• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.18 no.1
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• pp.52-59
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• 2004

Recently, many researches for fine particles plasma have been focused on the fabrication of the new devices and materials in micro-electronic industry, although reduction or elimination of fine particles was interested in plasma processing until now on. In order to enhance their utilization, it is necessary to control and analyze fine particle behavior. Therefore, we developed simulation model of fine particles in RF Ar plasmas. This model consists of the calculation parts of plasma structure using a two-dimensional fluid model and of fine particle behavior. The motion of fine particles was derived from the charge amount on the fine particles and forces applied to them. In this paper, Ar plasma properties using two-dimensional fluid model without fine particles were calculated at power source voltage 15[V] and pressure 0.5[Torr]. Time-averaged spatial distributions of Ar plasma were shown. The process on the formation of Coulomb crystal of fine particles was investigated and it was explained by combination of ion drag and electrostatic forces. And also analysis on the forces of fine particles was presented.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.02a
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• pp.168-168
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• 1999

• Proceedings of the Korean Vacuum Society Conference
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• 2002.06a
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• pp.218-219
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• 2002

• Proceedings of KOSOMES biannual meeting
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• 2018.06a
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• pp.201-201
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• 2018

• Proceedings of the Korean Vacuum Society Conference
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• 2002.06a
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• pp.220-221
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• 2002

• Journal of the Korean Ceramic Society
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• v.40 no.5
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• pp.475-480
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• 2003

Nanocomposite of Au doped ZrO$_2$ films was prepared, which could be used as non-linear optic materials, selective absorption and transmission films. After heat treatment of prepared thin film by dip-coating method, the characteristics were investigated by X-ray diffraction, UV-VIS Spectrometer, Atomic Force Microscopy (AFM) and Scanning Electron Microscope (SEM). Film thickness was about 150 nm, the Au particle size was 15~35 nm. The thin film had a smooth surface roughness about 1.06 nm. Nonlinearity optics was found that films showed absorption peak at 600~650 nm visible region by plasma resonance of Au metal particles.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.328-328
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• 2011

전기장 E와 자기장 B가 서로 수직으로 인가된 플라즈마에서 전자와 이온의 이동 현상은 이미 널리 알려져 있다. 그런데 최근 플라즈마 응용 산업의 발달에 따라 음이온을 포함한 플라즈마에서 나노미립자의 운동에 대한 해석이 필요하다. 특히 실리콘 박막의 에칭, 스퍼터링, PECVD 등의 공정에 사용되는 실란 플라즈마에서 음이온의 발생에 따른 오염은 주요한 문제가 된다. 따라서 본 연구에서는 이러한 음이온을 제거하기 위해 E${\times}$B 드리프트 운동을 이론적으로 계산 하였다. 결과적으로 음으로 대전된 나노미립자는 E${\times}$B 드리프트 운동의 반대 방향으로 이동 하였고, 드리프트 속도는 자속밀도가 증가함에 따라 함께 증가됨을 보였다. 따라서 서로 수직으로 인가된 전자기장에 의한 E${\times}$B 드리프트 운동을 통해 음이온을 방전 공간에서 제거할 수 있음을 알 수 있었다.

• Journal of the Korean Ceramic Society
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• v.41 no.1
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• pp.24-29
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• 2004

Nanocomposite of Te doped $SiO_2$ films was prepared for the new functional materials like non-linear optic materials, selective absorption and transmission films. The effects of particle size and morphology with different hydrolysis conditions on the properties were examined with TGA/DTA. XRD. UV-spectrometer, SPM, SEM and EDS. It was found that Te/$SiO_2$ films showed high absorption peak at 550nm visible region by plasma resonance of Te fine particles. The Rm surface roughness of the films was about 2.5 nm and the size of Te particles was 5~10nm.

• Journal of Industrial Technology
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• v.23 no.A
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• pp.175-179
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• 2003

A study on the particle growth in $TEOS/O_2$ plasma was performed by observing the particle size and its morphology by TEM. The qualitative chemical analysis of particles was also determined by the EDS (Energy Dispersive X-Ray Spectrometer). The effects of process variables such as the plasma on-time and bubbler temperature on the particle growth were investigated. The particle size becomes larger as the plasma on-time because of the longer coagulation, and also as the bubbler temperature increases because of the faster coagulation between particles.

• Journal of Industrial Technology
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• v.21 no.B
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• pp.149-153
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• 2001

A study on the particle growth in $TEOS/O_2$ plasma was performed, and particle size and its distribution was measured by the electrical aerosol analyzer (EAA), light scattering particle size analyzer and the particle size was also determined by SEM. The effects of process variables such as total gas flow rate, reactor pressure, supplied power and initial reactant concentration on the particle growth were investigated. From the EAA results, the particle size distribution is divided into three groups of the cluster size and the small and large size particles. The particle size distribution measured by the light scattering particle size analyzer becomes bimodal, because the cluster size particles smaller than 20 nm in diameter cannot be detected by the light scattering particle size analyzer. The size of particles measured by the light scattering particle size analyzer is in good agreements with those by the SEM. Also we could understand that the particle formation is very sensitive to the changes of reactor pressure and reactant concentration. As the total gas flow rate increases, the particle size decreases because of the shorter residence time. As the reactor pressure, or the reactant concentration increases, the particle concentration increases and the particles grow more quickly by the faster coagulation between particles.