• Journal of the Korean Society of Marine Environment & Safety
• /
• v.28 no.spc
• /
• pp.30-36
• /
• 2022

A sensor is needed to continuously and automatically measure the change in HNS concentration in industrial facilities that directly discharge to the sea after water treatment. The basic function of the sensor is to be able to detect ppb levels even at room temperature. Therefore, a method for increasing the sensitivity of the existing sensor is proposed. First, a method for increasing the conductivity of a film using a conductive carbon-based additive in a nanoparticle thin film and a method for increasing ion adsorption on the surface using a catalyst metal were studied.. To improve conductivity, carbon black was selected as an additive in the film using ITO nanoparticles, and the performance change of the sensor according to the content of the additive was observed. As a result, the change in resistance and response time due to the increase in conductivity at a CB content of 5 wt% could be observed, and notably, the lower limit of detection was lowered to about 250 ppb in an experiment with organic solvents. In addition, to increase the degree of ion adsorption in the liquid, an experiment was conducted using a sample in which a surface catalyst layer was formed by sputtering Au. Notably, the response of the sensor increased by more than 20% and the average lower limit of detection was lowered to 61 ppm. This result confirmed that the chemical resistance sensor using metal oxide nanoparticles could detect HNS of several tens of ppb even at room temperature.

• Journal of the Korea Academia-Industrial cooperation Society
• /
• v.18 no.5
• /
• pp.475-480
• /
• 2017

In this paper, the conductivity of the fine pattern is improved in the insulating substrate by laser-induced forward transfer (LIFT) process. The high laser beam energy generated in conventional laser induced deposition processes induces problems such as low deposition density and oxidation of micro-patterns. These problems were improved by using a polymer coating layer for improved deposition accuracy and conductivity. Chromium and copper were used to deposit micro-patterns on silicon wafers. A multi-pulse laser beam was irradiated on a metal thin film to form a seed layer on an insulating substrate(SiO2) and electroless plating was applied on the seed layer to form a micro-pattern and structure. Irradiating the laser beam with multiple scanning method revealed that the energy of the laser beam improved the deposition density and the surface quality of the deposition layer and that the electric conductivity can be used as the microelectrode pattern. Measuring the resistivity after depositing the microelectrode by using the laser direct drawing method and electroless plating indicated that the resistivity of the microelectrode pattern was $6.4{\Omega}$, the resistance after plating was $2.6{\Omega}$, and the surface texture of the microelectrode pattern was uniformly deposited. Because the surface texture was uniform and densely deposited, the electrical conductivity was improved about three fold.

• Journal of the Institute of Electronics Engineers of Korea SD
• /
• v.48 no.6
• /
• pp.1-6
• /
• 2011

A transparent oxide thin film transistors (Transparent Oxide-TFT) have been fabricated by RF magnetron sputtering at room temperature using amorphous indium zinc oxide (a-IZO) as both of active channel and source/drain, gate electrodes and co-sputtered $HfO_2-Al_2O_3$ (HfAIO) as gate dielectric. In spite of its high dielectric constant > 20), $HfO_2$ has some drawbacks including high leakage current and rough surface morphologies originated from small energy band gap (5.31eV) and microcrystalline structure. In this work, the incorporation of $Al_2O_3$ into $HfO_2$ was obtained by co-sputtering of $HfO_2$ and $Al_2O_3$ without any intentional substrate heating and its structural and electrical properties were investigated by x-ray diffraction (XRD), atomic force microscopy (AFM) and spectroscopic ellipsometer (SE) analyses. The XRD studies confirmed that the microcrystalline structures of $HfO_2$ were transformed to amorphous structures of HfAIO. By AFM analysis, HfAIO films (0.490nm) were considerably smoother than $HfO_2$ films (2.979nm) due to their amorphous structure. The energy band gap ($E_g$) deduced by spectroscopic ellipsometer was increased from 5.17eV ($HfO_2$) to 5.42eV (HfAIO). The electrical performances of TFTs which are made of well-controlled active/electrode IZO materials and co-sputtered HfAIO dielectric material, exhibited a field effect mobility of more than $10cm^2/V{\cdot}s$, a threshold voltage of ~2 V, an $I_{on/off}$ ratio of > $10^5$, and a max on-current of > 2 mA.