Improvement of Repeatability during Dielectric Etching by Controlling Upper Electrode Temperature (Capacitively Coupled Plasma Source를 이용한 Etcher의 상부 전극 온도 변화에 따른 Etch 특성 변화 개선)
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- Journal of the Korean Vacuum Society
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- v.20 no.5
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- pp.322-326
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- 2011