• Title/Summary/Keyword: 적외선 감지소자

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$V_2O_5/V/V_2O_5$ based uncooled infrared detector by MEMS technology ($V_2O_5/V/V_2O_5$ 다층박막 및 MEMS기술을 이용한 비냉각형 적외선 감지 소자의 제작)

  • Han, Yong-Hee;Hur, Jae-Sung;Park, In-Hoon;Kim, Kun-Tae;Chi-Anh;Shin, Hyun-Joon;Sung Moon
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.03a
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    • pp.131-131
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    • 2003
  • Surface micromachined uncooled IR detector with the optimized VOx bolometric layer was fabricated based on sandwich structure of the V$_2$O$_{5}$V/V$_2$O$_{5}$. In order to improve the detectivity of the IR detector, we optimized a few factors in the viewpoint of bolometric material. Vanadium oxide thin film is a promising material for uncooled microbolometers due to its high temperature coefficient of resistance at room temperature. It is, however, very difficult to deposit vanadium oxide thin films having high temperature coefficient of resistance and low resistance because of process limits in microbolometer fabrication. In order to increase the responsivity and decrease noise, we increase TCR of bolometric material and decrease room temperature resistance based on the sandwich structure of the V$_2$O$_{5}$V/V$_2$O$_{5}$ by conventional sputter. By oxygen diffusion through low temperature annealing of V$_2$O$_{5}$V/V$_2$O$_{5}$ in oxygen ambient, various mixed phase vanadium oxide was formed and we obtained TCR in range of-1.2 ~-2.6%/$^{\circ}C$ at room temperature resistance of 5~100k$\Omega$.mega$.

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Fabrication of a Large-Area $Hg_{1-x}Cd_{x}$Te Photovoltaic Infrared Detector ($Hg_{1-x}Cd_{x}$Te photovoltaic 대형 적외선 감지 소자의 제작)

  • Chung, Han;Kim, Kwan;Lee, Hee-Chul;Kim, Jae-Mook
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.31A no.2
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    • pp.88-93
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    • 1994
  • We fabricated a large-scale photovoltaic device for detecting-3-5$\mu$m IR, by forming of n$^{+}$-p junction in the $Hg_{1-x}Cd_{x}$Te (MCT) layer which was grown by LPE on CdTe substrate. The composition x of the MCT epitaxial layer was 0.295 and the hole concentration was 1.3${\times}10^{13}/cm^{4}$. The n$^{+}$-p junction was formed by B+ implantation at 100 keV with a does 3${\times}10^{11}/cm^{2}. The n$^{+}$ region has a circular shape with 2.68mm diameter. The vacuum-evaporated ZnS with resistivity of 2${\times}10^{4}{\Omega}$cm is used as an insulating layer over the epitaxial layer. ZnS plays the role of the anti-reflection coating transmitting more than 90% of 3~5$\mu$m IR. For ohmic contacts, gole was used for p-MCT and indium was used for n$^{+}$-MCT. The fabrication took 5 photolithographic masks and all the processing temperatures of the MCT wafer were below 90$^{\circ}C$. The R,A of the fabricated devices was 7500${\Omega}cm^{2}$. The carrier lifetime of the devices was estimated 2.5ns. The junction was linearly-graded and the concentration slope was measured to be 1.7${\times}10^{17}/{\mu}m$. the normalized detectivity in 3~5$\mu$m IR was 1${\times}10^{11}cmHz^{12}$/W, which is sufficient for real application.

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A Study on the molecular structure and molecular weight control of styrene films by plasma polymerization (플라즈마 중합법에 의한 스티렌 박막의 분자 구조 및 분자량 제어에 관한 연구)

  • 김종택;최충양;박종관;박응춘;이덕출
    • Journal of the Korean Vacuum Society
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    • v.6 no.3
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    • pp.213-219
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    • 1997
  • The plasma polymerized styrene films were prepared by using an inter-electrode capacitively coupled gas-flow-type reactor, and the effects of plasma polymerization condition on the molecular weight distribution were investigated by Fourier Transform Infrared (FT-IR), Pyrolysis Gas Chromatography(PyGC), Differential Scanning Calorimetry(DSC) and Gel Permeation Chromatography(GPC). From the above results, the very cross-linked films different from chemical characteristics of the starting monomer were taken out, and it is realized that the molecular structure, cross linking density, and molecular weight distribution could be controlled by changing the parameters such as deposition pressure, deposition power and gas flow rate. Accordingly, it is suggested that plasma polymerization method performed by inter-electrode capacitively coupled gas-flow-type reactor has good characteristics for manufacturing the functional organic thin films which can be applied in sensors, opto-electric device, photo-resist by changing the polymerization parameters.

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Implementation of Optical Sensor based on Block Surface Wave and Diffraction Grating Profile (Block 표면파와 회절 격자구조에 기초한 광학 센서의 구현)

  • Ho, Kwang-Chun
    • The Journal of the Institute of Internet, Broadcasting and Communication
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    • v.21 no.4
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    • pp.143-148
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    • 2021
  • A systematic study of Bloch surface wave (BSW), which is created by guided mode resonance (GMR) of dielectric multilayer structures with a grating profile, is presented to analyze the sensing performance of bio-sensors. The effect of structural parameters on optical behavior is evaluated by using Babinet's principle and modal transmission-line theory. The sensitivity of designed bio-sensors is proportional to the grating constant at wavelength spectrum, and inversely proportional to the normal wave vector of incident electromagnetic wave at angular spectrum. Numerical results for two devices with SiO/SiO2 and TiO2/SiO2 multilayer dielectric stacks are presented, showing that BSW can be exploited for the realization of efficient diffraction-based bio-sensors from infrared to visible-band range.

기판후면 온도 모니터링을 이용한 CIGS박막 하향 증착시스템 개발 및 그 소자로서의 특성 연구

  • Kim, Eun-Do;Cha, Su-Yeong;Mun, Il-Gwon;Hwang, Do-Won;Jo, Seong-Jin;Kim, Chung-Gi;Kim, Jong-Pil;Yun, Jae-Ho
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.443-443
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    • 2014
  • CIS 박막을 제조하기 위한 방법으로 셀렌화(selenization)방식, MOCVD방식, 동시진공증발(co-evaporation)방식, 전착(electrodeposition)방식 등이 있으나, 이러한 방식을 이용하여 CuInSe2 박막을 제조하는 경우 어떤 방법으로든 다원화합물의 조성 및 결정성을 조절하기가 매우 어려운 단점이 있었다. 기판의 온도를 일정 온도로 유지하도록 하고, 증발원을 가열하여 이에 내포된 물질(이원화합물 또는 단일원소)을 증발시켜 기판에 증착이 이루어지도록 하거나, 기판의 온도를 승온시키고 구리 이원화합물을 내포한 증발원을 가열해 물질을 증발시켜 기판에 증착이 이루어지도록 하는 방법으로 기판에 박막이 형성되도록 한다. 기판의 대면적화로 인해 균일한 박막의 형성이 어려워지고 있으며, 이중 15% 이상의 고효율을 보인 방법은 3-stage process를 이용한 동시진공증발방식으로, Cu, In, Ga, Se 등의 각 원소를 동시에 진공 증발시키면서 조성을 조절하여 태양전지에 적절한 전기적, 광학적 특성을 가지는 Cu(In,Ga)Se2 (CIGS)박막을 증착시키는 방법이다. 일반적으로, 실험실에서 연구되고 있는 장비의 구조는 증발원이 아래에 장착되어서 상향 증착되는 방식이다. 본 연구에서 사용된 장비는 하향 증발원이 측면에 장착되어서 하향 증착되는 방식으로 구성하였다. 증착되는 면방향으로, 적외선온도계(pyrometer)가 설치된 시창(viewport)의 오염 등으로 인하여, 지속적인 공정이 이루어지기 힘든 점을 개선하여 증착기판의 후면에 적외선 온도계를 설치하여 기판의 온도변화를 감지하여 공정에 반영할 수 있도록 하였다. 본 연구에서는 하향식 진공 증발원, 기판후면 온도모니터링모듈 등을 개발 장착하여, CIGS 박막을 제조하였으며, 버퍼층은 moving 스퍼터링법으로 ZnS를 증착하였고, 투명전극층은 PLD(Pulsed Laser Deposition)를 이용하여 제조하였다. 가장 높은 광변환효율을 보인 Al/ZnO/CdS/Mo/SLG박막시료는 유효면적 $0.45cm^2$에 광변환효율 15.65 %, Jsc : $33.59mA/cm^2$, Voc : 0.64 V, FF : 73.09 %를 얻을 수 있었으며, CdS를 ZnS로 대체한 Al/ZnO/ZnS/Mo/SLG박막시료는 유효면적 $0.45cm^2$에 광변환효율 12.45 %, Jsc : $33.62mA/cm^2$, Voc : 0.59 V, FF : 62.35 %를 얻을 수 있었다.

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