• Transactions of the Korean Society of Mechanical Engineers A
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• v.24 no.5 s.176
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• pp.1297-1304
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• 2000

The reflective photoelastic experiment can be used more effectively than the transparent type in industrial fields. Therefore the reflective photoelastic experimental hybrid method applied to the fatigue fracture problems is introduced in this research. It is verified that the reflective photoelastic experimental hybrid method is very useful on the determination of crack propagation velocity and stress intensity factor of the fatigue crack and on the separation of stress components in the vicinity of fatigue crack tip etc.

• Journal of the Korean Society for Nondestructive Testing
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• v.26 no.5
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• pp.329-335
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• 2006

It is necessary to study on the stress concentration experimentally, which is the main reason to avoid mechanical dilapidation and failure, when designing a mechanical structure. Stress concentration factor of a specimen of cantilever beam with a circular hole in the center was measured using both strain gage and photoelastic methods in this paper. In strain-gage measurement, three strain gages along the line near a hole of the specimen were installed and maximum strain was extrapolated from three measurements. In photoelastic measurement, two methods were employed. First, the Babinet-Soleil compensation method was used to measure the maximum strain. Secondly, photoelastic 4-step phase shilling method was applied to observe the strain distribution around the hole. Measurements obtained by different experiments were comparable within the range of experimental error.

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.228-233
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• 2008

The reflection type photoelastic experiment can be used more effectively than the transparent type photoelastic experiment in industrial fields. However, the reflection type photoelastic experiment for orthotropic material has not been studied. Therefore, the reflection type photoelastic experimental hybrid method for the fracture mechanics of orthotropic material was developed in this research. Comparing the results obtained from this method with those from the hybrid method for isotropic material about the same isotropic specimen, the validity of this method was verified. And then, the reflection type photoelastic experiment for orthotropic material was applied to the orthotropic plates with a central crack of the various inclined angle. Using this hybrid method for the orthotropic material, it is able to obtain stress intensity factors and separate stress components at the vicinity of the crack-tip in orthotropic plates from only the isochromatic fringe patterns of isotropic coating material.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.474-474
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• 2013

PDMS는 미세패턴을 위해 소프트 리소그래피 널리 활용되어질 뿐만 아니라, 재질이 투명하고 탄성과 강한 내구성을 갖고 있어 유연한 광학 및 전자소자에 이용될 수 있다. 최근에는, 이러한 PDMS를 서브파장구조(subwavelength grating structure)를 형성하거나 텍스쳐(texture)표면구조를 이용한 효과적인 반사방지막(antireflection coating)기판을 제작하여 태양전지 및 디스플레이 소자의 성능을 발전시키는 연구가 활발히 진행되고 있다. 한편, 수열합성법(hydrothermal method)이나 전기화학증착법(electrodeposition method)으로 비교적 간단한 공정을 통해서 다양한 기판위에 산화아연(ZnO) 나노막대(nanorod)를 수직정렬로 성장시킬 수 있는데, 이러한 구조는 반사방지특성의 유효 굴절률 분포(effective refractive index profile)를 갖고 있기 때문에 LED나 태양전지에 성능을 개선할 수 있다. 이에 본 연구에서는 수열합성법을 통해 성장된 수직 정렬된 산화아연 나노막대를 이용한 PDMS 표면의 미세패턴 형성하여 광학적 특성을 분석하였다. 실험을 위해, 스퍼터링을 통해서 산화아연 시드층을 형성한 후, 질산아연헥사수화물과 헥사메틸렌테트라민을 수용액에 담가두어 산화아연 나노막대를 성장시켰으며, PDMS의 베이스와 경화제의 질량비를 10：1으로 용액을 준비하여 수직 정렬된 산화아연 나노막대 표면을 casting method으로 코팅하여 열경화 처리하였다. 제작된 샘플의 형태, 구조 광특성을 관찰하기 위해서 전계방출형전자현미경, X선 회절 분석기, 분광 광도계를 이용하였다.

• Korean Journal of Optics and Photonics
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• v.23 no.1
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• pp.12-16
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• 2012

In the paper, we fabricated a Ni master with $45^{\circ}$-mirror structures for flexible waveguide fabrication. The flexible waveguide films with embedded $45^{\circ}$-angled mirrors at the waveguide ends were successfully fabricated using a UV-imprint process. Next, in order to enhance the reflectivity of the mirrors, Ni(3 nm)-Au(200 nm) bilayers were evaporated on the $45^{\circ}$-angled facets through a locally opened thin mask using an electron beam evaporator. We measured propagation loss, bending loss, mirror loss and bending reliability of the fabricated waveguide.