• 제목/요약/키워드: 샤도우마스크

검색결과 6건 처리시간 0.032초

국부증착용 마이크로 샤도우 마스크 제작 (Fabrication of Miniaturized Shadow-mask for Local Deposition)

  • 김규만;유르겐부르거
    • 한국정밀공학회지
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    • 제21권8호
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    • pp.152-156
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    • 2004
  • A new tool of surface patterning technique for general purpose lithography was developed based on shadow mask method. This paper describes the fabrication of a new type of miniaturized shadow mask. The shadow mask is fabricated by photolithography and etching of 100-mm full wafer. The fabricated shadow mask has over 388 membranes with apertures of micrometer length scale ranging from 1${\mu}{\textrm}{m}$ to 100s ${\mu}{\textrm}{m}$ made on each 2mm${\times}$2mm large low stress silicon nitride membrane. It allows micro scale patterns to be directly deposited on substrate surface through apertures of the membrane. This shadow mask method has much wider choice of deposit materials, and can be applied to wider class of surfaces including chemical functional layer, MEMS/NEMS surfaces, and biosensors.

FIB 밀링을 이용한 나노스텐실 제작 및 나노패터닝 (Fabrication of nanostencil using FIB milling for nanopatterning)

  • 정성일;오현석;김규만
    • 한국정밀공학회지
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    • 제23권3호
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    • pp.56-60
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    • 2006
  • A high-resolution shadow mask, or called a nanostencil was fabricated for high resolution lithography. This high-resolution shadowmask was fabricated by a combination or MEMS processes and focused ion beam (FIB) milling. 500 nm thick and $2{\times}2mm$ large membranes wore made on a silicon wafer by micro-fabrication processes of LPCVD, photolithography, ICP etching and bulk silicon etching. A subsequent FIB milling enabled local membrane thinning and aperture making into the thinned silicon nitride membrane. Due to the high resolution of the FIB milling process, nanoscale apertures down to 70 nm could be made into the membrane. By local deposition through the apertures of nanostencil, nanoscale patterns down to 70 nm could be achieved.

FIB 밀링을 이용한 나노스텐실 제작 (Nanostencil fabrication using FIB milling)

  • 김규만;정성일;오현석
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2004년도 추계학술대회 논문집
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    • pp.871-874
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    • 2004
  • Fabrication of a high-resolution shadow mask, or called nanostencil, is presented. This high-resolution shadowmask is fabricated by a combination of MEMS processes and focused ion beam (FIB) milling. 500 nm thick and 2x2 mm large membranes are made on a silicon wafer by micro-fabrication processes of LPCVD, photolithography, ICP etching and bulk silicon etching. Subsequent FIB milling enabled local membrane thinning and aperture making into the thinned silicon nitride membrane. Due to high resolution of FIB milling process, nanoscale apertures down to 70 nm could be made into the membrane.

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나노스텐실 제작을 위한 집속이온빔 밀링 특성 (Focused Ion Beam Milling for Nanostencil Lithography)

  • 김규만
    • 한국정밀공학회지
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    • 제28권2호
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    • pp.245-250
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    • 2011
  • A high-resolution shadow mask, a nanostencil, is widely used for high resolution lithography. This high-resolution shadowmask is often fabricated by a combination of MEMS processes and focused ion beam (FIB) milling. In this study, FIB milling on 500-nm-thin SiN membrane was tested and characterized. 500 nm thick and $2{\times}2$ mm large membranes were made on a silicon wafer by micro-fabrication processes of LPCVD, photolithography, ICP etching and bulk silicon etching. A subsequent FIB milling enabled local membrane thinning and aperture making into the thinned silicon nitride membrane. Due to the high resolution of the FIB milling process, nanoscale apertures down to 60 nm could be made into the membrane. The nanostencil could be used for nanoscale patterning by local deposition through the apertures.

부가증착을 이용한 마이크로 구멍의 크기감소 (Size reduction of micro-aperture using additional deposition)

  • 이준석;김규만
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2006년도 춘계학술대회 논문집
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    • pp.505-506
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    • 2006
  • Size reduction of micro-aperture using additional deposition is presented in this study. PECVD process was used for additional deposition. Rate of deposition is different with deposition direction because corners of shadowmask membrane have a taper. Deposition into backside showed better than deposition into frontside with size reduction. Shadowmask membrane with two materials has stress because of the difference of a coefficient of thermal expansion The cantilever of membrane bend to opposite direction of deposition. Deposition to both frontside and backside could reduce inside stress.

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나노스텐실 제작을 위한 FIB 밀링 특성 (FIB milling on nanostencil membrane)

  • 김규만;정성일;오현석
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 추계학술대회 논문집
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    • pp.318-321
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    • 2005
  • FIB (Focused ion Beam) milling on a 500-nm-thick silicon nitride membrane was studied in order to fabricate a high-resolution shadow mask, or called a nanostencil. The silicon nitride membrane was fabricated by MEMS processes of LPCVD, photolithography, ICP etching and bulk silicon etching. The apertures made by FIB milling and normal photolithography were compared. The square metal pattern deposited through FIB milled shadow mask showed 6 times smaller comer radius than the case of photolithography. The results show high resolution patterning could be achieved by local deposition through FIB milled shadow-mask.

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