• Title/Summary/Keyword: 탈기

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Demonstration Study on Ammonia Stripping in Electronic Industry Wastewater with High Concentrations of Ammonia Nitrogen (고농도 암모니아를 함유한 전자 폐수의 암모니아 탈기 실증 연구)

  • Jae Hyun Son;Younghee Kim
    • Clean Technology
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    • v.29 no.4
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    • pp.297-304
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    • 2023
  • The rapid advancement of the high-tech electronics industry has led to a significant increase in high-concentration ammonia wastewater. Various methods have been attempted to reliably treat wastewater containing high concentrations of ammonia, but no successful technology has yet been developed and applied. In this study, the removal efficiency and characteristics of ammonia nitrogen was evaluated according to changes in temperature, air loading rate, and liquid loading rate using a closed circulation countercurrent packed tower type demonstration facility for wastewater containing high concentrations of ammonia generated in the high-tech electronics industry. The temperature was varied while maintaining operating conditions of a wastewater flowrate of 20.8 m3 h-1 and an air flow rate of 18,000 Nm3 h-1. The results showed that at temperatures of 45,50,55, and 60℃, the removal efficiencies of ammonia nitrogen (NH3-N) were 87.5%, 93.4%, 96.8%, and 98.7%, respectively. It was observed that temperature had the most significant impact on the removal efficiency of NH3-N under these conditions. As the air loading rate increases, the removal rate also increases, but the increase in removal efficiency is not significant because droplets from the absorption tower flow into the stripping tower. Even if the liquid loading rate was changed by ±30%, the removal rate did not change significantly. This does not mean that the removal rate was unaffected, but was believed to be due to the relatively high air load rate. Through demonstration research, it was confirmed that ammonia stripping is a reliable technology that can stably treat high-concentration ammonia wastewater generated in the high-tech electronics industry.

업계동정

  • Korea Electrical Manufacturers Association
    • NEWSLETTER 전기공업
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    • no.99-24 s.241
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    • pp.25-38
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    • 1999
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Air stripping of odor causing materials from eutrophic lake water (부영양호 원수의 냄새유발 물질 탈기 특성)

  • Park, Noh-Back;Song, Yong-Hyo;Na, Gywang-Joo;Park, Sang-Min;Jun, Hang-Bae
    • Journal of Korean Society of Water and Wastewater
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    • v.22 no.5
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    • pp.523-529
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    • 2008
  • Algal blooms in a local eutrophic lake often produces the musty and earthy taste & odor problems. Since the odor causing compounds(OCCs) including geosmin and 2-MIB have their own volatility, the OCCs can be removed from water by air stripping methods. Removal of TON(threshold odor number) as an index for OCCs could be fitted well with the first order equations($R^2=0.9$ above), where the air stripping coefficient of TON, k was in the range between 0.0055 and 0.0097 according to the aeration time. k within 30min aeration tests was 0.0097, while it was 0.0055 where the aeration time extended to 150min. With 15 mg/L of PAC, removal of TON was not simulated with 1st order equation within 30min aeration. Within 30min aeration, OCCs rather than geosmin and/or 2-MIB could be removed easily by air stripping or PAC adsorption, while OCCs such as geosmin and/or 2-MIB could be removed slowly by air stripping after 30min aeration. Geosmin and 2-MIB were not readily removed by air stripping(k of them were 0.0018~0.0047 and 0.0018~0.0034, respectively at different air flow rates). Geosmin could be removed by air stripping a little better than 2-MIB.

A study on the RE/DC discharge cleaning for high vacuum SUS chamber (RF/DC 방전을 이용한 고 진공용SUS 용기세정에 관한 연구)

  • 김정형;임종연;서인용;정광화
    • Journal of the Korean Vacuum Society
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    • v.10 no.3
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    • pp.298-302
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    • 2001
  • Cleaning effect of RF/DC discharge to clean the surface of vacuum chamber was studied for various discharge conditions. Glow discharge cleaning without baking reduced the outgassing rate to 1/2, which was similar to that after the only baking treatment alone. Glow discharge cleaning treatment with baking improved the cleaning efficiency and then the outgassing rate was remarkably reduced to 1/20. It was found that the ion energy and the ion density were important factors in cleaning the surface. RF discharge cleaning was more effective than BC discharge cleaning.

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