• Title/Summary/Keyword: 자성도금

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Effect of Plating Condition and Plating Rate on the Magnetic Properties of Electroless Co-Cu-P Deposits (무전해 Co-Cu-P 도금층의 자성에 미치는 도금조건과 도금속도의 영향)

  • Oh, I.S.;Park, S.D.
    • Journal of Power System Engineering
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    • v.8 no.3
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    • pp.36-43
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    • 2004
  • The effect of bath composition, plating condition and plating rate on the magnetic property of electroless Co-Cu-P deposits were investigated. With increasing $CuCl_2$ concentration in the bath, plating rate increased, while the Br value of deposit decreased sharply. Deposited surface were inferiority by the increase pH above 10.5, bath temperature higher than $80^{\circ}C$. Plating reaction had been ceased by the increase of pH above 11, bath temperature higher than $90^{\circ}C$ and under $40^{\circ}C$. The Br value of deposit was uniform with various concentration of complexing agent(sodium citrate) in the bath. The Br value of deposit was almost equal to that found by the addition of stabilizer (thiourea) and accelerator(NaF). The Br value of deposit was uniform in plating time(20min) and heat treatment temperature(below $200^{\circ}C$), and were confirmed to have adequate bath stability for practical use.

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Effect of Plating Condition and Plating Rate on the Magnetic Properties of Electroless Ni-Cu-P Deposits (무전해 Ni-Cu-P 도금층의 자성에 미치는 도금조건과 도금속도의 영향)

  • Oh, I.S.;Lee, T.H.
    • Journal of Power System Engineering
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    • v.10 no.3
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    • pp.58-66
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    • 2006
  • The effect of bath composition, plating condition and plating rate on the magnetic properties of electroless Ni-Cu-P deposits were investigated. With increasing $CuSO_4$ concentration in the bath, plating rate increased, while the Br value of deposits decreased Sharply. Plating rate increased up to 34% with the addition of 200ppm of NaF and 0.8ppm of Thiourea to the bath. Plating reaction had been ceased by the increase of pH above 11.3, bath temperature higher than $90^{\circ}C$ and under $70^{\circ}C$. The Br value of deposit was uniform with various concentration of complexing agent (Sodium citrate, Ethylenediamine) in the bath. The Br value of deposit was almost equal to that found by the addition of stabilizer(Thiourea) and accelerator(NaF). The Br value of deposit was uniform in plating time(120 min) and heat treatment temperature(below $200^{\circ}C$), and were confirmed to have adequate bath stability for practical use.

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Property Change by Organic Additives in Electroplated Nickel-copper Thin Films (유기첨가제에 의한 전기도금 니켈-구리 박막의 물성변화)

  • Lee, Jung-Ju;Hong, Ki-Min
    • Journal of the Korean Magnetics Society
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    • v.15 no.3
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    • pp.198-201
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    • 2005
  • We investigated the effects of organic additives on the properties of nickel-copper thin films prepared by electroplating. Compared with thin films fabricated by pure electrolyte only, the films utilizing organic additives show different crystalline orientations. With no alteration of plating conditions simply adding the organic materials changed the composition of copper and nickel. The concentration of nickel could be varied to $65-95\%$ depending on the species and concentration of the additives. The change of material property has contributed to the increase or decrease of the magnetoresistance.

A Study on the Magnetic Properties of the Co-Ni-P thin Plate by Electroless Plating (무전해도금법에 의한 Co-Ni-P 박막의 자기적특성에 관한 연구)

  • Kim, C.W.;Lee, C.;Yoon, S.R.;Joung, I.
    • Korean Journal of Materials Research
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    • v.5 no.8
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    • pp.1013-1019
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    • 1995
  • The thin plate of Co-Ni-P was deposited on the polyester film by the electroless plating method. Through present experiments, deposition rates and metal compositions of the plates were determined according to compositions of solution, pH and temperature. Also, magnetic properties of plates were examined according to metal compositions. Considering magnetic properties and deposition rates of electroless plating, the best condition was obtained as pH of 8.5 and 90℃. It was observed that metal compositions were evidently varied by the pH of solutions and the concentration of complex agents. However. they were not affected by other factors. At the optimum condition, the composition of the plate was Co(78%), Ni(16%), and P(6%). Also, it was found that the coercive force was 370 Oe, and squareness was 0.65 at this condition. Magnetic properties (hard or soft) of thin plates were determined by metal compositions. Therefore. the plate became soft magnetic plate as the composition of nickel increased over 30 per cents. The crystal structure of the soft magnetic plate was found to be amorphous in which it was strongly oriented to the (111)phahe of nickel. On the ohter hand, the hard magnetic place was found to be hcp crystalline of α-cobalt which was oriented to the (101)phase of cobalt and the (100)phase of cobalt.

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Characteristics of Micro-hardness and Corrosion of Electroless Nickel-Phosphorus Plating depending on Heat Treatment

  • Jung Seung-Jun;Park Soo-Gil
    • Journal of the Korean Electrochemical Society
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    • v.3 no.4
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    • pp.196-199
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    • 2000
  • Electroless plating is the desirable surface treatment method which is being widely used to all kinds of material such as requiring corrosion resistance, wear resistance and conductivity, especially plating of nonconductive material. Electroless nickel deposit has particular characteristics including non-magnetic property, amorphous structure, wear resistance, corrosion protection and thermal stability. In this study, electroless nickel plating was studied with an change in hardness and corrosion resistance of electroless nickel-phosphorus deposit depending on heat treatment. The highest hardness value was obtained by heat treatment at $500^{\circ}C$ Corrosion resistance of deposit, which had been heated at $300^{\circ}C$, was excellent when it was immersed in 1M $H_2SO_4$ solution for 60 hrs.

Control of Material Properties and Magnetism of Electroplated Nickel-iron Thin Films (전기도금법을 이용한 니켈-철 박막의 물성과 자성 조절)

  • Seo, Ho-Young;Nam, Kyung-Ho;Hong, Ki-Min
    • Journal of the Korean Magnetics Society
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    • v.22 no.2
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    • pp.42-44
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    • 2012
  • We have studied a means to control the composition of nickel-iron thin films. By changing current and voltage applied to a electroplating electrolyte we could manipulate the relative concentration of nickel and iron in the thin films, which caused variations of coercivity, squareness, and saturation magnetic field. As we increase the content of iron in the thin films by using potentiostatic and galvanostatic plating, the grain size was increased and the coercivity was reduced.

Properties Change of Electroplated Permalloy Thin Films by Organic Additives (유기첨가제에 의한 전기도금 퍼말로이 박막의 물성변화)

  • Bang, Won-Bae;Bae, Jong-Hak;Hong, Ki-Min;Chung, Jin-Seok;Ko, Young-Dong;Lee, Hee-Bok
    • Journal of the Korean Magnetics Society
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    • v.17 no.3
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    • pp.133-136
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    • 2007
  • We investigated the changes of the magnetic properties in electroplated Permalloy thin films by a few organic additives added to the plating electrolytes. Under identical electroplating conditions, the crystalline orientations and the surface roughness of the plated thin films were different from those prepared with a pure electrolyte. These property changes reduced the coercivity and increased the magnetoimpedance ratio (MIR) up to 20%.

Electrochemical Factors Affecting the Magnetic Properties of Co based Magnetic Nanowires (Co계 자성합금 나노와이어의 특성에 영향을 미치는 전기화학적 변수)

  • Lee, Jong-Wook;Park, Ho-Dong;Lee, Kwan-Hyi;Kim, Gyeung-Ho;Jeung, Won-Young
    • Journal of the Korean Electrochemical Society
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    • v.8 no.3
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    • pp.125-129
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    • 2005
  • We have investigated the electrochemical factors affecting the magnetic properties of hard magnetic CoP nanowires and soft magnetic CoFe nanowires fabricated by ac electrodeposition into self-made AAO(anodic aluminum oxide) nano-templates. AAO template having nano scale pores of high aspect ratio has been prepared through 2-step anodizing of aluminum foil in sulfuric acid. Hard Magnetic properties of CoP nanowires were highly conditional on the applied ac potential which could be a decisive factor to make CoP nanowires made up of either pure hcp crystals or a mixture of hop crystals and fcc crystals. On the contrary to CoFe films, there was no anomalous codeposition in the electrodeposition of soft magnetic CoFe nanowires which exhibited their best saturation magnetization of 238 emu/g at the composition of $Co_{30}Fe_{70}$.