Study of etching properties of the $HfAlO_3$ thin film using the inductively coupled plasma
(유도결합 플라즈마를 이용한 $HfAlO_3$ 박막의 식각특성 연구)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2009.06a
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- pp.73-73
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- 2009