• Title/Summary/Keyword: 한창진

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기획특집 - 전기에너지산업 현장(現場)을 가다 -시화호조력발전소

  • 대한전기협회
    • JOURNAL OF ELECTRICAL WORLD
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    • s.414
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    • pp.90-93
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    • 2011
  • 세계 최대 시설용량이며, 국내최초인 조력발전소의 마무리공정이 한창 진행되고 있는 대역사의 현장을 지난 17일 오후 2시에 찾았다. 짭쪼름한 바닷내음이 점차 진해진다 싶을 때 시야에 들어온 '청정 무공해 전력생산기지' 시화조력발전소. 발전소는 경기도 안산시 오이도와 대부도 사이를 잇는 길이 11.2Km 시화방조제 중간(작은 가리섬)에 위치한 가운데 본격가동의 카운트다운을 준비하고 있다. 지난 4월 10호기를 시작으로 6개월간에 걸친 각종 설비기능시험 등을 거쳐 오는 11월 상업운전을 통해 본격적인 전기 생산에 돌입할 예정인 시화조력발전소의 건설 의미와 주요시설 및 설비구성, 그리고 준공에 따른 기대효과 등을 조망해 본다.

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Tension Control in Web Transport System using Direct Self-tuning Regulator (직접 STR을 이용한 웹 이송 시스템에서의 장력제어)

  • 오기석;권태종;한창수;강남기;조형진
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 1996.11a
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    • pp.236-242
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    • 1996
  • The purpose of this paper is to study the tension control in a web transport system. Direct self-tuning regulator method was applied to tension controller and variable-gain PID control algorithm was applied to web speed controller. The designed controllers compensated for the time-varying parameters and tracked reference tension in process speed changing. The simulation shows that direct STR tension controller improves tension control performance in comparison with other controllers.

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A Study on Variation of the Sidewall Angle of a Thick Photoresist on the Wavelength and the Proximity gap (노광파장과 근접거리에 따른 두꺼운 감광막의 측면기울기 변화에 관한 연구)

  • 한창호;김학;김현철;전국진
    • Journal of the Semiconductor & Display Technology
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    • v.3 no.1
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    • pp.27-30
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    • 2004
  • In this work, the variation of the sidewall profile of a thick photoresist on the wavelength and proximity gap was investigated. PMER P-LA900PM, DNQ (DiazoNaphthoQuinone) novolac type photoresist, is used for experiments. The calculated results agreed well with the experimental results.

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두꺼운 감광막의 노광 파장에 따른 측면 기울기에 관한 연구

  • 한창호;김학;전국진
    • Proceedings of the Korean Society Of Semiconductor Equipment Technology
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    • 2003.12a
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    • pp.82-85
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    • 2003
  • MEMS(Micro Electro Mechanical Systems) 응용 분야에 있어서 RF나 Optic등에 응용되는 금속 구조물이나 배선을 위한 도금, 두꺼운 구조물의 식각등을 위해서 수십 um두께의 감광막이 필요하다. 특히 이러한 감광막은 도금을 위한 전단계에서 몰드 형성에 이용되는데 그 이유는 제작이 용이할 뿐만 아니라 다양한 두께 형성이 가능하고 금속과의 선택적 제거가 쉬운 장점이 있다. 감광막 몰드가 갖추어야 할 조건으로는 수직에 가까운 측면 기울기, 두께, 도금액에 대찬 저항성을 들 수 있으며 그 중에서 측면 기울기 개선에 관한 연구가 많이 진행되고 있다. 본 논문에서는 감광막의 형상에 영향을 주는 요인을 찾아내고 수식모델링을 통해 측면 기울기를 예측하고자 한다.

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A Simulator for High Energy E-beam Lithography for Nano-Patterning (나노패터닝을 위한 고에너지 전자빔 리소그래피 시뮬레이터 개발 및 검증)

  • Kim Jinkwang;Kim Hak;Han Chanho;Chun Kukjin
    • Proceedings of the IEEK Conference
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    • 2004.06b
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    • pp.359-362
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    • 2004
  • Electron beam on high energy acceleration, which travels deeply and sharply through photoresist, became to be used in e-beam lithography apparatus for nano-patterning in due to its high resolution. An advanced electron beam lithography simulation tool is currently undergoing development for nano-patterning. This paper will demonstrate such simulation efforts with experiments at 200 keV e-beam lithography processes on PMMA, ZEP520 of which photoresist parameters and characteristics will be explained with simulation results. Neureuther parameters was extracted from the contrast curve of the resist

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Wafer level vertical interconnection method for microcolumn array (마이크로컬럼 어레이에 적용 가능한 웨이퍼단위의 수직 배선 방법)

  • Han, Chang-Ho;Kim, Hyeon-Cheol;Kang, Moon-Koo;Chun, Kuk-Jin
    • Proceedings of the IEEK Conference
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    • 2005.11a
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    • pp.793-796
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    • 2005
  • In this paper, we propose a method which can improve uniformity of a miniaturized electron beam array for inspection of very small pattern with high speed using vertical interconnection. This method enables the individual control of columns so that it can reduce the deviation of beam current, beam size, scan range and so on. The test device that used vertical interconnection method was fabricated by multiple wafer bonding and metal reflow. Two silicon and one glass wafers were bonded and metal interconnection by melting of electroplated AuSn was performed. The contact resistance was under $10{\Omega}$.

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A Path Tracking Control Algorithm for Autonomous Vehicles (자율 주행차량의 경로추종 제어 알고리즘)

  • 안정우;박동진;권태종;한창수
    • Journal of the Korean Society for Precision Engineering
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    • v.17 no.4
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    • pp.121-128
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    • 2000
  • In this paper, the control algorithm fur an autonomous vehicle is studied and applied to an actual 2 wheel-driven vehicle system. In order to control a nonholonomic system, the kinematic model for an autonomous vehicle is constructed by relative velocity relationship about the virtual point at distance from the vehicle's frame. And the optimal controller that based on the kinematic model is operated on purpose to track a reference vehicle's path. The actual system is designed with named 'HYAVI' and the system controller is applied. Because all the results of simulation don't satisfy the driving conditions of HYAVI, a reformed control algorithm that satisfies an actual autonomous vehicle is applied at HYAVI. At the results of actual experiments, the path tracking works very well by the reformed control algorithm. An autonomous vehicle that applied this control algorithm can be easily used for a path generation algorithm.

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