• 대한전기학회:학술대회논문집
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• 대한전기학회 1999년도 추계학술대회 논문집 학회본부 C
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• pp.909-911
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• 1999

Metalization technology of the fine patterns by electroless plating is required in place of electrodeposition as high-density printed circuit boards (PCB) become indispensable with the miniaturization of electronic components. Electroless nickel plating is a suitable diffusion barrier between conductor metals, such as Al and Cu, and solder is essetional in electronic packaging in order to sustain a long period of service. Moreover, Electroless nickel has particular characteristics including non-magnetic property, amorphous structure, wear resistance, corrosion protection and thermal stability. In this study fundamental aspects of electroless nickel deposition were studied with effect of complexeing agents of different kinds. Then, the property of electroless deposit are controlled by the composition of the deposition solution, the deposition condition such as temperature and pH value and so on. the characteristics of the deposits has been carried out.

• Corrosion Science and Technology
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• 제12권4호
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• pp.185-190
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• 2013

In the present study, $Ni-TiO_2$ composite coatings were electrodeposited in a sulfamate bath containing $TiO_2$ particles. The influence of the ultrasonic treatment on the co-deposition of $TiO_2$ particles in the coating and the hardness of the electrodeposited $Ni-TiO_2$ composite has been investigated. Three different ultrasonic treatments (pretreatment before the electrodeposition (pre-UT), pretreatment + applied during the electrodeposition (UT), and the electrodeposition without the ultrasonic treatment (w/o UT)) were performed. The $Ni-TiO_2$ composite coatings are characterized using scanning electron microscopy (SEM), image analyzer, and hardness tester. Comparison of results indicates that the volume fraction is more important factor than the agglomerated particle size in terms of the strength improvement, and the strength of the electrodeposited $Ni-TiO_2$ composite coatings is enhanced with pre-UT condition.

• 한국표면공학회지
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• 제27권4호
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• pp.193-206
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• 1994

A wear behavior of electroless (Ni-P-X, X: SiC, $Al_2O_3$, Diamond) composite coating layers, formed under various conditions on commerical grade low carbon steel, has been investigated using Taber abrasion tester and scanning electron microscope. Several factors, which are type of particles, co-deposited content, particle size, distribution of particles and heat-treatment, influenced the wear resistance. The wear resistance of the composited coating layers after heat-treatment at $400^{\circ}C$ for 1 hr was increased 70 times with diamond, 15 times with SiC and 8 times with $Al_2O_3$, compared with the electroless nickel plating layer without heat-treatment.

• 한국안광학회지
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• 제8권2호
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• pp.25-29
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• 2003

자외선과 전자파를 동시에 차단하는 선글라스렌즈를 제작하기 위하여 유리가판 위에 자성재료인 페라이트에 Ni를 여러 가지 조성비로 첨가한 니켈페라이트 박막 $Ni_xFe_{3-x}O_4$을 페라이트 도금법으로 제작하였다. 이들은 모두 스피넬 구조의 단일상임을 확인할 수 있었으며 육안으로 관찰할 때 거울면과 같은 광택을 가졌으며, 손톱으로 긁었을 때 흠집이 생기지 않는 강도를 보였다. 니켈페라이트는 400nm 부근에서부터 급격히 투과율이 떨어져 자외선을 차단하는데 효과적인 양상을 보이고 있으며 그 중에서 x = 0.09의 Ni 조성비가 자외선 차단효과가 가장 좋은 깃으로 나타났다. 이는 타사제품과 비교하여 자외선 차단효과는 크게 떨어지지 않으므로, 전자파 차단효과가 있는 $Ni_xFe_{3-x}O_4$ 페라이트를 코팅한 선글라스를 착용함으로서 유해전자파와 자외선을 동시에 차단하는 효과를 얻을 수 있을 것이다.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2004년도 춘계학술대회
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• pp.978-982
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• 2004

We present high aspect ratio 100nm-scale nickel stamper using e-beam lithography process and Cr/Qz mask for the injection molding process of nano grating patterns. Conventional photolithography blank mask (CrON/Cr/Qz) consists of quartz substrate, Cr layer of UV protection and CrON of anti-reflection layer. We have used Cr/Qz blank mask without anti-reflection layer of CrON which is non-conductive material and ebeam lithography process in order to simplify the nickel electroplating process. In nickel electroplating process, we have used Cr layer of UV protection as seed layer of nickel electroplating. Fabrication conditions of photolithography mask using e-beam lithography are optimized with respect to CrON/Cr/Qz blank mask. In this paper, we have optimized e-beam lithography process using Cr/Qz blank mask and fabricated nickel stamper using Cr seed layer. CrON/Cr/Qz blank mask and Cr/Qz blank mask require optimal e-beam dosage of $10.0{\mu}C/cm^2$ and $8.5{\mu}C/cm^2$, respectively. Finally, we have fabricated $116nm{\pm}6nm-width$ and $240nm{\pm}20nm-height$ nickel grating stamper for the injection molding pattern.

• 마이크로전자및패키징학회지
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• 제19권2호
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• pp.67-72
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• 2012

최근에 전자 산업 분야에서 장치의 고용량을 구현 하기 위해 구동 drive IC의 선폭은 좁아지고 집적도는 증가하고 있다. 이러한 반도체, 전자 산업 분야의 초소형화, 고밀도화에 따라 FCCL(Flexible Copper Clad Laminate)의 표면 품질이 더욱 중요해 지고 있다. FCCL의 표면 결함으로는 돌기, 스크레치, 덴트 등이 있다. 특히 돌기가 표면에 존재할 경우 후속 공정에서 쇼트와 같은 불량을 유발할 수 있으며, 제품의 품질 저하를 야기 시킬 수 있다. 하지만 표면에 돌기가 존재한다 하더라도, 전해액의 레벨링 특성이 우수하다면 돌기의 성장을 막을 수 있다.평탄하고, 결함이 없는 도금표면을 얻기 위해서는 첨가제의 역할이 필수적이다. 평탄한 구리 표면을 형성하기 위해서 stock solution에 가속제, 억제제, 레벨러를 첨가하였다. 레벨러를 첨가하는 이유는 평탄한 표면을 얻고, 돌기의 형성을 억제하기 위함이다. 구리도금 표면 형상을 향상시키기 위한 레벨러로는 SO(Safranin O), MV(Methylene Violet), AB(Alcian Blue), JGB(Janus Green B), DB(Diazine Black) and PVP(Polyvinyl Pyrrolidone)가 사용되었다. 도금 첨가제와 도금 조건의 변화를 통해 도금시레벨링 특성을 향상시키고, 레벨링 특성 측정을 위해 니켈 인공돌기를 제작 한 후 레벨링 특성을 측정하였다.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2007년도 춘계학술대회
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• pp.250-253
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• 2007

An evaporated Ti/Pd/Ag contact system is most widely used to make high-efficiency silicon solar cells, however, the system is not cost effective due to expensive materials and vacuum techniques. Commercial solar cells with screen-printed contacts formed by using Ag paste suffer from a low fill factor and a high shading loss because of high contact resistance and low aspect ratio. Low-cost Ni and Cu metal contacts have been formed by using electroless plating and electroplating techniques to replace the Ti/Pd/Ag and screen-printed Ag contacts. Ni/Cu alloy is plated on a silicon substrate by electro-deposition of the alloy from an acetate electrolyte solution, and nickel-silicide formation at the interface between the silicon and the nickel enhances stability and reduces the contact resistance. It was, therefore, found that nickel-silicide was suitable for high-efficiency solar cell applications. The Ni contact was formed on the front grid pattern by electroless plating followed by anneal ing at $380{\sim}400^{\circ}C$ for $15{\sim}30$ min at $N_{2}$ gas to allow formation of a nickel-silicide in a tube furnace or a rapid thermal processing(RTP) chamber because nickel is transformed to NiSi at $380{\sim}400^{\circ}C$. The Ni plating solution is composed of a mixture of $NiCl_{2}$ as a main nickel source. Cu was electroplated on the Ni layer by using a light induced plating method. The Cu electroplating solution was made up of a commercially available acid sulfate bath and additives to reduce the stress of the copper layer. The Ni/Cu contact was found to be well suited for high-efficiency solar cells and was successfully formed by using electroless plating and electroplating, which are more cost effective than vacuum evaporation. In this paper, we investigated low-cost Ni/Cu contact formation by electroless and electroplating for crystalline silicon solar cells.

• 한국결정성장학회지
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• 제6권1호
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• pp.88-97
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• 1996

태양전지의 전극형성은 전지의 가격과 성능 그리고 시스댐의 신뢰성을 결정하는데 매우 중요한 변수이다. 기폰의 스크련 프린팅 기술은 전면전극에 냐쁜 영향을 미치는 여러가지 제약들을 가지고 었다. 전극함몰형 태양전지는 기존의 전극에서 발생하는 문제점을 극복하고 저가격 대량생산을 위해서 고안된 것이다. 본 논문에서는 무전해 도금방법을 사용하여 함몰형 전지의 전극을 형성하는 공정을 최적화함으로써 값싸고 재현성있게 전지를 제조할 수 있었다. 무전해 도금용액으로는 상엽적으로 사용되는 니켈, 구리, 은 용액을 사용하었으며, 전지의 효울 을 최고 18.8 %까지 얻었다. 이때 전지의 개방전압은 651 mV, 단락전류밀도는 37.1 mA/$\textrm{cm}^2$, 충실도는 77.8 % 었으며 배치에서 90 % 이상의 전지가 18 % 이상의 효율을 나타내었다.

• 환경위생공학
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• 제16권2호
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• pp.38-46
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• 2001

In this work, the heterogeneous ion exchange membrane was used in a electrodialysis apparatus to treat a Ni planting rinse water because the heterogeneous ion exchange membrane was excellent efficiency as compared with low manufacturing cost, was easy to make, and had a good mechanical properties. For a regeneration of membrane and to obtain the optimal condition for a scale-up of apparatus after treating Ni plating rinse water, we would find about the limiting current density and the concentration polarization. When the Ni plating rinse water 150mg/L was treated with the electrodialysis apparatus using the heterogeneous ion exchange membrane, the limiting current density was about $1.49{\;}mA/\textrm{cm}^2$. And the limiting current density increased with the flow rate and concentration of Ni plating rinse water. We recognized that the used membrane could be reused by periodic backwashing because efficiency was constant when the membrane was backwashed after treating wastewater.

• 한국공작기계학회논문집
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• 제11권4호
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• pp.1-5
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• 2002

A 110 m diameter aspheric metal secondary mirror for a test model of an earth observation satellite camera was fsbricated by ultra-precision single point diamond turning (SPDT). Aluminum alloy for mirror substrates is known to be easily machinable, but not polishable due to its ductility. A harder material, Ni, is usually electrolessly coated on an A1 substrate to increase the surface hardness for optical polishing. Aspheric metal secondary mirror without a conventional polishing process, the surface roughness of Ra=10nm, and the form error of Ra=λ/12(λ=632.8nm) has been required. The purpose of this research is to find the optimum machining conditions for reflector cutting of electroless-Ni coated A1 alloy and apply the SPDT technique to the manufacturing of ultra precision optical components of metal aspheric reflector.