• Journal of the Microelectronics and Packaging Society
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• v.30 no.4
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• pp.91-97
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• 2023

Electrochemical (EC) CO₂ reduction is a promising method to convert CO₂ into valuable hydrocarbon fuels and chemicals ecofriendly. Here, we report on a facile method to synthesize surface-controlled SnO₂/Cu(OH)₂ nanowires (NWs) and its EC reduction of CO₂ to HCOOH and CO. The SnO₂/Cu(OH)₂ NWs (-16 mA/cm²) showed superior electrochemical performance compared to Cu(OH)2 NWs (-6 mA/cm²) at -1.0 V (vs. RHE). SnO₂/Cu(OH)₂ NWs showed the maximum Faradaic efficiency for conversion to HCOOH (58.01 %) and CO (29.72 %). The optimized catalyst exhibits a high C1 Faradaic efficiency stable electrolysis for 2 h in a KHCO₃ electrolyte. This study facilitates the potential for the EC reduction of CO₂ to chemical fuels.

• Journal of the Korean Vacuum Society
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• v.21 no.5
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• pp.273-278
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• 2012

Over the last decade, the hafnium-based gate dielectric materials have been studied for many application fields. Because these materials had excellent behaviors for suppressing the quantum-mechanical tunneling through the thinner dielectric layer with higher dielectric constant (high-K) than $SiO_2$ gate oxides. Although high-K materials compensated the deterioration of electrical properties for decreasing the thickness of dielectric layer in MOSFET structure, their nano-mechanical properties of $HfO_2$ thin film features were hardly known. Thus, we examined nano-mechanical properties of the Hafnium oxide ($HfO_2$) thin film in order to optimize the gate dielectric layer. The $HfO_2$ thin films were deposited by rf magnetron sputter using hafnium (99.99%) target according to various oxygen gas flows. After deposition, the $HfO_2$ thin films were annealed after annealing at $400^{\circ}C$, $600^{\circ}C$ and $800^{\circ}C$ for 20 min in nitrogen ambient. From the results, the current density of $HfO_2$ thin film for 8 sccm oxygen gas flow became better performance with increasing annealing temperature. The nano-indenter and Weibull distribution were measured by a quantitative calculation of the thin film stress. The $HfO_2$ thin film after annealing at $400^{\circ}C$ had tensile stress. However, the $HfO_2$ thin film with increasing the annealing temperature up to $800^{\circ}C$ had changed compressive stress. This could be due to the nanocrystal of the $HfO_2$ thin film. In particular, the $HfO_2$ thin film after annealing at $400^{\circ}C$ had lower tensile stress, such as 5.35 GPa for the oxygen gas flow of 4 sccm and 5.54 GPa for the oxygen gas flow of 8 sccm. While the $HfO_2$ thin film after annealing at $800^{\circ}C$ had increased the stress value, such as 9.09 GPa for the oxygen gas flow of 4 sccm and 8.17 GPa for the oxygen gas flow of 8 sccm. From these results, the temperature dependence of stress state of $HfO_2$ thin films were understood.