• Journal of the Korean Vacuum Society
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• v.16 no.1
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• pp.74-78
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• 2007

Much interests has been drawn for noble micro-engineering processes for the continuous size reduction on bulk materials from the field of micro-electronics with much downsized IC chips. A traditional microprocessing based on mechanical blade as well as a relatively long pulsed laser usually influence the physico-chemical properties of intact materials when the techniques are applied to process materials with a spatial resolution less than 10 microns. Meanwhile, ultrafast laser pulses are known to exhibit a very small heat-affect zone(HAE) compared to the traditional laser processing and to be applicable for the new functional materials with high performance in optical and electrical properties. In this report, we will review in brief the recent research works on the enhancement of micro-cutting speed of thin silicon wafer as well as the formation of Ge nanostructures based on ultrafast laser pulses.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.22 no.10
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• pp.927-933
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• 2011

This paper presents an optical sampling technique which can be used to overcome the limited bandwidth of a commercial electronic sampling oscilloscope for pulsed signal measurement. Employing an ultrafast laser with 0.1 ps pulse duration, 20 GHz electromagnetic pulses were generated through a fast photodiode. These pulses were transmitted through a microstrip line and sampled with an optically triggered electro-optic system. Two sampled 20 GHz pulses - measured independently over the transmission line with a non-contacting electro-optic method and conventional electronic one through a coaxial cable - were compared.

• Journal of the Korean Society for Precision Engineering
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• v.33 no.4
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• pp.265-270
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• 2016

Recently, many studies have been conducted on the nano-scale fabrication technology using twophoton- absorbed polymerization induced by a femtosecond laser. The nano-stereolithography process has many advantages as a technique for direct fabrication of true three-dimensional shapes in the range over several microns with sub-100 nm resolution, which might be difficult to obtain by using general nano/microscale fabrication technologies. Therefore, two-photon induced nano-stereolithography has been recently recognized as a promising candidate technology to fabricate arbitrary 3D structures with sub-100 nm resolution. Many research works for fabricating novel 3D nano/micro devices using the two-photon nano-stereolithography process, which can be utilized in the NT/BT/IT fields, are rapidly advancing.