• Title/Summary/Keyword: 백금기판

Search Result 48, Processing Time 0.023 seconds

Ferroelectric domain inversion in $LiNbO_3$ crystal plate during heat treatment for Ti in-diffusion ($Ti:LiNbO_3$ 도파로 제작을 위한 열처리 과정 동안 강유전 도메인 특성에 미치는 영향)

  • Yang, W.S.;Lee, H.Y.;Kwon, S.W.;Kim, W.K.;Lee, H.Y.;Yoon, D.H.
    • Journal of the Korean Crystal Growth and Crystal Technology
    • /
    • v.15 no.3
    • /
    • pp.124-127
    • /
    • 2005
  • It is demonstrated that the annealing process for Ti in-diffusion to z-cut $LiNbO_3$ at temperature lower than the curie temperature in a platinum (Pt) box can cause a ferroelectric micro-domain inversion at the +z surface and Li out-diffusion, therefore which should be avoided or suppressed for waveguide type periodically poled lithium niobate (PPLN) devices. The depth of the inversion layer depends on the Ti-diffusion conditions such as temperature, atmosphere, the sealing method of $LiNbO_3$ in the Pt box and crystal orientation is experimentally examined. The result shows that the polarization-inverted domain boundary appears at the only +z surface and its thickness is about $1.6{\mu}m$. Also, for the etched $LiNbO_3$, surface the domain shape was observed by the optical microscope and atomic force microscopy (AEM), and distribution of the cation concentrations in the $LiNbO_3$ crystal by the secondary ion mass spectrometry (SIMS).

Development of Trimming Technology in High-fine Resistor Using U.V. Laser (자외선 레이저를 이용한 고정밀 저항체 가공기술 개발)

  • Noh, S.S.;Kim, D.H.;Chung, G.S.;Kim, H.P.;Kim, K.H.
    • Journal of Sensor Science and Technology
    • /
    • v.11 no.6
    • /
    • pp.358-364
    • /
    • 2002
  • In this paper, we used U.V.(wavelength, 355nm) laser for adjusting Pt thin films temperature sensor to $100{\Omega}$ at $0^{\circ}C$. Internationally, A-class tolerance of temperature sensor is $0.06{\Omega}$ at $0^{\circ}C$. This is under value of $0.15^{\circ}C$, actually, so high-fine trimming technology is essential to this process. The width of trimmed lines was about $10{\mu}m$ and the best trimming of Pt thin films of $1{\sim}1.5{\mu}m$ was carried out with power : 35mW, rep. rate frequency : 200Hz and bite size : $1.5{\mu}m$. And using photolithography process, 96 resistors were fabricated in $2"{\times}2"$ substrate as the proportion of $79{\sim}90{\Omega}$ and $91{\sim}102{\Omega}$ is 42.7% and 57.3%, respectively. As result of trimming resistors to the target value of $109.73{\Omega}$ at $25^{\circ}C$, 82.3% of resistors had the tolerance within ${\pm}0.30{\Omega}$ and the others(17.7%) were within ${\pm}0.06{\Omega}$ of A-class tolerance.

Improvement of Bleaching Performance of Photosensitive Electrochromic Device by the Additive of TEMPOL (TEMPOL 첨가제 적용에 의한 광감응형 전기변색 소자 탈색성능 향상)

  • Song, Seung Han;Park, Hee sung;Cho, Churl Hee;Hong, Sungjun;Han, Chi-Hwan
    • Journal of the Korean Chemical Society
    • /
    • v.66 no.3
    • /
    • pp.209-217
    • /
    • 2022
  • We have developed photosensitive electrochromic smart windows that does not require any transparent conducting oxide (TCO) substrate. In our previous study, we demonstrated that a flexible film-type device made with a low temperature curing WO3 sol and TiO2 sol could show a reversible and rapid switching between colored and bleached state via incorporation of platinum catalysts on the surface of WO3 layer. However, when these devices were exposed to sunlight over 4 hour, it was confirmed that they did not return to fully bleached state in the darkened state due to their overcoloring process. In this study, we added 4-hydroxy-(2,2,6,6-tetramethylpiperidin-1-yl)oxyl (TEMPOL) as an additive to the electrolyte of photosensitive electrochromic device to effectively prevent the undesired overcoloring process. The resulting device with TEMPOL indeed did not undergo excessive coloration and showed great reversibility even after being exposed to sunlight for over 4 hours. Various concentrations of TEMPOL were applied to compare changes in the visible transmittance and coloring/bleaching kinetics of devices. In terms of energetic point of view, we proposed a plausible mechanism of TEMPOL to prevent excessive coloration.

Recovery of Precious Metals from Waste PCB and Auto Catalyst Using Arc Furnace (귀금속 함유 폐기물로부터 아크로를 이용한 유가금속 회수)

  • Ban Bong-Chan;Kim Chang-Min;Kim Young-Im;Kim Dong-Sn
    • Resources Recycling
    • /
    • v.11 no.6
    • /
    • pp.3-11
    • /
    • 2002
  • Recently, waste printed circuit board (PCB) has significantly increased in its amount due to the rapid development of electronic industries. Since several kinds of noxious materials and also valuable metals are contained in it, the waste PCB is in an urgent need of recycling for the dual purposes for the prevention of environmental pollution and recovery of valuable resources. Also, the catalyst which equipped in the exhaust pipes of automobiles to reduce emission of air pollutants contains precious met-als so that their recovery from the waste auto-catalysts is required. In this study, the recovery of valuable metals from waste PCB and auto-catalyst by arc furnace melting process has been investigated, which is known to be very stable and suitable f3r less production of pollutants due to its high operating temperature. The effect of the kind of flux on the recovery of precious metals was examined by using quicklime, converter slag, and copper slag as the flux. In addition, the influence of direct and alternating current and the applying direction of direct current has been investigated. It was observed that using converter or copper slag as a flux was more desirable for a higher efficiency in the precious metal recovery compared with quicklime. For the effect of current, application of direct current taking the bottom as a negative pole generally showed a better efficiency for the extraction of valuable metals from waste PCB, which was also observed for the case of waste auto-catalyst. The average recovery of precious metals from both wastes by arc furnace melting process was very high, which was up to in the range of 95~97%.

Characteristics of a planar Bi-Sb multijunction thermal converter with Pt-heater (백금 히터가 내장된 평면형 Bi-Sb 다중접합 열전변환기의 특성)

  • Lee, H.C.;Kim, J.S.;Ham, S.H.;Lee, J.H.;Lee, J.H.;Park, S.I.;Kwon, S.W.
    • Journal of Sensor Science and Technology
    • /
    • v.7 no.3
    • /
    • pp.154-162
    • /
    • 1998
  • A planar Bi-Sb multijunction thermal converter with high thermal sensitivity and small ac-dc transfer error has been fabricated by preparing the bifilar thin film Pt-heater and the hot junctions of thin film Bi-Sb thermopile on the $Si_{3}N_{4}/SiO_{2}/Si_{3}N_{4}$-diaphragm, which functions as a thermal isolation layer, and the cold junctions on the dielectric membrane supported with the Si-substrate, which acts as a heat sink, and its ac-dc transfer characteristics were investigated with the fast reversed dc method. The respective thermal sensitivities of the converter with single bifilar heater were about 10.1 mV/mW and 14.8 mV/mW in the air and vacuum, and those of the converter with dual bifilar heater were about 5.1 mV/mW and 7.6 mV/mW, and about 5.3 mV/mW and 7.8 mV/mW in the air and vacuum for the inputs of inside and outside heaters, indicating that the thermal sensitivities in the vacuum, where there is rarely thermal loss caused by gas, are higher than those in the air. The ac-dc voltage and current transfer difference ranges of the converter with single bifilar heater were about ${\pm}1.80\;ppm$ and ${\pm}0.58\;ppm$, and those of the converter with dual bifilar heater were about ${\pm}0.63\;ppm$ and ${\pm}0.25\;ppm$, and about ${\pm}0.53\;ppm$ and ${\pm}0.27\;ppm$, respectively, for the inputs of inside and outside heaters, in the frequency range below 10 kHz and in the air.

  • PDF

The Effects of Electrodeposited Lead Dioxide Structure on the Ozone Evolution (전착이산화납 결정구조가 전해에 의한 오존발생에 미치는 영향)

  • Kim, In Hwan;Lee, Choong Young;Nam, Chong Woo
    • Applied Chemistry for Engineering
    • /
    • v.7 no.2
    • /
    • pp.280-288
    • /
    • 1996
  • In the ozone evolution using $PbO_2$, which was electrodeposited on Ti plate at various conditions in electrolyte, the effects of lead dioxide structure on the current efficiency and surface structure changes of lead dioxide were investigated. Also the effects of oxygen transfer reaction on the ozone evolution were investigated by means of a $PbO_2$ electrodeposited on the platinum rotating disk electrode. In order to develope an electrode for ozone evolution, durability of lead dioxide and optimum current density were investigated. At the electrodeposited lead dioxide with the larger grain size and higher crystallinity, the efficiency for ozone evolution was higher. Optimum current density to electrodeposite lead dioxide with large grain size and high crystalinity was $50mA/cm^2$. Lead dioxide deposited in the presence of glycerin showed the best advantage of ozone evolution. Also lead dioxide electrodeposited at less than $10mA/cm^2$ or at more than $100mA/cm^2$ has poor performance of ozone evolution and poor adhesive strength to substrate. In the beginning of ozone evolution, surface structure of lead dioxide was changed and this change resulted in good effects on ozone evolution. Lead dioxide doped with other elements was favorable not to ozone evolution but to oxygen evolution, so it is speculated that ozone evolution has not intermediate stage of oxygen evolution and occurs competitively with oxygen evolution. When ozone was evolved at $0.7{\sim}0.8A/cm^2$, the current efficiency was highest.

  • PDF

Fabrication of a Schottky Type Ultraviolet Photodetector Using GaN Layer (GaN를 이용한 Schottky diode형 자외선 수광소자의 제작)

  • Seong, Ik-Joong;Lee, Suk-Hun;Lee, Chae-Hyang;Lee, Yong-Hyun;Lee, Jung-Hee;Hahm, Sung-Ho
    • Journal of the Korean Institute of Telematics and Electronics D
    • /
    • v.36D no.6
    • /
    • pp.28-34
    • /
    • 1999
  • We fabricated a planar ultra-violet photodetector whose ohmic and schottky contacts were respectively formed with evaporated Al and Pt on the GaN layer. To examine the applicability of the device to the UV sensor, we investigated its electrical and optical characteristics. The GaN layer on the sapphire waver had $7.8{\times}10^{16}cm^{-3}$ of doping concentnation and the $138 cm^2/V{\cdot}s$ of electron mobility and it absorbed the spectrum of the light below 325 nm wavelength. It had the responsivity of 2.8 A/W of at 325 nm, and the signal to noise ratio(SNR) of $4{\times}10^4$, and the noise equivalent power(NEP) of $3.5{\times}10^9$W under 5 V reverse bias. These results confirmed that the GaN schottky diode had a solar blind properly when it was applied to the UV photodetector.

  • PDF

Correlation between Strain and Dielectric properties in Paraelectic $ZrTiO_4$ Thin Films ($ZrTiO_4$상유전 박막의 Strain과 유전 특성 상관성 고찰)

  • 김태석;오정민;김용조;박병우;홍국선
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2000.02a
    • /
    • pp.108-108
    • /
    • 2000
  • 급증하는 무선통신 정보수요는 특히, 고주파대역 (300NHz-300GHz)에서 사용되는 공진기, 필터, 발진기 등과 같은 소자의 품질향상을 요구하고 있다. 고주파용 유전체 중 ZrTiO4 는 $\alpha$-PbO2 계열의 사방정구조를 갖고 있는 유전체로서 높은 유전율 ($\varepsilon$=40)과 높은 품질계수 (Q=1/tan$\delta$=4700 at 7GHz)를 갖고 있고, Sn 첨가시 0ppm/$^{\circ}C$의 공진주파수 온도계수를 얻을 수 있다고 보고되어 있다. 본 연구에서는 약 110$0^{\circ}C$ 이상에서 안정한 상으로 존재하는 ZrTiO4를 저온에서 증착하여 준안정한 상태로 결정화되게 한후, 유전손실 (tan$\delta$)과 유전율($\varepsilon$)을 측정하였다. 또한 증착온도와 열처리과정에 따른 박막의 us형 (Strain) 정도의 변화를 X-선 회절결과로부터 분석하였으며 이를 측정된 유전특성 값과 비교하였다. ZrTiO4 박막은 DC magnetron reactive sputter로 Zr과 Ti 타겟으로부터 high phosphorous doped Si (100) 기판위에 증착하였다. 압력은 4mTorr로 유지하고 박막의 화학양론적 조성비를 맞추기 위해 각 타겟에 가해지는 power는 Zr/Ti=500W/650W로 고정하고, 반응가스의 비율을 Ar/O2=17sccm/3.5sccm으로 유지하여 박막내에 인입되는 산소량을 제어하였다. 증착 직후와 열처리 후의 박막특성을 비교하기 위해 증착온도를 상온에서부터 $600^{\circ}C$까지 변호시키고 증착후 각각의 시편을 80$0^{\circ}C$ 산소분위기에서 2시간동안 열처리하여 시편을 준비하였다. 박막의 상형성 여부와 결정성변화는 $ heta$-2$\theta$X-선 회절법을 사용하여 조사하였고, EPMA를 이용하여 박막의 조성을 확인하였다. 유전특성의 측정을 위해 백금 상부전극을 증착한 후, impedance analyzer를 이용하여 100kHz 영역에서의 유전손실을 측정하고, 측정된 정전용량과 박막의 두께로부터 유전율을 계산하였다. ZrTiO4 박막은 증착온도 20$0^{\circ}C$ 이상에서 결정성을 보이기 시작했으며, 열처리 이후에는 상온에서 비정질이었던 시편이 $650^{\circ}C$ 이상의 온도에서 결정화되기 시작하였다. 증착온도에 따라 유전손실은 0.038에서 0.017 정도로 감소하는 경향을 나타냈으며, 각각 열처리에 의해서 0.034, 0.005 정도로 다시 감소하였다. 박막의 유전율은 약 35 정도의 값을 나타내었으며 X-선 회절 data로부터 분석한 박막의 변형은 증온도에 따라 7.2%에서 0.04%로 감소하였고 이 이경향은 유전손실은 감소경향과 일치하였다.

  • PDF