylenedioxythiophene) (PEDOT) thin films were vapor phase-polymerized immediately after spin coating of FeCl3 and poly-urethane diol-mixed oxidant solution on the monolayer surfaces prepared at various treatment conditions. For the film characterization, various poweful tools were used, e.g., FE-SEM, an optical microscope, four point probe, and a contact angle analyzer. The characterization revealed that HF treatment is not desirable for the synthesis of a high quality PEDOT thin film via vapor phase polymerization method. Rather, sole treatment with plasma noticeably improved the quality of APS-SAM on glass surface. As a result, a highly dense and smooth PEDOT thin film was grown on uniform oxidant film-coated APS monolayer surface.

나노 메조포러스 흡착제를 이용한 중금속 흡착에 관한 연구 (A Study for Heavy Metals Adsorption by Nano-mesoporous Adsorbents)

  • 박상원
    • 한국환경과학회지
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    • 제16권6호
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    • pp.689-698
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    • 2007
  • Mesoporous silicas for heavy metals adsorption were prepared by co-condensation of surfactant as a template and Ludox HS-40 as a silica precursor. Various mesoporous silicas with the introduction of chelating ligands (mercaptopropyl and aminopropyl groups) were synthesized to remove heavy metal ions from aqueous solutions. The surface modification was conducted with a co-condensation process using the sequential or simultaneous addition of mesoporous silica and high concentration of the organosilane(3-mercaptopropyltrimethoxysilane and 3-aminopropyltriethoxysilane). These materials have been characterized by elemental analysis, XRD, SEM and TEM analysis. Adsorbents synthesized with 3-mercaptopropyltrimethoxysilane and 3-aminopropyltriethoxysilane shows a high loading capacity for Hg(II), Pb(II), Cd(II) and anion Cr(VI). Especially the one synthesized with a mercaptopropyl function has the highest adsorption capacity for Hg(II) and Cd(II).

아미노실란과 콜로이드 실리카를 이용한 친수성 코팅 도막의 제조 (Preparation of Hydrophilic Coating Films by using of Aminosilane and Colloidal Silica)

  • 안치용;이병화;송기창
    • Korean Chemical Engineering Research
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    • 제55권2호
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    • pp.247-252
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    • 2017
  • 실란커플링제인 아미노실란을 15~20 nm의 직경을 갖는 콜로이드 실리카와 반응시킴에 의해 친수성 코팅 용액을 제조하였다. 또한 친수성 코팅 용액을 폴리카보네이트 기재 위에 담금 코팅 시킨 후 $120^{\circ}C$에서 열경화 시킴에 의해 친수성 코팅 도막이 제조되었다. 이 과정 중 아미노실란의 종류 변화가 코팅 도막의 물성에 미치는 영향을 연구하였다. 그 결과 아미노실란으로서 3-aminopropyltriethoxysilane (APTES)을 사용하여 제조된 코팅 도막은 $25{\sim}44^{\circ}$의 접촉각과 B의 좋지 못한 연필경도를 나타내었다. 반면에 아미노실란으로서 3-aminopropyltrimethoxysilane (APTMS)을 사용하여 제조된 코팅 도막은 $26{\sim}37^{\circ}$의 접촉각과 2H의 우수한 연필경도를 나타내었다.

자가치유성을 갖는 고분자개질 방수아스팔트-몬모릴로나이트 composite 제조: 1. 3-aminopropyltriethoxysilane에 의한 몬모릴로나이트(K-10)의 실란화 특성 및 XRD 분석의 기준에 따른 최적화 (Preparation of Self-repairing Polymer-modified Waterproofing Asphalt-montmorillonite Composite: 1. Silylation Characteristics of Montmorillonite (K-10) Using 3-aminopropyltriethoxysilane and its Optimal Condition According to a Criterion by XRD Analysis)

  • 이은주;이종훈;박유진;윤용근;임광희
    • Korean Chemical Engineering Research
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    • 제55권3호
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    • pp.401-408
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    • 2017
  • 자가치유성을 갖는 고분자개질 빙수아스팔트-몬모릴로나이트(MMT) composite 제조를 위하여 양이온($Na^+$)교환 처리된 K-10 (Na-MMT-K)에 대한 3-aminopropyltriethoxysilane (APS) 개질의 특성을 규명하고 적정개질조건을 XRD 분석을 통하여 제시하였다. APS 개질된 Na-MMT-K (S-Na-MMT-K)에 대한 XRD 분석결과로서, Na-MMT-K는 K-10과 자연유래 또는 Ca-MMT에서 개질된 Na-MMT의 피크 특성들을 동시에 가지는 것이 확인되었다. 또한 S-Na-MMT-K도 동시에 두 개의 저면간격($d_{001}$) 특성들을 가짐이 관찰되었고, 그 중에서 부(001) 피크($2{\theta}=3.9{\sim}4.2^{\circ}$)와 주(001)피크($2{\theta}=8.838^{\circ}$ 근처)의 면적비(%)를 APS개질도에 대한 기준(criterion)으로 제시하였다. Na-MMT-K의 APS개질에 대한 반응전 APS 적정용해시간, 적정반응시간, 적정 APS농도 및 적정반응온도는 각각 20 min, 2~3시간, 7.5 w/v% 및 $50^{\circ}C$가 도출되었다.