• Title/Summary/Keyword: 2-layer blank

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A Study on the 2-Layered Sheet Metal Forming Analysis and Applications in Automotive Exhaust Component (2-Layer 블랭크를 적용한 자동차 배기 부품의 박판 성형 해석 및 적용)

  • Roh G. T.;Jeong W. S.;Moon M. S.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2005.10a
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    • pp.318-321
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    • 2005
  • The shell part is made of 2-layered blank because of functional requirements. To investigate the draw formability in this kind of part, the 2-layered sheet metal forming analysis process should be stipulated. First of all, treatment of contact with each blank must be considered to prevent the penetration on the each blank. Subsequently, applying the draw bead force is considered carefully because application of drawbead force for analysis is different with equivalent drawbead force. Formability as like crack, neck and wrinkles is estimated by FLD(Forming Limit Diagram) and thinning. A feasibility of the 2-layered sheet metal forming analysis process study is verified compare 2-layered sheet metal forming analysis with experimental results.

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Fabrication of High Aspect Ratio 100nm-scale Nickel Stamper Using E-beam Lithography for the Injection molding of Nano Grating Patterns (전자빔과 무반사층이 없는 크롬 마스크를 이용한 나노그레이팅 사출성형용 고종횡비 100nm 급 니켈 스템퍼의 제작)

  • Seo, Young-Ho;Choi, Doo-Sun;Lee, Joon-Hyoung;Je, Tae-Jin;Whang, Kyung-Hyun
    • Proceedings of the KSME Conference
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    • 2004.04a
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    • pp.978-982
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    • 2004
  • We present high aspect ratio 100nm-scale nickel stamper using e-beam lithography process and Cr/Qz mask for the injection molding process of nano grating patterns. Conventional photolithography blank mask (CrON/Cr/Qz) consists of quartz substrate, Cr layer of UV protection and CrON of anti-reflection layer. We have used Cr/Qz blank mask without anti-reflection layer of CrON which is non-conductive material and ebeam lithography process in order to simplify the nickel electroplating process. In nickel electroplating process, we have used Cr layer of UV protection as seed layer of nickel electroplating. Fabrication conditions of photolithography mask using e-beam lithography are optimized with respect to CrON/Cr/Qz blank mask. In this paper, we have optimized e-beam lithography process using Cr/Qz blank mask and fabricated nickel stamper using Cr seed layer. CrON/Cr/Qz blank mask and Cr/Qz blank mask require optimal e-beam dosage of $10.0{\mu}C/cm^2$ and $8.5{\mu}C/cm^2$, respectively. Finally, we have fabricated $116nm{\pm}6nm-width$ and $240nm{\pm}20nm-height$ nickel grating stamper for the injection molding pattern.

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Comparison of Mechanical Properties of Zirconia Copping by multi-layered zirconia blocks and Design locations (다층 지르코니아 블록 종류와 설계위치에 따른 지르코니아 코핑의 기계적 특성 비교)

  • Kang, Jae-Min;Kim, Won-Young;Chung, In-Sung;Jeon, Byung-Wook
    • Journal of Technologic Dentistry
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    • v.41 no.3
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    • pp.167-175
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    • 2019
  • Purpose: This study was investigated the effect of multi-layer zirconia block type and design location on the mechanical properties of zirconia copings. Methods: Three kinds of multi-layered zirconia blocks (Snow princess multi layered block, Multi cherry, Dental zirconia pre-shaded blank) were used to identify the effects of the kinds of multi-layered zirconia blocks, design locations on mechanical characteristics of zirconia copings. 150 Zirconia copings were fabricated and fracture strength, hardness and microstructure were compared and evaluated. Results: Dental zirconia pre-shaded blank(2,256.9N) had the highest fracture strength of zirconia copings on all the design locations, and it was followed by Snow princess multi layered block(2,107.5N) and Multi cherry(917.0N). Snow princess multi layered block(1,949.7Hv) had the highest hardness of zirconia copings on all the design locations, and it was followed by Dental zirconia pre-shaded blank(1,671.7Hv) and Multi cherry(1,383.7Hv). The cervical layer had the highest fracture strength and hardness of zirconia copings in all the blocks, and it was followed by the cervical+gradation layer, the enamel layer, the enamel+gradation layer, and the gradation layer. Conclusion: It was found that the fracture strength and hardness were different according to the kinds of multilayer zirconia block and design location, and it was confirmed that it is lower than the fracture strength of white zirconia.

The Study of the Printability Coated Paper by the Enzyme Treatment (효소처리한 도공지의 인쇄적성에 관한 연구)

  • Kim, Chang-Keun;Yang, Eu-Seok;Kim, Byong-Hyun
    • Journal of the Korean Graphic Arts Communication Society
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    • v.24 no.1
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    • pp.13-22
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    • 2006
  • We investigated the effects of the enzyme treatment of fiber for printability of coated paper. The results could summarized as follows, 1. The samples with enzyme treatment (average 87.8%) have higher ink gloss than the blank (85.6%). Printed density showed same trends with the ink gloss. However, the ${\beta}$-Glucosidase treated sample showed the lowest printed density (2.14 %) due to the lowest thickness of the ink layer, which is influenced by coated weight and surface smoothness. 2. The samples whose base paper was Xylanase and ${\beta}$-Glucosidase treated showed higher surface strength (4.2% and 4.0%, respectively) than the blank while the samples with the Hernicellulase and ${\beta}$-Glucuronidase treatment showed lower surface strength (3.2%and 3.7%, respectively) due to the influence of air permeability. 3. Hemicellulase and ${\beta}$-Glucuronidase treated base paper, which have relatively low air permeability, showed better ink repellence (4.3 and 4.4 %, respectively) than the blank (3.8 %). 4. The blank and the Xylanase treated base paper showed high set-off, which is the last category of printability.

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EUVL Mask Defect Isolation and Repair using Focused Ion Beam (Focused Ion Beam을 이용한 EUVL Mask Defect Isolation 및 Repair)

  • 김석구;백운규;박재근
    • Journal of the Semiconductor & Display Technology
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    • v.3 no.2
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    • pp.5-9
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    • 2004
  • Microcircuit fabrication requires precise control of impurities in tiny regions of the silicon. These regions must be interconnected to create components and VLSI circuits. The patterns to define such regions are created by lithographic processes. In order to image features smaller than 70 nm, it is necessary to employ non-optical technology (or next generation lithography: NGL). One such NGL is extreme ultra-violet lithography (EUVL). EUVL transmits the pattern on the wafer surface after reflecting ultra-violet through mask pattern. If particles exist on the blank mask, it can't transmit the accurate pattern on the wafer and decrease the reflectivity. It is important to care the blank mask. We removed the particles on the wafer using focused ion beam (FIB). During removal, FIB beam caused damage the multi layer mask and it decreased the reflectivity. The relationship between particle removal and reflectivity is examined: i) transmission electron microscope (TEM) observation after particle removal, ii) reflectivity simulation. It is found that the image mode of FIB is more effective for particle removal than spot and bar mode.

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Study on the Design of Bracket Strip Layout Using Cimatron Die Design (씨마트론 다이 디자인을 활용한 브라켓의 스트립 레이아웃설계에 관한 연구)

  • Choi, Kye-Kwang;Lee, Dong-Cheon
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.9 no.5
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    • pp.1113-1118
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    • 2008
  • Strip layout design in progressive die is an important factor that determines the applicability of mass production. In this study, the layout design of bracket strips used fer automobiles was executed. The strip layout design was made in 3D with the use of Cimatron die design, an automation module rather than a 3D modeling module. Blank layout has been optimized through a layer arrangement of the wide run positioning inside carrier (double-row and two-pass type). The 3D CAD/CAM software used was Cimatron Die Design; the strip layout design was completed in ten processes.

Fabrication of High Aspect Ratio 100nm-Scale Nickel Stamper Using E-Beam Writing based on Chrome/Quartz Mask Without Anti-Reflection Layer for Injection Molding of Optical Grating Patterns (광학 그레이팅의 사출성형제작을 위한 전자빔과 무반사 코팅층이 없는 크롬/퀄츠 마스크를 이용한 고종횡비 100nm 급 니켈 스탬퍼의 제작)

  • Seo, Young-Ho;Choi, Doo-Sun;Lee, Joon-Hyoung;Je, Tae-Jin;Whang, Kyung-Hyun
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.28 no.11
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    • pp.1794-1798
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    • 2004
  • We present a fabrication method of high aspect ratio 100nm-scale nickel stamper using e-beam writing for the injection molding of optical grating patterns. Conventional nickel stamper is fabricated by nickel electroplating process which is followed by seed layer deposition. In this paper, we have used chrome coated blank mask without anti-reflection layer of CrON in order to simplified electroplating process. In experimental study, we have optimized electron-beam dosage for 100nm-scale optical grating patterns with 2.5-aspect ratio, and fabricated nickel stamper using above grating patterns as PR mold. Fabricated nickel stamper have showed height of 240$\pm$20nm and width of 116$\pm$6nm.

A Study on Laser Weldability of Al-Si Coated 22MnB5 Steel for TWB Hot Stamping (Al-Si 도금된 22MnB5강의 핫스탬핑 TWB 적용을 위한 레이저용접성 고찰)

  • Kim, Yong;Park, Ki-Young;Lee, Bo-Young
    • Journal of Welding and Joining
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    • v.31 no.2
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    • pp.30-36
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    • 2013
  • Recently the use of ultra high strength steels(UHSS) in structural and safety component is rapidly increasing in the automotive industry. Furthermore, it commonly use in tailor welded blank laser welding process before hot stamping to reduce lightweight vehicle. However TWB process is to be a problem about welded strength after hot stamping because it's welded before heat treatment. Therefore, in this study, laser welds of TWB after heat treatment were analyzed for changes in the characteristics, especially the impact on the oxidation and decarburization in order to prevent pre-coated Al-Si layer welds on the properties for intensive investigation. As a result, the degradation of the TWB weldments changes in the heat treatment conditions alone, without any pre-treatment of the coating layer has confirmed that there is a limitation on the improvement. Furthermore Al-Si elements are overall distributed on the weldment and it specially concentrated along the fusion line. Hardness value of Al-Si segregation area is less than 350Hv and tensile strength showed just 78~83% compared with substrate. Accordingly, we proved that both side Al-Si coating should be removed in order to ensure the strength of the substrate.

Fluorophotometric Determination of Basic Drugs with Lumogallion, Superchrome Garnet Y and Their Alkyl Derivatives (루모갈리온, 슈퍼크롬 가넷 와이 및 그 알킬 유도체에 의한 염기성 의약품의 형광정량)

  • 송만영;김동오;이은엽;안문규
    • YAKHAK HOEJI
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    • v.37 no.3
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    • pp.209-215
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    • 1993
  • Basic drugs could be extracted as ion-paired complexes with Lumogallion, Superchrome Garnet Y and their alkyl derivatives from aqueous acid solution, and then determined fluoro-metrically after addition of aluminum ion. The analysis was carried out as follows; To a 1 ml portion of basic drugs (10$^{-9}$~2$\times$0$^{-8}$mole/ml), 1ml of 0.01w/v% fluorescent reagent solution, and 10ml of dichloroethane are added. The mixture is stirred for 1 minute. After standing for a few minutes, the dichloroethane layer is transfered to 1 ml of 0.1w/v% Al(NO$_{3}$)$_{3}$ ethanol solution. After mixing, and standing for 30 minutes at room temperature, the fluorescence intensity is measured with each maximum excitation and emission wavelength. The reagent blank is run through the whole procedure. From the degree of enhancement of fluorescence intensity, hexyl and dodecyl lumogallion and Superchrome Garnet Y were judged to be the useful one of fluorescent reagent for basic drugs analysis.

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Ultra-Structures And $^{14}C$-Mannitol Transport Study of Human Nasal Epithelial Cells Using ALI Culture Technique (ALI 배양법 이용한 비강 점막 상피세포의 미세구조와 $^{14}C$-mannitol 투과도)

  • Kwak, Kyung-Rok;Hwang, Jee-Yoon;Lee, Ji-Seok;Park, Hye-Kyung;Kim, Yun-Seong;Lee, Min-Ki;Park, Soon-Kew;Kim, Yoo-Sun;Roh, Hwan-Jung
    • Tuberculosis and Respiratory Diseases
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    • v.50 no.2
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    • pp.205-212
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    • 2001
  • Background : The information on nasal transport and the metabolism of peptides have been obtained from pharmacokinetic investigations in experimental animals. However, there are no transport and metabolic studies of human nasal epithelial cells. In this study, the permeability characteristics and the metabolic properties of in vitro human nasal cell monolayers were investigated. Material and Methods : Normal human inferior nasal conchal tissue samples were obtained from patients undergoing endoscopic nasal cavitary surgery. The specimens were cultured in a transwell using an air-liquid Interface (ALI) culture, and the transepithelial electrical resistance (TEER) value of the blank filter and confluent cell monolayers were measured. To determine the % leakage of mannitol, $4{\mu}mol%$ $^{14}C$-labelled mannitol was added and the % leakage was measured every 10 minute for 1 hour. Result : Human nasal epithelial cells in the primary culture grew to a confluent monolayer within 7 days and expressed microvilli. The tight junction between the cells was confirmed by transmission electron microscopy. The TEER value of the blank filter, fifth day and seventh day reached $108.5\;ohm.cm^2$, $141\;ohm.cm^2$ and $177.5\;ohm.cm^2$, respectively. Transcellular % leakage of the $^{14}$-mannitol at 10, 20, 30, 40, 50 and 60 minutes was $35.67{\pm}5.43$, $34.42{\pm}5.60$, $32.75{\pm}5.71$, $31.76{\pm}4.22$, $30.96{\pm}3.49$ and $29.60{\pm}3.68\;%$, respectively. Conclusion : The human nasal epithelial monolayer using ALI culture techniques is suitable for a transcellular permeability study. The data suggests that human nasal epithelial cells In an ALI culture technique shows some promise for a nasal transport and metabolism study.

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