• Title/Summary/Keyword: 광학 사진

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RADIOPACITY COMPARISON OF TOOTH COLORED RESTORATIVE MATERIALS WITH DIGITAL RADIOGRAPHY (디지털 방사선사진술을 이용한 치아색 수복물의 방사선불투과도 비교)

  • Kim, Hyo-Jung;Kim, Sung-Kyo
    • Restorative Dentistry and Endodontics
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    • v.25 no.4
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    • pp.499-508
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    • 2000
  • The purposes of this study were to evaluate the validity of 2 kinds of digital radiography techniques in evaluating the radiopacity comparison of restorative materials and to determine the relative radiopacities of several kinds of compomer and flow able resin using these techniques. After taking radiographs of an aluminum step wedge, con-elation of optical density calibration curves were evaluated between conventional radiography with transmission densitometer and CD-Dent digital radiography (storage phosphor system) and between conventional one and RVG$^{(R)}$ digital radiography (CCD system). Compomers such as Dyract$^{(R)}$ AP, Compoglass$^{(R)}$, and Dyract flow$^{(R)}$, and flowable resins such as Ultraseal-XT$^{(R)}$ plus$^{TM}$, Revolution$^{TM}$, Aeliteflo$^{TM}$ and Tetric-flow$^{(R)}$ were used. Five specimens of 5mm in diameter and 2 mm thick were fabricated with each material. Radiopacities of the materials were measured using the above radiographic techniques and compared. The results were as follows: 1. When the optical density calibration curves were compared, conventional radiography and both CD-Dent and RVG$^{(R)}$ digital radiographies showed very high inverse correlations (${\gamma}$=-0.95, ${\gamma}$=-0.98 ; p<0.05). 2. All the tested restorative materials showed levels of radiopacity the same as or greater than that of dentin (p<0.05), Radiopacities of Dyract$^{(R)}$ AP, Compoglass$^{(R)}$, and Tetric flow$^{(R)}$ were greater than those of Revolution$^{TM}$, Aeliteflo$^{TM}$, or dentin (p<0.05). 3. Radiopacities of Dyract$^{(R)}$ AP, Compoglass$^{(R)}$, and Tetric flow$^{(R)}$ were shown to be greater than that of enamel when conventional radiography and CD-Dent digital radiography were used (p<0.05). Radiopacity of Dyract flow$^{(R)}$ was shown to be greater than that of Enamel when conventional radiography was used (p<0.05).

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A COMPARATIVE STUDY ON RADIOPACITY OF ROOT CANAL SEALERS (근관 전색재의 방사선 불투과성에 관한 비교연구)

  • Kim, Tae-Min;Kim, Seo-Kyoung;Hwang, In-Nam;Hwang, Yun-Chan;Kang, Byung-Cheol;Yoon, Suk-Ja;Lee, Jae-Seo;Oh, Won-Mann
    • Restorative Dentistry and Endodontics
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    • v.34 no.1
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    • pp.61-68
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    • 2009
  • This study was performed to assess the radiopacity of a variety of root canal sealers according to the specification concerning root canal sealers. Ten materials including Tubli-$Seal^{TM}$. Kerr Pulp Canal $Sealer^{TM}$, AH $26^{(R)}$, AH $plus^{(R)}$, AH plus $jet^{TM}$, Ad sea $1^{TM}$. $Sealer^{TM}$, $NOGENOL^{TM}$, ZOB $seal^{TM}$, $Epiphany^{TM}$ and dentin were evaluated in this study. In the first part, densitometric reading of an each step of aluminum step wedge on occlusal film was performed at different voltage and exposure time. In the second part, ten specimens were radiographed simultaneously with an aluminum step wedges on the occlusal films under decided condition. The mean radiographic density values of the materials were transformed into radiopacity expressed equivalent thickness of aluminum (mm Al). The following results were obtained. 1. Among the various conditions, the appropriate voltage and exposure time that meet the requirement density was 60 kVp at 0.2 s 2. All of the materials had greater radiopacity than 3 mm Al requirement of ANSI/ADA specification No. 57 (2000) and ISO No. 6876 (2001) standards. 3. The radiopacity of materials increased as thickness of materials increased. 4. The mm Al value of each specimen at 1mm in thickness has a significant difference in the statistics. It suggests that root canal sealers have a sufficient radiopacity that meet the requirement.

The Fabrication and Characteristic for Narrow-band Pass Color-filter Deposited by Ti3O5/SiO2 Multilayer (Ti3O5/SiO2 다층박막를 이용한 협대역 칼라투과필터 제작 및 특성연구)

  • Park, Moon-Chan;Ko, Kyun-Chae;Lee, Wha-Ja
    • Journal of Korean Ophthalmic Optics Society
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    • v.16 no.4
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    • pp.357-362
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    • 2011
  • Purpose: The narrow-band pass color-filters with a 500 nm central wavelength and 12 nm FWHM using $Ti_3O_5/SiO_2$ mutilayer were fabricated, and their characteristics and structures were studied. Methods: the optical constants, n and k, of the $Ti_3O_5$ and $SiO_2$ thin films were obtained from the transmittances of their thin film. The narrow-band pass color-filters were designed with these optical constants and the AR coating of the filter was also designed. $Ti_3O_5/SiO_2$ multilayer filters were made by electron beam evaporation apparatus and the transmittaces of the filters were measured by spectrophotometer. the number of layers and the thicknesses of filters were calculated from the cross section of filters by SEM image and the composition of filters was analysed by XPS analysis. Results: The optimization of AR coating for the narrow-band pass color-filter was [air$|SiO_2(90)|Ti_3O_5(36)|SiO_2(5)|Ti_3O_5(73)|SiO_2(30)|Ti_3O_5(15)|$ glass], and the optimization of filter layer for the color filter was [air$|SiO_2(192)|Ti_3O_5(64)|SiO_2(102)|Ti_3O_5(66)|SiO_2(112)|Ti_3O_5(74)|SiO_2(120)|Ti_3O_5(68)|SiO_2(123)|Ti_3O_5(80)|SiO_2(109)|Ti_3O_5(70)|SiO_2(105)|Ti_3O_5(62)|SiO_2(99)|Ti_3O_5(63)|SiO_2(98)|Ti_3O_5(51)|SiO_2(60)|Ti_3O_5(42)|SiO_2(113)|Ti_3O_5(88)|SiO_2(116)|Ti_3O_5(68)|SiO_2(89)|Ti_3O_5(49)|SiO_2(77)|Ti_3O_5(48)|SiO_2(84)|Ti_3O_5(51)|SiO_2(85)|Ti_3O_5(48)|SiO_2(59)|Ti_3O_5(34)|SiO_2(71)|Ti_3O_5(44)|SiO_2(65)|Ti_3O_5(45)|SiO_2(81)|Ti_3O_5(52)|SiO_2(88)|$ glass]. It was known that the color-filters fabricated by the simulation data were composed of 41 layers by SEM image and the top layer of filters was $SiO_2$ layer and the filters were composed of $SiO_2$/$Ti_3O_5$ multilayer by XPS analysis. It was also known that the mixed thin film of TiO2 and $Ti_3O_5$ was made during the deposition of the $Ti_3O_5$ material. Conclusions: The narrow-band pass color-filters with a 500 nm central wavelength and 12 nm FWHM using $Ti_3O_5/SiO_2$ mutilayer of 41 layer were fabricated, and it was known that the mixed form of TiO2 and $Ti_3O_5$ thin film was made during the deposition of the $Ti_3O_5$ material.

EFFECT OF INDUCTION CHEMOTHERAPY ON FLAP SURVIVAL RATE IN MICROSURGERY (종양수술전 화학요법이 미세수술시 피판생존율에 미치는 영향)

  • Kim, Uk-Kyu;Kim, Yong-Deok;Byun, June-Ho;Shin, Sang-Hun;Chung, In-Kyo
    • Journal of the Korean Association of Oral and Maxillofacial Surgeons
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    • v.29 no.6
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    • pp.421-429
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    • 2003
  • Purpose : Neoadjuvant chemotherapy is commonly used to treat cancer patients as adjunct treatment, but if the microvascular tissue transfer is performed simulataneously with cancer resection surgery, the induction chemotherapy might affect the survival rate of vascularized free flap. Our study will focus on the effect of induction chemotherapy on the free flaps which were made on white rat abdomen after injection of 5-FU. Materials and Methods: The experimental rat groups were divided into three groups (total 24 rats) as a normal control group, 24 hrs group after 5-FU injection, 3 days group after 5-FU injection. Inferior abdominal island flaps of 8 Sprague Dawley rats on each group were made and immediately were induced into an ischemic state by clamping the supplying inferior epigastric artery and vein with microvascular clamp for a hour to induce a similiar free flap circumstance, then the inferior abdominal skin flaps were reperfused by releasing the clamps. The flaps on abdomen were repositioned and sutured. The experimental data for flap survival rate was collected by digital photo taking, analysed by computer image program to compare with the flap luminosity. The rats were sacrificed at 3 days, 5 days, 7 days after flap preparation and specimens of the flap were taken and stained with H-E staining. The microscopic finding was made under magnification of 200 and 400. Results: 1. Gross findings on each groups showed the healing condition was good as following sequences; normal, 24 hrs group after chemotherapy, 3 days group after chemotherpy. 2. The values of flap luminosity for evaluation of flap survival rate also showed the same sequences as gross findings of healing state. 3. The microscopic findings of epidermis necrosis, inflammation state, dermis fibrosis, vessel change, fatty tissue layer thinning were compared with each group. The 3 days group after chemotherapy showed remarkably poor healing condition compared to other groups. Conclusion: Chemotherapy agents affected the healing process of free flap, but healing condition was recovered spontaneously as post-injection periods passed out. In opposite to our expectation, 3 days group showed the bad flap condition in comparing with 24 hours group which was considered as immatured body circulation state of chemotherapy agent. It showed that 3 weeks in human being after chemotherapy was not proper as timing of microvascular tissue transfer if 3 days group in rat was considered as same healing period of 3 weeks in human being. More delayed healing timing than 3 weeks might be required in clinical application of free tissue transfer.

Assessment of antero-posterior skeletal relationships in adult Korean patients in the natural head position and centric relation (자연 두부 위치 및 안정위에서 한국 성인 환자 골격의 전.후 관계 결정)

  • Ahn, Jang-Hoon;Bae, Kwang-Hak;Park, Young-Ju;Hong, Ryoon-Ki;Nam, Joeng-Hun;Kim, Mi-Ja
    • The korean journal of orthodontics
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    • v.40 no.6
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    • pp.421-431
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    • 2010
  • Objective: This study aimed to verify the intra-individual reproducibility of the natural head position (NHP) in adult Korean patients in the centric relation (CR) position and to prove the inter-individual variability of the Frankfurt horizontal (FH) plane and sella-nasion (SN) line compared to the true horizontal line (THL). In addition, the study aimed to investigate the correlations between linear measurements from A-point and B-point to the nasion true vertical line (NTVL) and angular measurements from A-point and B-point to the SN line. Methods: Two lateral cephalograms were taken of 116 subjects (23 males, 93 females) with CR wax bites in a NHP at a one-week interval. Results: Method errors of three variables and intraclass correlation coefficients of six parameters proved the intra-individual reproducibility of NHP (p < 0.001). The angle of the FH to the THL was not significantly different from $0^{\circ}$ (p > 0.05), but it was clinically variable (SD $3.89^{\circ}$) on the inter-individual level. Conversely, the angle of the SN line to the THL was significantly different from $7^{\circ}$ (p < 0.05). Very low correlation was found between the linear measurements and angular measurements of A-point and B-point (p < 0.01). Conclusions: The NTVL could be a useful reference line for assessing the antero-posterior position of the maxilla and mandible of Korean adult patients in NHP and CR.

Dry Etching of GaAs and AlGaAs in Diffuion Pump-Based Capacitively Coupled BCl3 Plasmas (확산펌프 기반의 BCl3 축전결합 플라즈마를 이용한 GaAs와 AlGaAs의 건식 식각)

  • Lee, S.H.;Park, J.H.;Noh, H.S.;Choi, K.H.;Song, H.J.;Cho, G.S.;Lee, J.W.
    • Journal of the Korean Vacuum Society
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    • v.18 no.4
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    • pp.288-295
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    • 2009
  • We report the etch characteristics of GaAs and AlGaAs in the diffusion pump-based capacitively coupled $BCl_3$ plasma. Process variables were chamber pressure ($50{\sim}180$ mTorr), CCP power ($50{\sim}200\;W$) and $BCl_3$ gas flow rate ($2.5{\sim}10$ sccm). Surface profilometry was used for etch rate and surface roughness measurement after etching. Scanning electron microscopy was used to analyze the etched sidewall and surface morphology. Optical emission spectroscopy was used in order to characterize the emission peaks of the $BCl_3$ plasma during etching. We have achieved $0.25{\mu}m$/min of GaAs etch rate with only 5 sccm $BCl_3$ flow rate when the chamber pressure was in the range of 50{\sim}130 mTorr. The etch rates of AlGaAs were a little lower than those of GaAs at the conditions. However, the etch rates of GaAs and AlGaAs decreased significantly when the chamber pressure increased to 180 mTorr. GaAs and AlGaAs were not etched with 50 W CCP power. With $100{\sim}200\;W$ CCP power, etch rates of the materials increased over $0.3{\mu}m$/min. It was found that the etch rates of GaAs and AlGaAs were not always proportional to the increase of CCP power. We also found the interesting result that AlGaAs did not etched at 2.5 sccm $BCl_3$ flow rate at 75 mTorr and 100 W CCP power even though it was etched fast like GaAs with more $BCl_3$ gas flow rates. By contrast, GaAs was etched at ${{\sim}}0.3{\mu}m$/min at the 2.5 sccm $BCl_3$ flow rate condition. A broad molecular peak was noticed in the range of $500{\sim}700\;mm$ wavelength during the $BCl_3$ plasma etching. SEM photos showed that 10 sccm $BCl_3$ plama produced more undercutting on GaAs sidewall than 5 sccm $BCl_3$ plasma.