The R-V Characteristics of $SiO_2 $ & $SiO_2/TiN$ Thin Film Fabricated by RF Sputtering
(RF Sputtering으로 제작한 $SiO_2 $ 및 $SiO_2/TiN$ 박막의 R-V 특성)
-
- Journal of the Korean Institute of Electrical and Electronic Material Engineers
- /
- v.11 no.10
- /
- pp.826-832
- /
- 1998