• Proceedings of the KAIS Fall Conference
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• 2008.05a
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• pp.299-301
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• 2008

본 논문은 세정용 노즐의 기하학적인 형상을 변화시킴으로써 물과 공기를 이용한 비데용 분사노즐의 세정효과를 극대화하기 위한 연구이다. 세정효과와 절수를 목적으로 과거 물만을 공급되었던 비데노즐에 공기를 물을 혼합한 혼합류를 주입하면서 형성되는 노즐 내부 유동현상을 상용코드인 CFD-ACE+을 이용하여 가시화하고자 했다.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2004.05a
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• pp.35-51
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• 2004

• Clean Technology
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• v.14 no.2
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• pp.95-102
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• 2008

In order to choose alternative environmental-friendly cleaning agents, it is very important in the present point that the systematic selection procedures should be introduced and applied to the industry through the evaluation of their cleaning ability, environmental characteristics, and economical factors, and that the objective and effective evaluation methods of cleanliness should be established for the industry. Thus, a novel cleaning evaluation method utilizing optically stimulated electron emission (OSEE) among various methods of cleaning ability was studied in this study. The contaminants used in this cleaning experiments were flux, solder, grease, cutting oil, and mixed soil of 35% grease and 65% cutting oil. The cleaning agents developed or prepared in our laboratory were employed and their cleaning ability were comparatively evaluated by the OSEE, gravimetry and contact angle methods. The experimental results in this work showed that flux cleaning efficiency measured by the OSEE method was similar to that of the gravimetric method, but that the OSEE method could not be compared with gravimetric method for the case of solder or grease cleaning because the contaminants radiate or absorb ultra-violet light. In case of cutting oil cleaning, the gravimetric method indicated its limitation of cleaning efficiency of cutting oil since it showed cleaning efficiency of 100%, even though residual soil remaining on the substrate surface a little after its cleaning. The comparative experimental results of cleaning ability evaluated by the OSEE- and contact angle measurement methods showed that they were similar in case of cleaning of flux, mixed soil and cutting oil. It was judged that the contact angle measurement method could evaluate the cleaning ability more precisely than the OSEE method for cleaning solder and grease.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.11 no.3
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• pp.795-801
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• 2010

As the fabrication technology of LCDs (Liquid Crystal Displays) advances, the size of mother glass substrates is getting larger, and the fabrication process is becoming finer. Accordingly, the importance of cleaning processes grows in the fabrication process of LCDs. In this study, we have compared and evaluated the particle removal efficiency for three different methods of physical cleaning, which are brush, bubble jet, and aqua/air cleaning. Using the seventh generation glass substrate, the particle removal efficiency has been investigated by changing operation conditions such as a flow rate of deionized water, pressure, contact depth between a brush bristle and a glass substrate, and so forth. In the case of brush cleaning, the cleaning efficiency barely changes after a critical point when the contact depth is varied. While the cleaning efficiency of bubble jet cleaning is almost independent of pressure, that of aqua/air cleaning is affected by pressure up to a critical point, but is not changed after it. We note the brush cleaning is the most effective among the three cleaning methods under our experimental conditions.

• Clean Technology
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• v.5 no.1
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• pp.62-77
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• 1999

Semiconductor industry has rapidly grown because of the need from electronic and computer industries. However the global environmental regulations for various hazardous chemical compounds, which are indispensably used in semiconductor manufacturing process, are getting stronger. The semiconductor industries should develop the cleaner technologies in order to both lead the future world market and avoid the regulations form environmentally developed countries. In this paper, cleaner technologies for semiconductor cleaning processes are surveyed, such as gas phase process, UV process, and plasma process. Advantages and disadvantages of these processes are discussed.

• Journal of the Korea Convergence Society
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• v.10 no.11
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• pp.85-93
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• 2019

Despite its matchless position in the global semiconductor industry, Korea has not distinguished itself in the semiconductor equipment sector. Semiconductor cleaning equipment is one of the semiconductor fabrication equipment, and it is expected to be more important along with the advancement of semiconductor fabrication processes. This study attempts to analyze technology competitiveness of major countries in the sector including Korea, and explore specialty sub-areas of the countries. For this purpose, we collected patents of semiconductor cleaning equipment during the last 10 years from the US patent database, and implemented quantitative patent analysis and co-classification network analysis. The result shows that, the US and Japan have been leading the technological progress in this sector, and Korea's competitiveness has lagged behind not only the leading countries but also its competitors and even latecomers. Therefore, intensive R&D and developing technological capabilities are needed for advancing the country's competitiveness in the sector.

• Journal of Conservation Science
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• v.10 no.1 s.13
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• pp.10-20
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• 2001

Since the feasibility for the application of laser to the conservation of artworks had been demonstrated by John F. Asmus at 1972 it was known from many experiments that laser cleaning technology Provided superior characteristics over conventional cleaning methods based on mechanical and chemical actions. Then, the research and development of the cleaning technology was carried out strongly in Europe and many successful cleaning applications such as stone, painting, stained glass, paper, leather, and metal have been reported. However this is not familiar as a cleaning tool in the restoration of artworks in oriental countries including Korea. Therefore, this article aims to introduce a laser cleaning technology and its characteristics for the applications to art restoration. The contents in this article include general principles and characteristics of laser, the introduction of laser cleaning technology, and real laser applications for artwork restoration.

• Textile Coloration and Finishing
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• v.8 no.4
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• pp.59-68
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• 1996

섬유산업에 초음파의 이용은 극히 새로운 것이 아니며, 초음파를 이용하여 시간단축과 공정개선 등에 관한 많은 문헌들도 있다. 게다가 세정과 기계분야, 안정된 분산용액의 제조에 두드러지게 활용되고 있는 기술이며, 다른 새로운 분야로도 연구확대되고 있다. 주로 세정조에 구성되어 있는 초음파발생자치는 세정효율을 높이기 때문에 응용확대가 기대된다. 특별한 장치가 필요없기 때문에 음화학반응에서 관심이 모아지고 있다. 초음파는 이제 광범위한 습식공정에 영향을 미치는 기술로 이해되고 있다. 이 자료는 이미 연구된 결과를 재조명하고 초음파를 이용하므로서 얻을 수 있는 이점에 대해서 어떤 것이 있는지에 대해 살펴보고자 한다.

• Clean Technology
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• v.5 no.2
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• pp.1-12
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• 1999

Cleaning Processes are widely employed in the manufacturing processes of many industries and various environmental contaminants are generated during their operation. Thus, as the environmental and safety regulations are getting severer at home and abroad, it is indispensable that the existing cleaning agents which are causing environmental and safety problems should be replaced by the more environmentally-friendly alternative ones. In order to select alternative cleaning agents, it is necessary that their cleaning power is equivalent to or better than that of existing cleaning agents. However, the evaluation methods of cleaning power of industrial cleaning agents have not been established for comparison of cleanliness. In this study, various kinds of evaluation methods of cleanliness which can be utilized in the laboratory or in the industrial field are examined and their field application cases are reviewed and analyzed.

• Clean Technology
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• v.19 no.3
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• pp.264-271
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• 2013

In this study, we optimized the removal condition of contaminants attached on the scrap surface to recycle the scrap generated from the Zr alloy tube manufacturing process back to the nuclear grade. The main contaminant is remnant of watersoluble cooling lubricant that is used in the pilgering manufacture during the tube production, and it is assumed to be compressed and carbonized on the surface of tube. Zirlo alloy tube of ${\phi}9.50mm$, which has high occurrence frequency of scrap, was selected as the object to be cleaned, and cleaning abilities of reagents were evaluated by measuring the characteristics of contaminants remained and by analyzing the surface of the tube after cleaning process. For evaluation of each cleaning agent, we selected two types of sodium hydroxide series and three types of potassium hydroxide series. Furthermore, to confirm dependence on tempe-rature and ultrasonic intensities, cleaning at the room temperature, $40^{\circ}C$, and $60^{\circ}C$ was conducted, and results showed that higher the cleaning temperature and higher the ultrasonic intensity, better the cleaning effect. As a result of the bare-eye inspection, while the use of sodium hydroxide provided satisfactory condition on the tube surface, the use of potassium hydroxide series provided satisfactory condition on the tube surface only when the ultrasonic intensity was over 120 W. In the cleaning effect analysis using the gravimetric method, cleaning efficiency of sodium hydroxide series was as high as 97.6% ($60^{\circ}C$, 120 W), but since the tube surface condition was poor after the use of potassium hydroxide, the gravimetric method was not appropriate. In the analytical result of surface contaminants on the tube surface, C, O, Ca, and Zr were detected, and mainly C and O dominated the proportion of contaminants. It was also found that the degree of cleaning on the tube affected the componential ratio of C and O; if the degree of cleaning is high, or if cleaning is well-conducted, the proportion of C is decreased, and the proportion of O is increased. Based on these results, optimal cleaning for application in the industry can be expected by categorizing cleaning process into three steps of Alkali cleaning, Rinsing, and Drying and by adjusting cleaning parameters in each step.