• Title/Summary/Keyword: 표준 시편

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Ellipsometry 에서의 calibration 및 입사면 고정형 ellipsometer

  • 경재선;방경윤;최은호;손영수;안일신;오혜근
    • Proceedings of the Korean Society Of Semiconductor Equipment Technology
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    • 2003.12a
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    • pp.18-22
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    • 2003
  • 일반사용자들은 ellipsometer를 사용이 어려운 장비로 인식하고 있다. 본 연구는 초보자들이 손쉽게 사용할 수 있는 ellipsometer를 제작하는데 목적이 있다. 시편을 측정하기 전에 반드시 해야 할 과정인 alignment와 calibration을 하지 않고 측정할 수 있도록 제작하였다. 기본 구조는 rotating compensator spectroscopic ellipsometry를 이용하였으며 , 입사각을 70도로 고정시키고 기존의 sample holder 구조를 바꾸어 어떠한 시편을 놓아도 입사면이 변하지 알게 하여 calibration 이 요구되지 않는 ellipsometer를 개발하였다. 장비의 성능과 정밀도를 검사하기 위하여 여러 가지 표준시료를 측정하여 일반 RCSE와 측정결과를 비교하였다. 또한 고정된 입사면의 calibration값의 신뢰도를 검사하기 위하여 반복적으로 측정할 때마다 시편을 재배치하여 실험하였다.

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The Characteristics of Electric Resistivity on the Ceramic Oxide, $Nd_{2-x}Ce_xCuO_4$ (세라믹 초전도체, $Nd_{2-x}Ce_xCuO_4$의 전기적 저항 특성)

  • Kim, Jeong-Sik
    • Korean Journal of Materials Research
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    • v.6 no.2
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    • pp.133-137
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    • 1996
  • 본연구에서는 n-type 세라믹 초전도체인 Nd2-xCexCuO4상의 산소함량에 따른 \ulcorner기적저항의 변화를 고찰하고자 하였다. 일반적인 소결과 어닐링과정을 결쳐 제조된 Nd1.85Ce0.15CuO4-x 시편을 여러 온도와 산소분압의 분위기하에서 어닐링시킴으로써 산소의 함유량이 다른 시편들을 준비하였고 각각의 시편의 산소함량은 TGA(Thermogravimetric Analysis0에 의해 측정하였다. Nd1.85Ce0.15CuO4-x시편의 전기적 저항 측정은 표준 4-탐침방법을 이용하여 액체헬륨을 주입시켜 상온으로부터 4K까지 측정하였다. Nd1.85Ce0.15CuO4-x시편의 산소함량, 3.96$\leq$4-x$\leq$4.0의 범위에서 전기적저항을 측정한 결과 초전도특성이 나타나기 시작한 임계산소함량은 4-x=3.990이었고 이때의 임계온도 Tc=12K이었다. 또한 임계온도, Tc는 산소함량 4-x=3.96에서 24K로 측정되었다. 특이할 만한 현상은 CuO/Cu2O 열역학적 상전이가 일어나는 조건이 Nd1.85Ce0.15CuO4-x 시편의 초전도가 일어나는 임계와 일치하였다. 즉, Cu2O가 안정한 영역에서는 초전도특성이 나타났고 CuO가 안정한 영역에서는 초전도특성이 나타나지 않았다.

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A Study on Manufacturing Method of Standard Void Specimens for Non-destructive Testing in RFI Process and Effect of Void on Mechanical Properties (RFI 공정 부품 비파괴검사용 표준 기공률 시편 제조 방법 및 기공률에 따른 기계적 물성 영향에 대한 연구)

  • Han, Seong-Hyeon;Lee, Jung-Wan;Kim, Jung-Soo;Kim, Young-Min;Kim, Wee-Dae;Um, Moon-Kwang
    • Composites Research
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    • v.32 no.6
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    • pp.395-402
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    • 2019
  • The RFI process is an OoA process that fiber mats and resin films are laminated and cured in a vacuum bag. In case that resin film is insufficient to fill empty space in fibers, it makes void defect in composites and this void decrease mechanical properties of the composites. For this reason, non-destructive testing is usually used to evaluate void of manufactured composites. So, in this study, a manufacturing method of standard void specimens, which are able to be used as references in non-destructive testing, was proposed by controlling resin film thickness in the RFI process. Also, a fiber compaction test was proposed as a method to set the resin film thicknesses depending on target voids of manufacturing panels. The target void panels of 0%, 2%, and 4% were made by the proposed methods, and signal attenuation depending on void was measured by non-destructive testing and image analysis. In addition, voids of specimens for tensile, in-plane, short beam and compressive tests were estimated by signal attenuation, and mechanical properties were evaluated depending on the voids.

Certification of magnification standards for the establishment of meter-traceability in microscopy (현미경의 길이표준 소급성 확립을 위한 배율 교정 시편 인증)

  • Kim J.A.;Kim J.W.;Park B.C.;Eom T.B.;Kang C.S.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.06a
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    • pp.645-648
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    • 2005
  • Microscopy has enabled the development of many advanced technologies, and higher level microscopic techniques are required according to the increase of research in nano-technology and bio-technology fields. Therefore, in many applications, we need to measure the dimension of micro-scale parts accurately, not just to observe their shapes. To establish the meter-traceability in microscopy, gratings have been widely used as a magnification standard. KRISS provides the certification service of magnification standards using an optical diffractometer and a metrological AFM (MAFM). They are based on different measurement principles, and so can give complementary information for each other. In this paper, we describe the configuration of each system and measurement procedures to certificate grating pitch values of magnification standards. Several measurement results are presented, and the discussion about them are also given. Using the optical diffractometer, we can calibrate a grating specimen with uncertainty of less than 50 pm. The MAFM can measure a grating specimen of down to 100 nm pitch value, and the calibrated values usually have uncertainty less than 500 pm.

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XRR용 두께 표준물질 제작을 위한 박막성장 및 특성평가

  • Yu, Byeong-Yun;Bin, Seok-Min;Kim, Chang-Su;O, Byeong-Seong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.141-141
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    • 2012
  • X-선 반사율 측정법(XRR)은 비파괴적인 측정방법과 수 nm의 두께를 정밀하게 측정할 수 있는 장점으로 인하여 반도체 산업현장에서 많은 관심과 연구가 이루어지고 있다. 이러한 XRR은 두께 분석 측정의 정밀도를 향상시키고 부정확한 결과를 방지하기 위하여 측정기기를 검증하고 보정할 수 있는 두께 표준물질을 필요로 하고 있다. 본 연구에서는 XRR용 두께 표준물질을 이온빔 스퍼터링 증착방법을 이용하여 제작하였다. 두께 표준물질 제작에 있어 공기 중 노출에 의해 산화가 되지 않는 산화물 박막과 산화물 기판을 선택하였다. 후보물질은 glass, sapphire, quartz, SiO2기판과 HfO2, Ta2O5, Cr2O3 산화물 타켓을 이용하여 박막을 제작하였다. 제작된 후 보물질은 교정된 XRR을 통하여 박막의 두께, 계면 및 표면 거칠기, 밀도등 박막의 구조특성분석을 하였다. Glass, quartz의 경우 기판 표면 거칠기가 좋지 않아 제작된 샘플의 X-선 반사율 곡선이 급격히 떨어지면서 측정되는 각도의 영역이 작아졌다. Sapphire로 제작한 시편은 측정된 데이터와 simulation의 curve fitting이 양호하지 않았다. 이 중 SiO2기판을 사용하고 HfO2박막을 증착한 샘플이 다른 후보물질보다 XRR curve fitting 결과가 가장 양호하여 두께 표준물질로 응용하기에 적절하였다. 그리고 AFM (Atomic Force MicroScope)을 이용하여 기판의 거칠기 및 증착한 박막표면 거칠기 측정을 하였고, TEM (Transmission Electron Microscope)으로 두께 측정을 하여 XRR로 얻은 데이터와 비교하였다. 이러한 결과를 토대로 XRR용 두께 표준물질 제작할 수 있었고, 추후 불확도 평가 및 비교실험을 통하여 제작된 XRR용 두께 표준물질을 이용할 수 있을 것으로 기대된다.

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Investigation of the Color Change and Physical Properties of Heat-treated Pinus koraiensis Square Lumbers (열처리 잣나무 정각재의 재색 변화 및 물성 조사)

  • Lim, Ho-Mook;Hong, Seung-Hyun;Kang, Ho-Yang
    • Journal of the Korean Wood Science and Technology
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    • v.42 no.1
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    • pp.13-19
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    • 2014
  • Three heat-treatment schedules were applied to $90{\times}90mm$ dimension square lumber of Pinus koraiensis, one of major domestic species, and their colors and physical properties were investigated for obtaining an optimum schedule. Each square lumber was heat-treated three times. The temperatures of $170^{\circ}C$ and $190^{\circ}C$, and the time of 9 hours and 13 hours were used for the first heat-treatment. The schedule of $190^{\circ}C$ and 7 hours were used for the next two heat-treatments. The averages of brightness $L^*$ decreased linearly as the heat-treatment repeated and its standard deviations also decreased slightly. While the averages of color difference ${\Delta}E^*$ increased linearly as the heat-treatment repeated and its standard deviations also increased slightly. The average compressive strength of the heat-treated specimen was higher than that of the control by 9%, which deviates from previous reports. ASE and WPG of the heat-treated specimens were measured to confirm that heat-treatment improved dimensional stability significantly.

Measurement of Grating Pitch Standards using Optical Diffractometry and Uncertainty Analysis (광 회절계를 이용한 격자 피치 표준 시편의 측정 및 불확도 해석)

  • Kim Jong-Ahn;Kim Jae-Wan;Park Byong-Chon;Kang Chu-Shik;Eom Tae-Bong
    • Journal of the Korean Society for Precision Engineering
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    • v.23 no.8 s.185
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    • pp.72-79
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    • 2006
  • We measured grating pitch standards using optical diffractometry and analyzed measurement uncertainty. Grating pitch standards have been used widely as a magnification standard for a scanning electron microscope (SEM) and a scanning probe microscope (SPM). Thus, to establish the meter-traceability in nano-metrology using SPM and SEM, it is important to certify grating pitch standards accurately. The optical diffractometer consists of two laser sources, argon ion laser (488 nm) and He-Cd laser (325 nm), optics to make an incident beam, a precision rotary table and a quadrant photo-diode to detect the position of diffraction beam. The precision rotary table incorporates a calibrated angle encoder, enabling the precise and accurate measurement of diffraction angle. Applying the measured diffraction angle to the grating equation, the mean pitch of grating specimen can be obtained very accurately. The pitch and orthogonality of two-dimensional grating pitch standards were measured, and the measurement uncertainty was analyzed according to the Guide to the Expression of Uncertainty in Measurement. The expanded uncertainties (k = 2) in pitch measurement were less than 0.015 nm and 0.03 nm for the specimen with the nominal pitch of 300 nm and 1000 nm. In the case of orthogonality measurement, the expanded uncertainties were less than $0.006^{\circ}$. In the pitch measurement, the main uncertainty source was the variation of measured pitch values according to the diffraction order. The measurement results show that the optical diffractometry can be used as an effective calibration tool for grating pitch standards.

X-Ray Fluorescence Analysis by Stearic Acid-Extraction Technique (스테아르산 추출법에 의한 X-선 형광분석)

  • Tae Sub O;Man Ho Lee;Young Kyu Park
    • Journal of the Korean Chemical Society
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    • v.28 no.1
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    • pp.41-46
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    • 1984
  • To preconcentrate trace elements, microgram amounts of 5 heavy metals (Cu, Co, Ni, Zn and Cd) were precipitated with 8-hydroxyquinoline (oxine) and metal oxinates were extracted with stearic acid. And then each of the molten stearic acid extract with stearic acid. And then each of the molten stearic acid extract was poured into a glass ring and cooled for specimen preparation. The obtained specimens were analyzed by X-ray fluorescene spectrometry. And then conditions of precipitation formation and extraction, reproducibility, sensitivity and detection limit were observed. The relative standard deviation of specimen preparation was 1.0~5.7% and the detection limit was 5~$50{\mu}g$/100ml. The proposed preconcentration procedure exhibited a considerable inhancement and simplicity in preparing specimens.

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A study on the electromigration phenomena in Al-1%Si thin film interconnections with Ti underlayers (Ti underlayer를 갖는 AI-1%Si 박막배선에서의 일렉트로마이그레이션 현상에 관한 연구)

  • 유희영;김진영
    • Journal of the Korean Vacuum Society
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    • v.8 no.1
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    • pp.31-35
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    • 1999
  • In this paper, the lifetime dependence as a function of the line length of Al-1%Si thin film interconnections due to electromigration in semiconductor devices was studied. Al-1%Si thin film interconnections with a pattern of straight type were formed by using a standard photolithography process. The test patterns manufactured have line lengths in the range of 100 to 1600 $mu extrm{m}$. Al-1%Si thin film interconnections with Ti underlayers showed longer lifetime than those without Ti underlayers. Ti underlayers are believed to improve electromigration resistance resulting in a longer lifetime in Al-1%Si thin film interconnections. The dependence of lifetime on the line length in Al-1%Si/Ti thin film interconnections shows a saturation tendency near 800 $\mu\textrm{m}$ line length.

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A Study on the Coolingability of Several Quenchants(I) - Coolingability of Selected Aqueous Solution- (각종 담금제의 냉각성능에 관한 연구 I -물을 주성분으로 한 담금제의 냉각성능 평가-)

  • 민수홍;구본권;김상열
    • Transactions of the Korean Society of Mechanical Engineers
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    • v.13 no.3
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    • pp.411-418
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    • 1989
  • Quenching effect depends upon coolingability of quenchant as well as the composition of steel. Study on the coolingability of quenchants is important in cooling process and heat treatment of steel. Experimental apparatus and measuring method follow Korean Industrial Standard. Distilled water, different concentration of NaCl, NaOH and Na$_{2}$CO$_{3}$ solutions were compared. Also the effect of temperature of distilled water were calculated. Experimental results were examined with F.E.M. analysis.