• Proceedings of the Optical Society of Korea Conference
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• 2000.02a
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• pp.176-177
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• 2000

고분해능 분광학, 레이저 주파수 안정화, 단원자 레이저, 레이저 자이로 등의 다양한 분야에서 널리 응용되는 저손실, 고반사율 반사경 제작은 고품질의 반사경 기판 사용을 전제로 하고 있다. 1$\AA$이하의 표면거칠기(surface roughness)를 요구하는 반사경 기판의 초연마(super-polishing) 기술과 저손실 반사경 박막코팅 기술은 최근 수 년 사이에 상당한 발전이 이루어졌으며, 이와 함께 초연마 반사경 기판의 표면거칠기 측정기술이 중요한 분야로 주목받고 있다. 표면거칠기 측정기법은 현재까지 여러 가지 방법이 연구, 발전되어 왔는데, 접촉식 측정방법으로 stylus 방법과 비접촉식 측정방법으로 광학 간섭계 방법, 스캔닝 전자현미경(SEM, Scanning Electron Microscopes) 등이 있다. 이들 중 광학 간섭계 방법은 표면형상을 직접 측정 가능하다는 점에서 유망한 비접촉 표면측정 기법으로 알려져 있다. (중략)

• Journal of the Korea Institute of Military Science and Technology
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• v.2 no.2
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• pp.157-165
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• 1999

Production and measurement of a super-polished few-ppm-scattering mirror substrate are investigated. In order to improve the surface roughness directly determining scattering, the super-polishing process using Bowl-Feed technique is tried. The surface quality of the super-polished substrate is estimated by the phase-measuring interferometer. For the reliable roughness measurement using the interferometer, data averaging method is applied so that the optimal data averaging condition, 30 phase-data averaging and 20 intensity-data averaging, minimizing the measurement error is experimently searched. Based on the optimal data averaging condition, surface roughness of home-made mirror substrate is measured to be less than $0.5{\AA}$ rms corresponding to 2-ppm total-integrated-scattering.

• Korean Journal of Optics and Photonics
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• v.11 no.5
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• pp.312-316
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• 2000

Vole lllvesnguted the surface roughness charactenstics of the super~polished mirror substrate made by bowl-feed technique. in comparison with the case of fresh-feed technique. Fresh-feed techmque and bowl-feed technique were tried lor substrate surface polishing, and the surface roughne~s was estimated by phase-measunng interferometry. l11e slilface roughness of the substrate after bowl-feed procedure was Improved approxImately three times as fine as that after fresh-feed procedure. and tbe nns roughness of less than $0.5\AA$ and up to $0.3\AA$ at its best was obtained for the bowl-feed procedure. The surface roughness changes by (he bowl-feed technique. compated with tbe fresh-feeclleclmique. were analyzed witb tbe help of both 1 -dimensional roughne,>s profde and rougbness amplItude spect1U1l1 of the polished substrate, whIch ascertained that the final polishing partIcle size of the bowl-feed ptocedure was much smaller than that of the fresh~feed procedure. edure.

• Korean Journal of Optics and Photonics
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• v.18 no.6
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• pp.452-460
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• 2007

Ultra-low loss ZERODUR and fused silica mirrors were manufactured and their light scattering characteristics were investigated. For this purpose, ZERODUR and fused silica substrates were super-polished by the bowl feed method. The surface roughness were 0.292 ${\AA}$ and 0.326 ${\AA}$ in rms for ZERODUR and fused silica, respectively. To obtain the high reflectivity, 22 thin film layers of $SiO_2$ and $Ta_2O_5$ were deposited by Ion Beam Sputtering. The measured light scattering of ZERODUR and fused silica mirror were 30.9 ppm and 4.6 ppm, respectively. This shows that the substrate surface roughness is not the only parameter which determines the light scattering of the mirror. In order to investigate the mechanism for additional light scattering of the ZERODUR mirror, the surface roughness of the mirror was measured by AFM and was found to be 2.3 times higher than that of the fused silica mirror. It is believed that there is some mismatch at the interface between the substrate and the first thin film layer which leads to the increased mirror surface roughness. To clarify this, the contact angle measurements were performed by SEO 300A, based on the Giriflaco-Good-Fowkes-Young method. The fused silica substrates with 0.46 ${\AA}$ in its physical surface roughness shows lower contact angle than that of the ZERODUR substrate with 0.31 ${\AA}$. This indicates that the thin film surface roughness is determined by not only its surface roughness but also the surface energy of the substrate, which depends on the chemical composition or crystalline orientation of the materials. The surface energy of each substrate was calculated from a contact angle measurement, and it shows that the higher the surface energy of the substrate, the better the surface roughness of the thin film.