• Title/Summary/Keyword: 친수표면

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Sonochemical Grafting of Poly(vinyl alcohol) onto Multiwall Carbon Nanotubes in Water (초음파를 이용한 PVA에 의한 다중벽 탄소나노튜브의 수상 그래프팅)

  • Kim, Yeongseon;Baeck, Sung Hyeon;Shim, Sang Eun
    • Polymer(Korea)
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    • v.38 no.3
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    • pp.378-385
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    • 2014
  • Multiwall carbon nanotubes (MWCNTs) were modified with a water soluble polymer, poly(vinyl alcohol), PVA, using a simple ultrasonic wave in water. Under the irradiation of ultrasound, PVA chains were severed as macroradicals and instantly grafted onto the surface of MWCNTs due to the radical scavenging effect of MWCNTs. To control the grafting PVA onto MWCNTs, the ultrasonication power and irradiation time were changed from 300 to 500 W and from 10 to 50 min, respectively. The grafted PVA onto MWCNTs was confirmed by FTIR, TGA, SEM, and TEM. Dispersion stability of the modified MWCNTs was monitored by Turbiscan. The amount of grafted PVA on MWCNTs increased with the increase in the sonication power and irradiation time. The grafted PVA on MWCNTs induced the improved dispersion stability of the modified MWCNTs in water. These findings exhibit that ultrasound can be readily used for the grafting polymer chains on MWCNTs.

A Study on the Wettability by Surfactant of Hydrophobic-Hydrophilic Powders (Hydrophobic-Hydrophilic 분체의 계면활성제에 의한 Wettability 연구)

  • Rho, Seung-Baik;Lim, Mi Ae
    • Applied Chemistry for Engineering
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    • v.9 no.2
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    • pp.177-184
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    • 1998
  • The contact angle on powder hydrophobic polymer PMMA(polymethylmethacrylate), PVC(poly vinyl chloride) and hydrophilic metal aluminium was measured by wicking method on the base of Washburn equation for water, glycerol, formamide, diiodomethane, 1,1,2,2-tetrabromoethane, 1-bromonaphthalene, acetone, chloroform, benzene, ethanol, methanol, and for anionic surfactant SDS(sodium dodecyl sulfate) and cationic surfactant CATB(cetyl trimethylamonium bromide) aqueous solution with concentrations. The values of ${\gamma}_c$ estimated by Zisman plot and adhesion tension plot for contact angle with organic liquids, SDS, and CTAB aqueous solutions were 43.5, 28.3, and $36.2mNm^{-1}$ for PMMA and 44.2, 25.0, and $34.8mNm^{-1}$ for PVC, respectively. From the results, it was considered that wettability and characteristics of solid surface were transformed by adding surfactant. The surface free energy, ${\gamma}_s$ and its components of PMMA, PVC, and aluminium were determined using harmonic equation.

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BCP/PCL scaffold의 표면개질을 위한 실리콘, 카르복실기, fibronectin 코팅 및 생체적합성에 관한 연구

  • Gwak, Gyeong-A;Kim, Yeong-Hui;Kim, Min-Seong;Park, Min-Ju;Jyoti, Anirban;Byeon, In-Seon;Lee, Byeong-Taek;Song, Ho-Yeon
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2010.05a
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    • pp.43.1-43.1
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    • 2010
  • 조직공학의 중요한 요소로 작용하는 scaffold는 여러 가지 필수적인 조건들을 만족시켜야 한다. 대표적인 특징들로는 (1)생분해성 및 비독성, (2)넓은 표면적을 갖는 상호 연결된 내부 다공성 구조, (3)구조적 안정성, (4)세포부착 기질의 제공, (5)낮은 면역 반응성, (6)혈전 형성 억제, (7)친수성, (8)생체 기능성 등을 들 수 있다. 이러한 scaffold가 갖추어야 할 특성 중에서 세포 부착 기질 제공을 위하여 scaffold에 표면 개질을 통한 기능기를 도입하였다. 본 연구에서는 BCP scaffold의 구조적 안정성 부여를 위하여 PCL(polycaprolactone)을 infiltration 하였다. PCL은 소수성의 특징을 갖고 있어 세포와 상호작용 할 수 있는 생물학적 반응기가 없기 때문에 세포와의 친화성이 떨어진다. 세포의 친화성을 높여주기 위해 실리콘의 전구체인 TEOS(tetraethly orthosilicate)를 코팅하고, 그 위에 카복실기(carboxylic acid group)를 도입하였다. 또한 세포의 고정화를 높여주기 위해 fibronectin을 코팅하여 BCP/PCL scaffold의 세포 친화성을 높여주었다. 이와 같이 제조된 고기능성 BCP/PCL scaffold의 내부 구조와 특성을 Micro-CT로 확인하였고, 또한 실리콘 코팅 여부를 확인하기 위하여 SEM-EDS를 통해 관찰하였으며, FT-IR 관찰을 통해 카복실기 도입 여부를 확인 하였다. 또한 생체적합성 평가를 위해 MTT assay, 조골세포의 부착에 미치는 영향을 관찰하기 위해 SEM, 조골세포의 유전자 발현에 미치는 영향을 관찰하기 위해 RT-PCR을 통해 확인 하였다.

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Adhesion Force Measurements of Nano-Imprint Materials Using Atomic Force Microscope (원자력현미경을 이용한 나노임프린트 재료의 접착력 측정)

  • Yun, Hyeong Seuk;Lee, Mongryong;Song, Kigook
    • Polymer(Korea)
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    • v.38 no.3
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    • pp.358-363
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    • 2014
  • Adhesion forces between acrylate imprinting resin and a surface treated atomic force microscope (AFM) tip were investigated. Compared to the untreated silicon tip, 38% of the adhesion force is reduced for the hydrophobic tip treated with $CH_4$ plasma whereas 1.6 time increases is found for the hydrophilic tip with $O_2$ plasma treatment. Such a measurement of the adhesion force using AFM provides very quantitative results on adhesion comparing to the crosscut adhesion test which gives qualitative results. Since the adhesion area becomes larger as the imprinting pattern size gets smaller, the surface treatment issue becomes more important in the nano-imprinting process.

Improvement of Oxidation-resistance of Graphite by Phosphate (인산 에스테르에 의한 탄소재료의 내산화 증진 효과)

  • 김경자;조광연;박윤창;김태관;정윤중;임연수
    • Journal of the Korean Ceramic Society
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    • v.36 no.5
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    • pp.555-563
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    • 1999
  • Impregnation of phosphorous additiers into graphite bulk was studied with the goal of enhancing the effectiveness of oxidationprotection. In addition graphite acid washing was carried out prior to the impregnation further to improve oxidation resistance. Observation of the oxidation rate for raw graphite(Raw) impregnated graphite with tri-butyl phsophate on raw block(RP) and impregnated graphite on acid-treated graphite(AP) in air are reported. The phsophorus residue adsorbed on the graphite surface at active sites was determined by FTIR, XRS, TGA techniques. AP with tri-butyl phosphate was found to result in both 30% reduction in oxidation rate at 1000$^{\circ}C$ compared to Raw and increase of 120$^{\circ}C$ in oxidation temperature From the samples of oxidation rate of each specimen in Arrhenius plot it can be said that the present oxidation resistance origninates from the change of chemical reaction modesw neigther by acid-washing treatment nor phsophate impregnation

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Fabrication of Nanopatterns for Biochip by Nanoimprint Lithography (나노임프린트를 이용한 바이오칩용 나노 패턴 제작)

  • Choi, Ho-Gil;Kim, Soon-Joong;Oh, Byung-Ken;Choi, Jeong-Woo
    • KSBB Journal
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    • v.22 no.6
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    • pp.433-437
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    • 2007
  • A constant desire has been to fabricate nanopatterns for biochip and the Ultraviolet-nano imprint lithography (UV-NIL) is promising technology especially compared with thermal type in view of cost effectiveness. By using this method, nano-scale to micro-scale structures also called nanopore structures can be fabricated on large scale gold plate at normal conditions such as room temperature or low pressure which is not possible in thermal type lithography. One of the most important methods in fabricating biochips, immobilizing, was processed successfully by using this technology. That means immobilizing proteins only on the nanopore structures based on gold, not on hardened resin by UV is now possible by utilizing this method. So this selective nano-patterning process of protein can be useful method fabricating nanoscale protein chip.

Effect of plasma etching on DLC films prepared by RF-PECVD method (RF-PECVD법에 의해 합성된 DLC 박막에 대한 plasma etching의 영향에 대한 연구)

  • Oh, Chang-Hyun;Yun, Deok-Yong;Park, Yong-Seob;Cho, Hyung-Jun;Choi, Won-Seok;Hong, Byung-You
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.315-315
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    • 2007
  • 본 논문에서는 DLC (Diamond-like carbon)박막이 가지는 높은 경도, 낮은 마찰계수, 전기적 절연성, 화학적 안정성 등의 특성을 이용하여, 리소그래피를 위한 resist나 hard coating물질로써 응용하기 위해, DLC 박막의 에칭에 관한 연구를 진행하였다. DLC 박막의 합성 과 에칭은 13.56 MHz RF plasma enhanced vapor deposition technique를 통해 이루어졌으며, DLC 박막은 150 W의 RF Power에서 메탄 $(CH_4)$과 수소$(H_2)$ 가스를 이용하여 약 300 nm의 두께로 제작되었으며, DLC박막의 에칭은 RF power의 변화 (50~250 W)와 산소 $(O_2)$가스의 유량변화 (5~25 sccm)에 따라 실시하였다. 에칭 되어진 DLC 박막의 표면 특성들은 AFM (atomic force microscopy)과 contact angle 장치를 사용하여 측정되었고, 측정된 결과로써 DLC 박막은 RF power와 산소 가스의 유량이 높을수록 etching rate는 증가하였고, 박막의 표면은 거칠어졌으며, 결국 DLC 표면에서는 산소에 의한 결합의 증가로 인해 친수성을 나타내었다.

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Detailed patterning formation through Etch resist printing condition reservation (부식 방지막 인쇄 조건 확보를 통한 미세 배선 형성)

  • Lee, Ro-Woon;Park, Jae-Chan;Kim, Yong-Sik;Kim, Tae-Gu;Joung, Jae-Woo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.06a
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    • pp.179-179
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    • 2006
  • 산업기술의 고도화에 따른 IT 산업의 급속한 발전으로 각종 전자, 정보통신기기에 대해 더욱 소형화 고성능화를 요구하고 있다. 이와 같은 경향에 따라 더욱 향상된 기능을 가지고 각종 소자 부품의 개발과 동시에 유독 물질 발생이 없는 청정생산기술 개발에 대한 요구가 끊임없이 제기 되어 왔다. 이러한 요구에 부응하여 기술들이 개발되고 있으며 그 중의 하나로 잉크젯 프린팅 기술이 연구되고 있다. 특히 Dod(Drop on Demand) 방식의 잉크젯은 가정용 프린터로 개발되어 널리 보급된 기술이지만, 이 기술을 PCB 제조기술에 전용하면 친환경 생산공정으로 부품 성장밀도를 증대 시킬 수 있다. 기존의 PCB 제조기술은 전극과 신호 패턴을 형성시키기 위하여 노광공정과 에칭공정을 반복적으로 사용하고 있는데, 노광공정에서 쓰이는 마스크와 유틸리티 설비 유지 비용의 문제가 대두되고 있다. 노즐로부터 분사된 잉크 액적들의 집합으로 기판위에 점/선/면의 인쇄이미지를 구현하게 된다. 그러므로 인쇄 해상도는 잉크액적 및 인쇄 방법, 기판과의 상호작용에 크게 의존하게 된다. 잉크 액적과 기판의 상호작용에 영향을 미치는 요소로는 잉크의 물리화학적 물성(밀도, 점도, 표면장력), 잉크 액적의 충돌 조건(액적 지름, 부피, 속도), 그리고 기판의 특성(친수/소수성, Porous/Nonporous, 표면조도 등)을 들 수 있겠다. 우선적으로 노즐을 통과해서 분사되는 액적의 크기에 따라 기판위에 형성되는 라인의 두께 및 폭이 결정된다. 떨어진 액적이 기판위에서 퍼지는 것을 UV 조사를 통한 가경화 과정을 통해서 최종적으로 라인의 투께 및 폭을 조절하려고 한다. 따라서 선폭 $75{\mu}m$의 일정한 미세 배선을 형성시키기 위해 액적 크기 조절과 탄착 resist 액적 표면의 UV 가경화 조건으로 구현하려고 한다. 또한 DPI(Dot Per Inch) 조절을 통한 인쇄로 탄착 resist의 두께 확보 후 에칭시 박리되는 현상을 억제 시키려 한다.

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Fabrication of Reverse Osmosis Membrane with Enhanced Boron Rejection Using Surface Modification (표면개질을 이용하여 붕소 제거율이 향상된 역삼투막의 제조)

  • Lee, Deok-Ro;Kim, Jong Hak;Kwon, Sei;Lee, Hye-Jin;Kim, In-Chul
    • Membrane Journal
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    • v.28 no.2
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    • pp.96-104
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    • 2018
  • With the rapid increase in seawater desalination, the importance of boron rejection is rising. This study was conducted to investigate the effect of hydrophilic compounds on surface modification to maximize water flux and increase boron rejection. First, polyamide active layer was fabricated by interfacial polymerization of polysulfone ultrafiltration membrane with M-phenylenediamine (MPD) and trimesoyl chloride (TMC) to obtain Control polyamide membrane. Next, D-gluconic acid (DGCA) and D-gluconic acid sodium salt (DGCA-Na) were synthesized with glutaraldehyde (GA) and hydrochloric acid (HCl) by modifying the surface of Control polyamide membrane. XPS analysis was carried out for the surface analysis of the synthesized membrane, and it was confirmed that the reaction of surface with DGCA and DGCA-Na compounds was performed. Also, FE-SEM and AFM analysis were performed for morphology measurement, and polyamide active layer formation and surface roughness were confirmed. In the case of water flux, the membrane fabricated by the surface modification had a value of 10 GFD or less. However, the boron rejection of the membranes synthesized with DGCA and DGCA-Na compounds were 94.38% and 94.64%, respectively, which were 12.03 %p and 12.29 %p larger than the Control polyamide membrane, respectively.

Adhesion Properties between Polyimide Film and Copper by Ion Beam Treatment and Imidazole-Silane Compound (이온빔 및 이미다졸-실란 화합물에 의한 폴리이미드 필름과 구리의 접착 특성)

  • Kang, Hyung Dae;Kim, Hwa Jin;Lee, Jae Heung;Suh, Dong Hack;Hong, Young Taik
    • Journal of Adhesion and Interface
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    • v.8 no.1
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    • pp.15-27
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    • 2007
  • Polyimide (PI) surface modification was carried out by ion-beam treatment and silane-imidazole coupling agent to improve the adhesion between polyimide film and copper. Silane-imidazole coupling agent contains imidazole functional groups for the formation of a complex with copper metal through a coordination bonding and methoxy silane groups for the formation of siloxane polymers. The PI film surface was first treated by argon (Ar)/oxygen ($O_2$) ion-beam, followed by dipping it into a modified silane-imidazole coupling agent solution. The results of X-ray photoelectron spectroscopy (XPS) spectra revealed that the $Ar/O_2$ plasma treatment formed oxygen functional groups such as hydroxyl and carbonyl groups on the polyimide film surface and confirmed that the PI surface was modified by a coupling reaction with imidazole-silane coupling agent. Adhesion between copper and the treated PI film by ion-beam and coupling agent was superior to that with untreated PI film. In addition, adhesion of PI film treated by an $Ar/O_2$ plasma to copper was better than that of PI film treated by a coupling agent. The peeled-off layers from the copper-PI film joint were completely different in chemical composition each other. The layer of PI film side showed similar C1s, N1s, O1s spectra to the original Upilex-S and no Si and Cu atoms appeared. On the other hand the layer of copper side showed different C1s and N1s spectra from the original PI film and many Si and Cu atoms appeared. This indicates that the failure occurs at an interface between the imidazole-silane and PI film layers rather than within the PI layers.

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