• Journal of the Korean Applied Science and Technology
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• v.34 no.4
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• pp.1017-1024
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• 2017

Carbon thin films were deposited by HiPIMS(High Power Impulse Magnetron Sputtering). The properties and microstructures of carbon thin film were investigated with power, pressure, bias voltage and duty cycle. As the HiPIMS power increased, the deposition thickness increased and the surface tended to be rough. The increase in pressure also tended to make the surface rough, but the deposition thickness was not proportional to the pressure. As the bias voltage increased, the surface roughness became worse, the deposition thickness increased and then decreased from the critical bias voltage. Changes in the duty cycle have caused problems such as arcing, which is affected by the chamber structure and the size of the target. The $sp^2/sp^3$ fractions of thin films were estimated by XPS and it was confirmed that the fraction of thin films made by HiPIMS were larger than the fraction of thin films made by DC sputtering.