• Title/Summary/Keyword: 실릴화 반응

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Repair of Plasma Damaged Low-k Film in Supercritical Carbon Dioxide (초임계이산화탄소를 이용한 플라즈마 손상된 다공성 저유전 막질의 복원)

  • Jung, Jae-Mok;Lim, Kwon-Taek
    • Clean Technology
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    • v.16 no.3
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    • pp.191-197
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    • 2010
  • Repair reaction of plasma damaged porous methyl doped SiOCH films was carried out with silylation agents dissolved in supercritical carbon dioxide ($scCO_2$) at various reaction time, pressure, and temperature. While a decrease in the characteristic bands at $3150{\sim}3560cm^{-1}$ was detectable, the difference of methyl peaks was not identified apparently in the FT-IR spectra. The surface hydrophobicity was rapidly recovered by the silylation. In order to induce effective repair in bulk phase, the wafer was heat treated before reaction under vacuum or ambient condition. The contact angle was slightly increased after the treatment and completely recovered after the subsequent silylation. Methyl groups were decreased after the plasma damage, but their recovery was not identified apparently from the FT-IR, spectroscopic ellipsometry, and secondary ion mass spectroscopy analyses. Furthermore, Ti evaporator was performed in a vacuum chamber to evaluate the pore sealing effect. The GDS analysis revealed that the open pores in the plasma damaged films were efficiently sealed with the silylation in $scCO_2$.

Preparation and Reactions of Bis(trimethylsilylmethyl)-1,2-bis(disphenylphosphino)ethanenickel(II) (비스(트리메틸실릴메틸) 1,2-비스(디페닐포스피노)에탄니켈(II)의 합성 및 반응)

  • Chong Shik Chin;M. D. Curtis
    • Journal of the Korean Chemical Society
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    • v.25 no.5
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    • pp.311-317
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    • 1981
  • A new nickel(II) compound, $Ni(CH_2SiMe_3)_2((C_6H_5)_2PCH_2CH_2P(C_6H_5)_2)$, 1, has been prepared by the reaction of $NiCl_2((C_6H_5)_2PCH_2CH_2P(C_6H_5)_2)$ with $Me_3SiCH_2Li$. The compound, 1, is stable under nitrogen at room temperature both in solution and in the solid state. Thermal decomposition of 1 in solution or in the solid produces the reductive coupling product, $Me_3SiCH_2CH_2SiMe_3$ which is also afforded by the reactions of 1 with CO and $O_2$ at room temperature, and with $(C_6H_5)_2PCH_2CH_2P(C_6H_5)_2$ at 80${\circ}$C.

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Nickel Catalyzed Silylation Reaction of Carbonyl Compounds with 1,1'-Bis(dimethylsilyl)ferrocene (니켈 촉매를 이용한 1,1'-Bis(dimethylsilyl)ferrocene과 Carbonyl 화합물의 Silylation 반응)

  • Gong, Yeong-Geon;Lee, Jeong-Hyeon
    • Journal of the Korean Chemical Society
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    • v.46 no.2
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    • pp.139-144
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    • 2002
  • The nickel-catalyzed reation of 1,1'-bis(dimethysilyl)ferrocene[1] with carbonyls such as benzaldehyde, 4-cyaonbezaldehyde, trimethylacetaldehyde, acethon, and benzophenone afforded 3-oxa-2,5-disilacyclo-1,1'-ferrocene. In contrast, the reation of [1] with isobutyraldehyde under the same reation condition yielded the diinsertion products formed via the insertion of two aldehyde ligands into the Si-H bond of 1,1'-bis(dimethy)ferrocene.

Study on the hydrophobic modification of zirconia surface for organic-inorganic hybrid coatings (유-무기 하이브리드 코팅액 제조를 위한 지르코니아 표면의 소수화 개질 연구)

  • Lee, Soo;Moon, Sung Jin;Park, Jung Ju
    • Journal of the Korean Applied Science and Technology
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    • v.34 no.2
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    • pp.260-270
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    • 2017
  • Zirconia has white color and physical, chemical stability, also using in high temperature materials and various industrial structural ceramics such as heat insulating materials and refractories due to their low thermal conductivity, excellent strength, toughness, and corrosion resistance. If hydrophobically modified zirconia is introduced into a hydrophobic acrylate coating solution, the hardness, chemical, electrical, and optical properties will be improved due to the better dispersibility of inorganic particle in organic coating media. Thus, we introduced $-CH_3$ group through silylation reaction using either trimethylchlorosilane(TMCS) or hexamethyldisilazane(HMDZ) on zirconia surface. The $Si-CH_3$ peaks derived from TMCS and HMDZ on hydrophobically modified zirconia surface was confirmed by FT-IR ATR spectroscopy, and introduction of silicon was confirmed by FE-SEM/EDS and ICP-AES. In addition, the sedimentation rate result in acrylate monomer of the modified zirconia showed the improved dispersibility. Comparison of the sizes of a pristine and the modified zirconia particles, which were clearly measured not by the normal microscope but by particle size analysis, provided a pulverizing was occurred by physical force during the silylation process. From the BET analysis data, the specific surface area of zirconia was approximately $18m^2/g$ and did not significantly change during modification process.