• Title/Summary/Keyword: 진공여과 아프 증착(FVA)

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Investigation of Amorphous Carbon Film Deposition by Molecular Dynamic Simulation (분자 동역학 전산모사에 의한 비정질 탄소 필름의 합성거동 연구)

  • 이승협;이승철;이규환;이광렬
    • Journal of the Korean Vacuum Society
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    • v.12 no.1
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    • pp.25-34
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    • 2003
  • Deposition behavior of hard amorphous carbon film was investigated by molecular dynamic simulation using Tersoff potential which was suggested for the interaction potential between carbon atoms. When high energy carbon atoms were collided on diamond (100) surface, dense amorphous carbon film could be obtained. Physical properties of the simulated carbon film were compared with those of the film deposited by filtered cathodic arc process. As in the experimental result, the most diamond-like film was obtained at an optimum kinetic energy of the incident carbon atoms. The optimum kinetic energy was 50 eV, which is comparable to the experimental observation. The simulated film was amorphous with short range order of diamond lattice. At the optimum kinetic energy condition, we found that significant amount of carbon atom were placed at a metastable site of distance 2.1 $\AA$. By melting and quenching simulation of diamond lattice, it was shown that this metastatic peak is Proportional to the quenching rate. These results show that the hard and dense diamond-like film could be obtained when the localized thermal spike due to the collision of high energy carbon atom can be effectively dissipated to the lattice.