• Title/Summary/Keyword: 인피드 연삭기

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A Study on Precision Infeed Grinding for the Silicon Wafer (실리콘 웨이퍼의 고정밀 단면 연삭에 관한 연구)

  • Ahn D.K.;Hwang J.Y.;Choi S.J.;Kwak C.Y.;Ha S.B.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.06a
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    • pp.1-5
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    • 2005
  • The grinding process is replacing lapping and etching process because significant cost savings and performance improvemnets is possible. This paper presents the experimental results of wafer grinding. A three-variable two-level full factorial design was employed to reveal the main effects as well as the interaction effects of three process parameters such as wheel rotational speed, chuck table rotational speed and feed rate on TTV and STIR of wafers. The chuck table rotaional speed was a significant factor and the interaction effects was significant. The ground wafer shape was affected by surface shape of chuck table.

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The Optimum Grinding Condition Selection of Grinding System (연삭시스템의 최적연삭가공조건)

  • Lee S.W.;Choi Y.J.;Hoe N.H.;Choi H.Z.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2006.05a
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    • pp.563-564
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    • 2006
  • In silicon wafer manufacturing process, the grinding process has been adopted to improve the flatness of water. The grinding of wafer is usually used by the infeed grinding machine. Grinding conditions are spindle speed, feed speed, rotation speed, grinding stone etc. But grinding condition selection and analysis is so difficult in grinding machine. In the intelligent grinding system based on knowledge many researchers have studied expert system, neural network, fuzzy etc. In this paper we deal grinding condition selection method, Taguchi method and Genetic Analysis.

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Review for Features of Wafer In-feed Grinder Structure (실리콘 웨이퍼 단면 연삭기 구조물 특성평가)

  • Ha S.B.;Choi S.J.;Ahn D.K.;Kim I.S.;Choi Y.H.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2006.05a
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    • pp.555-556
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    • 2006
  • In recent years, the higher flatness level in wafer shape has been strictly demanded with a high integration of the semiconductor devices. It has become difficult for a conventional wafer preparing process to satisfy those demands. In order to meet those demands, surface grinding with in-feed grinder is adopted. In an in-feed grinding method, a chuck table fur fixing a semiconductor wafrr rotates on its rotation axis with a slight tilt angle to the rotation axis of a cup shaped grinding wheel and the grinding wheel in rotation moves down to grind the wafer. So, stability of the grinder structure is very important to aquire a wafer of good quality. This paper describes the features of the in-feed grinder and some FEM analysis results of the grinder structure.

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