• Title/Summary/Keyword: 광 방출

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Microfabrication of submicron-size hole for potential held emission and near field optical sensor applications (전계방출 및 근접 광센서 응용을 위한 서브 마이크론 aperture의 제작)

  • Lee, J.W.;Park, S.S.;Kim, J.W.;M.Y. Jung;Kim, D.W.
    • Journal of the Korean Vacuum Society
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    • v.9 no.2
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    • pp.99-101
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    • 2000
  • The fabrication of the submicron size hole has been interesting due to the potential application of the near field optical sensor or liquid metal ion source. The 2 micron size dot array was photolithographically patterned. After formation of the V-groove shape by anisotropic KOH etching, dry oxidation at $1000^{\circ}C$ for 600 minutes was followed. In this procedure, the orientation dependent oxide growth was performed to have an etch-mask for dry etching. The reactive ion etching by the inductively coupled plasma (ICP) system was performed in order to etch ~90 nm $SiO_2$ layer at the bottom of the V-groove and to etch the Si at the bottom. The negative ion energy would enhance the anisotropic etching by the $Cl_2$ gas. After etching, the remaining thickness of the oxide on the Si(111) surface was measured to be ~130 nm by scanning electron microscopy. The etched Si aperture can be used for NSOM sensor.

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청색과 녹색 GaN계 LED 및 LD소자를 이용한 자발 발광 시 효율 감소 현상에 대한 연구

  • Jeong, Gyu-Jae;Lee, Jae-Hwan;Han, Sang-Hyeon;Lee, Seong-Nam
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.311-311
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    • 2014
  • III-N계 물질로 이루어진 GaN 기반의 광 반도체는 직접 천이형 넓은 밴드갭 구조를 갖고 있기 때문에 적외선부터 가시광선 및 자외선까지를 포함한 폭 넓은 발광파장 조절이 가능하여 조명 및 디스플레이 관련 차세대 광원으로 많은 관심을 받고 있다. 하지만, GaN기반의 발광 다이오드는 많은 연구기관들의 오랜 연구에도 불구하고 고출력을 내는데 있어 여전히 많은 문제들이 존재한다. 그 중, 주입전류 증가에 따른 효율감소 현상은 출력을 저해하는 대표적인 요소로 알려져 있는데, 이전의 연구 결과에서 알려진 효율감소 현상의 원인으로 결정결함에 의한 누설전류, Auger 재결합, 이송자 넘침 현상 그리고 p-n접합부의 온도 상승 등의 현상이 알려져 있다 [1-2]. 하지만 여전히 주입 전류 증가에 따른 효율 감소 현상의 원인에 대해 명확한 해답은 없으며 아직도 많은 논의가 이루어 지고 있다. 따라서, 본 연구에서는 GaN기반의 청색 및 녹색 LD와 LED소자를 이용하여 주입전류 밀도의 변화에 따른 자발 발광 영역에서의 효율감소 현상의 원인을 규명하고 한다. 유기금속화학증착법(MOCVD)를 이용하여 c면 사파이어 위에 서로 다른 발광파장을 가지는 InGaN/GaN 다중양자우물구조의 질화물계 LED와 LD 박막을 제작하였으며 성장 구조에 의한 특성으로 인해 발생하는 효율 저하 현상을 방지하고자 InGaN/GaN으로 이루어진 다중양자우물층의 조성만 제어하여 청색과 녹색으로 발광하도록 하였다. 청색 및 녹색 LD 웨이퍼들을 이용하여 주입전류 증가에 따른 발광특성을 조사하기 위해 LD와 LED는 표준 팹 공정에 의해 제작되었다. 전계 발광 측정을 위해 상온에서 직류 전류를 주입하여 GaN계 청색 및 녹색 LED와 LD에 각 5 mA/cm2에서 50 mA/cm2까지 전류밀도를 증가시킴에 따라 LD 및 LED칩 형태에 상관없이 청색 LD와 LED의 파장은 약 465nm에서 약 458nm로 감소하였고 녹색 LD와 LED의 파장은 약 521nm에서 약 511~513 nm까지 단파장화가 발생했다. 이는 동일한 웨이퍼에 동일한 전류 밀도를 주입하였기 때문에 발생하는 것으로 판단된다. 그러나, 청색 LED의 효율은 50 mA/cm2에서 약 70%정도로 감소하고 반면 녹색 LED의 경우 동일한 전류밀도 하에 약 52%정도로 감소하였지만, 청색과 녹색 LD의 경우 동일한 전류 밀도의 범위 내에서 더욱 낮은 효율저하 현상을 나타내었다. 또한, 접합 온도를 측정한 바 청색소자가 녹색 소자에 비하여 낮은 접합 온도를 나타낼 뿐아니라, 청색 및 녹색 LD의 경우 LED 보다 낮은 접합 온도를 나타내고 있었다. 이는 InGaN 활성층의 In 조성이 증가할수록 비발광 센터에 의한 접합온도 상승 뿐 아니라, LD ridge 구조에서 더 많은 열이 방출되어 접합 온도가 감소될 수 있는 것으로 판단된다. 우리는 동일한 웨이퍼에 LED와 LD를 제작하였고, 동일한 전류 주입밀도를 인가하였기 때문에 LD와 LED의 효율 감소 현상의 차이는 이송자 넘침 현상, 결정 결함, 오제 재결합 등이 원인보다 활성층의 접합 온도 상승이 가장 큰 영향이 될 수 있을 것으로 판단된다.

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Factors Associating Major Burn in Chemical Injury Patients due to Industrial Place Incident : A Retrospective study (산업장 화학 손상 환자에서 중증 화상에 영향을 미치는 요인)

  • Shin, Hee-Jun;Oh, Se-Kwang;Lee, Han-You
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.17 no.4
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    • pp.332-339
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    • 2016
  • This study examined the intensity of the association of factors affecting major burns by statistical analysis for patients injured by the release of chemical hazards. A total of 446 patients were evaluated as chemical injury patients, who had visited the emergency room from 1/Jan/2010 to 31/Dec/2014. The major burn was used as a dependent variable representing the severity of chemical injury. A chi-square test (CST) and binary logistic regression test (BLRA) were used as the statistical analysis method for determining the association between major burns and the independent variables. In CST, female and their presence at an incident scene, multiple site injury were associated with major burn (p<0.05). In BLRA, the presence at an incident scene and spills (comparing explosion), discharge (comparing admission) were associated with major burns (p<0.05). In this study, the presence at an incident scene was the most significant factor concerning major burns. Furthermore, gender and injury number, exposure mechanism (spill comparing explosion), and disposition (discharge comparing admission) were also associated with major burns.

A STUDY ON MICROLEAKAGE ACCORDING TO RESTORATION METHOD OF COMPOMER UNDER SALIVA CONTAMINATION (타액 오염하에서 수복방법에 따른 컴포머의 미세누출에 관한 연구)

  • Kong, Seok-Bae;You, Seung-Hoon;Kim, Jong-Soo
    • Journal of the korean academy of Pediatric Dentistry
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    • v.34 no.1
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    • pp.73-80
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    • 2007
  • Compomer that release fluoride could be used on proximal caries of child effectively. But oral cavity is always wet, so saliva inhibits bonding of tooth and compomer. When the saliva exist on bonding, it can be occured microleakages. The purpose of this study was to evaluate the influence of salivary contamination on compomer restoration and degree of microleakage according to restoration methods. Dyract $AP^{(R)}$ and prime and $bond^{(R)}$ NT was applied by the manufacture s instructions. Elipar Trilight was applied for light curing. Saliva pool was made for reconstruction of oral cavity. Two premolar was embedded in acrylic resin. After class II cavity preperation, Dyract $AP^{(R)}$ was restored under several condition, the specimen was thermocycled 500 times with 30 second dwell time. 0.5% methylene blue was used for microleakage test. Micoleakage was measured by the ratio of the infiltration length to occlusal and gingival side interface. Data were analyzed statistically using Kruskal Wallis Test, Mann-Whitney Test. The Result were as follows ; 1. In occlusal side, there were no statistical differences. 2. In gingival side, there were no statistical differences in Group III ($ContactMatrix^{TM}$, Rubber dam, $Oraseal^{(R)}$), Group IV (No saliva contamination). 3. In gingival side, there were no statistical differences in Group I$(ContactMatrix^{TM})$, II($ContactMatrix^{TM}$, Rubber dam). 4. In gingival side, there were statistical differences in Group I$(ContactMatrix^{TM})$, II($ContactMatrix^{TM}$, Rubber dam).

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Fabrication and loss measurement of $P_2O_5-SiO_2$ optical waveguides on Si (Si을 기판으로한 $P_2O_5-SiO_2$ 광도파로의 제작 및 손실측정)

  • 이형종;임기건;정창섭;정환재;김진승
    • Korean Journal of Optics and Photonics
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    • v.3 no.4
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    • pp.258-265
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    • 1992
  • A low loss optical waveguide of $P_{2}O_{5}-SiO_{2}$on Si substrate is produced by using the chemical vapour deposition method of $SiO_2$ thin films used in Si technology. Propagation loss of the waveguide layer was 1.65 dB/cm as produced and reduced down to 0.1 dB/cm after heat treatment at $1100^{\circ}C$. By using laser lithography and reactive ion etching method $P_{2}O_{5}-SiO_{2}$ waveguide was produced and subsequently annealed at $1100^{\circ}C$.As a result of this annealing the shape of the waveguide core was changed from rectangular to semi-circular form, and the propagation loss was reduced as down to 0.03 dB/cm at 0.6328$\mu$m and 0.04dB/cm at 1.53$\mu$m. We think that the mechanism of the reduction in propagation loss during the heat treatment is the following: 1) The hydrogen bonding in waveguide layer, which causes absorption loss, is dissociated and diffused out. 2) The roughness of the interface and the micro-structure of the waveguide layer is removed. 3) The irregularities in the cross-sectional shape of the waveguide which was induced during the lithographic process were disappeared by flowing of the waveguide core.

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Synthesis and Anaiysis of Photohnninescence Properties of $^5D_1$$^7F_1$ Transition in $LaGaO_3$:$Eu^{3+}$ Red Phosphor ($LaGaO_3$:$Eu^{3+}$형광체의 합성 및 발광 특성)

  • Kim, Kyoung Hwa;Choi, Yoon Young;Sohn, Kee Sun;Kim, Chang Hae;Park, Hee Dong;Choe, Se Young
    • Journal of the Korean Chemical Society
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    • v.44 no.5
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    • pp.453-459
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    • 2000
  • FED has deserved an intensive attentioD as a new flat panel display. The present investigationaims at undemtanding the photoluminescence and cathodoluminescent properties of hGaO$_3$: $Eu^{3+}$ phosphor bytaking into account the possibility that this phosphor could be applied for FED. In onler to investigate on.sucha detailed behavior; 8everM experimental skil18 Je conducted to the LaGaO$_3$:$Eu^{3+}$ phosphoL The excimtion srectrum artd emission spectmn were rnezsured in the UV range and then decay curve of $^5D_0$+$^7F_j$transitions\vas examined. The decay behavior of $^5D_0$ emission was anMyzed by a newly Iuoposed cross-relaxation mech-ani8In in asswiation with inteFwnter di1ffision (or migration). The cross-mlaxation from $^5D_0$ to CTB (Cha'geTransfer Band) wuld be a quite retsonable by considering the excitation spectrum. It could be also found thatthe quenching type was changed from ditfrsion controlled process to the direct quenching process -s inJeasing $Eu^{3+}$ oncntration.

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Generation of Femtosecond Pulses in a Passively Mode-Locked 100 MHz Cr4+:YAG Laser (수동 모드 잠금된 100 MHz Cr4+:YAG 레이저에서의 펨토초 펄스 발생)

  • Cho, Won-Bae;Rotermund Fabian;Kim, Jong-Doo;Jeon, Min-Yong;Suh, Ho-Suhng
    • Korean Journal of Optics and Photonics
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    • v.16 no.6
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    • pp.535-541
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    • 2005
  • We report on the development of a passively mode-locked near-infrared femtosecond laser with Cr:YAG crystal that operates near room temperature. The laser wavelength could easily be tuned by using only the internal prism pair over 110 nm from 1400 nm to 1510 nm in cw and over about 30 nm in mode-locked operation, respectively Maximum cw output powers of 810 mW were obtained with $1.5 \%$ output coupler for absorbed pump powers of 7.6 W. For compensation of the internal group velocity dispersion, an IR graded prism pair was used. The Cr:YAG laser delivered nearly Fourier-transform limited pulses with a pulse duration as short as 64 fs at 100 MHz repetition rate. In the mode-locked regime, the laser was operating at 1510 nm with a spectral bandwidth of 44 nm. In order to avoid unstable mode-locking and power instabilities, self-built tubes were inserted into the beam path in the resonator and purged with N2 gas. Finally, output powers of the Cr:YAG laser were optimized to 250 mW fer long time stable mode-locked operation.

On the Crystal Growth of Gap by Synthesis Solute Diffusion Method and Electroluminescence Properties. (합성용질확산법에 의한 GaP결정의 성장과 전기루미네센스 특성)

  • Kim, Seon-Tae;Mun, Dong-Chan
    • Korean Journal of Materials Research
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    • v.3 no.2
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    • pp.121-130
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    • 1993
  • The GaP crystals were grown by synthesis solute diffusion method and its properties were investigated. High quality single crystals were obtained by pull-down the crystal growing ampoule with velocity of 1.75mm/day. Etch pits density along vertical direction of ingot was increased from 3.8 ${\times}{10^4}$c$m^{-2}$ of the first freeze to 2.3 ${\times}{10^5}$c$m^2$ of the last freeze part. The carrier concentration and mobilities at room temperature were measured to 197.49cc$m^2$/V.sec and 6.75 ${\times}{10^{15}}$c$m^{-3]$, respectively. The temperature dependence of optical energy gap was empirically fitted to $E_g$(T)=[2.3383-(6.082${\times}{10^{-4}}$)$T^2$/(373. 096+TJeV. Photoluminescence spectra measured at low temperature were consist with sharp line-spectra near band-gap energy due to bound-exciton and phonon participation in band edge recombination process. Zn-diffusion depth in GaP was increased with square root of diffusion time and temperature dependence of diffusion coefficient was D(Tl = 3.2 ${\times}{10^3}$exp( - 3.486/$k_{\theta}$T)c$m^2$/sec. Electroluminescence spectra of p-n GaP homojunction diode are consisted with emission at 630nm due to recombination of donor in Zn-O complex center with shallow acceptors and near band edge emission at 550nm. Photon emission at current injection level of lower than 100m A was due to the band-filling mechanism.

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Effect of Sintering Temperature on the Properties of $CaSiO_4:RE^{3+}$(RE=Eu, Sm, Tb, Dy, Ce) Phosphors

  • Go, Bong-Jin;Jo, Min-Jeong;Jo, Sin-Ho
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.173-173
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    • 2013
  • 최근에 고효율의 형광체를 개발하고자 무기물 모체에 주입된 희토류 이온의 발광에 대한 연구가 급부상하고 있다. 형광체는 고휘도, 넓은 시청 각도와 저 비용으로 인하여 대형 평판 디스플레이 분야로 그 응용성을 확장하는 플라즈마 디스플레이 패널 제작에 있어서 매우 중요한 물질이다. 현재 적색 형광체로 널리 사용되고 있는 발광 물질은 YBO3:Eu3+ 혹은 (Y,Gd)BO3:Eu3+ 형광체이지만, Eu3+ 이온이 중심대칭의 자리에 위치하기 때문에, Eu3+ 이온의 5D07F1 전이에 의한 주황색의 발광 세기가 5D07F2 전이에 의한 적색의 세기보다 강하여 고품질의 색상을 구현하는데 상당한 어려움이 있다. 이러한 문제점을 해결하기 위하여 새로운 모체 격자를 갖는 적색, 녹색, 청색 형광체 개발에 많은 노력이 집중되고 있다. 본 연구에서는 형광체 합성시 중요한 변수의 하나인 소결 온도가 새로운 다양한 색을 방출하는 형광체 분말 CaSiO4:RE3+ (RE=Eu, Sm, Tb, Dy, Ce)의 특성에 미치는 영향을 조사하였다. CaSiO4:RE3+ (RE=Eu, Sm, Tb, Dy, Ce) 형광체 분말 시료는 초기 물질 CaO (99.99%), SiO2 (99.99%), Eu2O3 (99.99%), Sm2O3 (99.9%), Tb4O7 (99.9%), Dy2O3 (99.9%), CeO2 (99.9%)을 화학적량으로 준비하였다. 볼밀, 건조 작업을 한 후에, 시료를 막자사발에 넣고 분쇄하여 3시간의 하소 공정과 5시간의 소결 공정을 수행하였다. 이때 소결 온도를 변수로 선택하여 각각 $800^{\circ}C$, $900^{\circ}C$, $1,000^{\circ}C$, $1,100^{\circ}C$에서 소결 작업을 수행하여 합성 분말의 구조, 표면, 광학적 특성을 측정하여 소결 온도가 미치는 영향을 조사하였다. Eu3+가 도핑된 CaSiO4 형광체 분말의 경우에, 발광 스펙트럼은 597, 618, 655, 707 nm에서 관측되었으며, 소결 온도가 $800^{\circ}C$에서 $1,100^{\circ}C$로 증가함에 따라 모든 발광 스펙트럼의 세기는 순차적으로 증가함을 나타내었다. Tb3+가 도핑된 CaSiO4 형광체 분말의 경우에 관측된 발광 스펙트럼은 주 피크인 549 nm를 중심으로 하여 세기가 상대적으로 작은 493, 592, 626 nm의 피크들이 관측되었으며, 소결 온도가 증가함에 따라 전반적으로 발광 세기들이 증가하는 경향을 나타내었다. Sm3+가 도핑된 CaSiO4 형광체의 경우에, 발광 스펙트럼은 전형적인 Sm3+이온에 의한 전이 신호들이 605, 570, 653 nm에서 나타났다. 발광 스펙트럼의 세기는 소결 온도에 비례하여 증가하였다. Ce3+가 도핑된 경우에 발광 스펙트럼은 소결 온도에 관계없이 401 nm에서 관측되었으며, 소결 온도에 따라 발광 세기의 변화가 나타났다. 이 실험 결과로 부터, 합성시 적절한 소결 온도의 선택이 고발광 효율의 형광체를 제작하는데 있어서 매우 중요한 요소가 됨을 확인할 수 있었다.

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Recent Technological Advances in Optical Instruments and Future Applications for in Situ Stable Isotope Analysis of CH4 in the Surface Ocean and Marine Atmosphere (표층해수 내 용존 메탄 탄소동위원소 실시간 측정을 위한 광학기기의 개발 및 활용 전망)

  • PARK, MI-KYUNG;PARK, SUNYOUNG
    • The Sea:JOURNAL OF THE KOREAN SOCIETY OF OCEANOGRAPHY
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    • v.23 no.1
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    • pp.32-48
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    • 2018
  • The mechanisms of $CH_4$ uptake into and release from the ocean are not well understood due mainly to complexity of the biogeochemical cycle and to lack of regional-scale and/or process-scale observations in the marine boundary layers. Without complete understanding of oceanic mechanisms to control the carbon balance and cycles on a various spatial and temporal scales, however, it is difficult to predict future perturbation of oceanic carbon levels and its influence on the global and regional climates. High frequency, high precision continuous measurements for carbon isotopic compositions from dissolved $CH_4$ in the surface ocean and marine atmosphere can provide additional information about the flux pathways and production/consumption processes occurring in the boundary of two large reservoirs. This paper introduces recent advances on optical instruments for real time $CH_4$ isotope analysis to diagnose potential applications for in situ, continuous measurements of carbon isotopic composition of dissolved $CH_4$. Commercially available, three laser absorption spectrometers - quantum cascade laser spectroscopy (QCLAS), off-axis integrated cavity output spectrometer (OA-ICOS), and cavity ring-down spectrometer (CRDS) are discussed in comparison with the conventional isotope ratio mass spectrometry (IRMS). Details of functioning and performance of a CRDS isotope instrument for atmospheric ${\delta}^{13}C-CH_4$ are also given, showing its capability to detect localized methane emission sources.